• Title/Summary/Keyword: $TiCl_3$

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Preparation of Ba2Ti9O20 by Coprecipitation Method (공침법에 의한 Ba2Ti9O20의 합성)

  • 이경희;이병하;오권오
    • Journal of the Korean Ceramic Society
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    • v.25 no.6
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    • pp.671-676
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    • 1988
  • Preparation of high purity ultrafine Ba2Ti9O20 powder was investigated by coprecipitation method. Formation of Ba2Ti9O20 powder from precipitate of coprecipitation takes place at 120$0^{\circ}C$, which is 20$0^{\circ}C$ lower than that from mechanical mixtures of BaCO3 and TiO2. This is apparently due to the nature of the compounds formed by the reaction of mixtures of aqueous solutions of BaCl2 and TiCl4 with an ammoniacal solution of ammonium carbonate and ammouium hydroxide. In this method, the Ba2Ti9O20 powders show low callcining and sintering temperature and it has good sintering and dielectric constant at room temperature.

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A study on the development of thin solid state batteries (박막 고체전지 개발에 관한 연구)

  • 권혁상;이홍로
    • Journal of the Korean institute of surface engineering
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    • v.25 no.5
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    • pp.215-221
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    • 1992
  • This research is aimed at developing(110) preferred TiS2 cathode films and glass typed solid electro-lytