• Journal of the Korean Ceramic Society
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• v.32 no.7
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• pp.809-816
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• 1995

Ti1-xAlxN films were successfully deposited on high speed steel and silicon wafer by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/Ar/H2 gas mixture. Plasma process enabled N2 gas to nitride AlCl3, which is not possible in sense of thermodynamics. XPS analyses revealed that the deposited layer contained Al-N bond as well as Ti-N bond. Ti1-xAlxN films were polycrystalline and had single phase, B1-NaCl structure of TiN. Interplanar distance, d200, of (200) crystal plane of Ti1-xAlxN was, however, decreased with Al content, x. Al incorporation into TiN caused the grain size to be finer and changed strong (200) preferred orientation of TiN to random oriented microstructure. Those microstructural changes with Al addition resulted in the increase of micro-hardness of Ti1-xAlxN film up to 2800Kg/$\textrm{mm}^2$ compared with 1400Kg/$\textrm{mm}^2$ of TiN.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.147-148
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• 2007

The compound, Ti3(Al,Si)C2, was synthesized by hot pressing a powder mixture of TiCX, Al and Si. Its oxidation at 900 and 1000 oC in air for up to 50 h resulted in the formation of rutile-TiO2, -Al2O3 and amorphous SiO2. During oxidation, Ti diffused outwards to form the outer TiO2 layer, and oxygen was transported inwards to form the inner mixed layer.

• Journal of Hydrogen and New Energy
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• v.15 no.3
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• pp.235-243
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• 2004

A number of potential applications of aluminum foams are being identified and renewed interest in these engineering materials is also reflected by several current research projects. One of the key issues for industrial exploitation of aluminum foams is the development of cost-effective manufacturing strategies facilitating, preferably, net shape production of foams with controlled porosity and cell size, and minimized structural imperfection. Especially, melt route to aluminum foam production based on the foaming agents offer attraction of low cost and the potential for good microstructure. The present paper is focused mainly on foaming agents of melt-foam aluminum such as $TiH_2$ or $TiH_2-Al$ mixture. For the purpose of economical manufacturing, we are proposed to hydrogen induced mechanical alloying (HIMA) process. Thermo-physical properties of particles synthesized are compared with conventional methods. Specimens synthesized are characterized by scanning electron microscopy (SEM) with energy dispersive spectroscopy (EDS), thermo- gravimetry-differential scanning calorymetry (TG-DSC), pressure-composition-isotherm. (PCI).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 1999.05a
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• pp.5-5
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• 1999

A novel process is proposed to improve oxidation resistance of Ti-Al intermetallic compounds at elevated temperatures by both Cr addition and pre-sulfidation, where TiAl alloys withlor without Cr addition were sulfidized at 1173K for 86.4ks at a 1.3 Pa sulfur partial pressure in a $H_2-H_2S$ gas mixture. The pre-sulfidation treatment formed a thin Cr-Al alloy layer as well as 7~10 micrometer $TiAl_3$ and $TiAl_2$ layer, due to selective sulfidation of Ti. Oxidation resistance of the pre-sulfidation processed TiAl 4Cr alloy was examined under isothermal and heat cycle conditions between room temperature and 1173K in air. Changes in $TiAl_3$ into $TiAl_2$ and then TiAl phases as well as their effect on oxidation behavior were investigated and compared with the oxidation behavior of the TiAl-4Cr alloy as TiAl and pre-sulfidation processed TiAl aHoys. After oxidation for up to 2.7Ms a protective $Al_2O_3$ scale was formed, and the pre-formed $TiAl_3$ changed into $TiAl_2$ and the $Al_2Cr$ phase changed into a CrAlTi phase between the $Al_2O_3$ scale and $TiAl_2$ layer. The pre-sulfidation processed TiAl-4Cr alloy had very good oxidation resistance for longer times, up to 2.7 Ms, in contrast to those observed for the pre-sulfidation processed TiAl alloy where localized oxidation occurred after 81 Oks and both the TiAl and TiAl-4Cr alloys themselves corroded rapidly from the initial stage of oxidation

• Journal of Surface Science and Engineering
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• v.34 no.2
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• pp.97-104
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• 2001

($Ti_{ 1-x}$$Al_{ x}$)N has been deposited on high speed steel (HSS) substrate using PECVD from the gas mixture of $TiC1_4$, $AlC1_4$, $NH_3$, $H_2$, and Ar. The correlation between the microstructure and the mechanical properties was investigated. ($Ti_{1-x}$$Al_{ x}$)N showed single phase NaCl-structure up to X=0.87, while a mixed phase of NaCl Type (Ti, Al) N and wurtzite structure AlN was observed for 0.87$Ti_{1-x}$ $Al_{x}$ )N became by degrees as increasing X, which made the hardness of the coating higher by Al addition. When the coating was composed of a mixed phase, however, the hardness decreased abruptly due to the effect of soft AlN phase. The wear volume of the coatings could be obtained as the concentration of the coating was varied, and the relation between the wear volume and hardness or the adhesion strength was discussed.

• Journal of the Korean Society for Heat Treatment
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• v.18 no.5
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• pp.281-287
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• 2005

Titanium aluminium nitride((TiAl)N) film is anticipated as an advanced coating film with wear resistance used for drills, bites etc. and with corrosion resistance at a high temperature. In this study, (TiAl)N thin films were deposited both at room temperature and at elevated substrate temperatures of 573 to 773 K by using a two-facing-targets type DC sputtering system in a mixture Ar and $N_2$ gases. Atomic compositions of the binary Ti-Al alloy target is Al-rich (25Ti-75Al (atm%)). Process parameters such as precursor volume %, substrate temperature and Ar/$N_2$ gas ratio were optimized. The crystallization processes and phase transformations of (TiAl)N thin films were investigated by X-ray diffraction, field-emission scanning electron microscopy. The microhardness of (TiAl)N thin films were measured by a dynamic hardness tester. The films obtained with Ar/$N_2$ gas ratio of 1:3 and at 673 K substrate temperature showed the highest microhardness of $H_v$ 810. The crystallized and phase transformations of (TiAl)N thin films were $Ti_2AlN+AlN{\rightarrow}TiN+AlN$ for Ar/$N_2$ gas ratio of 1:3, $Ti_2AlN+AlN{\rightarrow}TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 1:1 and $TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN{\rightarrow}Ti_2AlN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 3:1. The above results are discussed in terms of crystallized phases and microhardness.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.49-50
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• 2006

[ $Ti(Al,\;O)-Al_2O_3$ ] composite powders were produced by high energy mechanical milling of a mixture of Al and $TiO_2$ powders followed by a combustion reaction. The powders were subsequently thermally sprayed on H13 steel substrates. Microstructural examination was conducted on the composite powders and thermally sprayed coatings, using X-ray diffractometry (XRD) and scanning electron microscopy (SEM). The performance of the coatings was evaluated in terms of micro-hardness and thermal fatigue. The thermally sprayed coatings performed very well in the preliminary thermal fatigue tests and showed no wetting tendency to molten aluminum.

• Journal of the Korean Society for Heat Treatment
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• v.34 no.2
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• pp.60-65
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• 2021

In this study, the effect of pressure type and foaming agent on the microstructural change of Al foam produced by powder compact processing was investigated. Better foaming characteristic is easily obtained from extrusion process with strong plastic deformation and preheating than that by uniaxial pressing with preheating. In current powder compact foaming process using TiH2/MgH2 mixture as a foaming agent, a temperature of 670℃ and addition of 30% MgH2 in TiH2 foaming agent was chosen as the most suitable foaming condition. The aluminum (Al) foams with maximum porosity of around 70%, relatively regular pore size and distribution were successfully produced by means of the powder metallurgy method and extrusion process.

• Journal of Powder Materials
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• v.28 no.1
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• pp.31-37
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• 2021

This study explores reducing the oxygen content of a commercial Ti-48Al-2Cr-2Nb powder to less than 400 ppm by deoxidation in the solid state (DOSS) using Ca vapor, and investigates the effect of Ca vapor on the surface chemical state. As the deoxidation temperature increases, the oxygen concentration of the Ti-48Al-2Cr-2Nb powder decreases, achieving a low value of 745 ppm at 1100℃. When the deoxidation time is increased to 2 h, the oxygen concentration decreases to 320ppm at 1100℃, and the oxygen reduction rate is approximately 78% compared to that of the raw material. The deoxidized Ti-48Al-2Cr-2nb powder maintains a spherical shape, but the surface shape changes slightly owing to the reaction of Ca and Al. The oxidation state of Ti and Al on the surface of the Ti-48Al-2Cr-2Nb powder corresponds to a mixture of TiO2 and Al2O3. As a result, the peaks of metallic Ti and Ti suboxide intensify as TiO2 and Al2O3 in the surface oxide layer are reduced by Ca vapor deposition.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1236-1238
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• 1994

TiAlN thin films were prepared by a multi target r.f magnetron sputtering system under different conditions. We have investigated the resistivity and T.C.R. (Temperature Coefficient of Resistance) characteristics of TiAlN films deposited on $Al_2O_3$ and glass substrates by sputtering in an $Ar:N_2$ gas mixture. We used Al and Ti metal as Target Material and $Ar:N_2$ gas as working gas. We varied the partial pressure ratio of $N_2/Ar$ from 0.2/7 to 1.0/6.2 (SCCM). And the R.F power of Ti and Al Target also were varied as 160/240, 200/200 and 240/160(W). In this experiment, we can get the precision thin film resistor with a very low T.C.R. (Temperature Coefficient of Resistance) below 25 ppm ${\Omega}/^{\circ}C$.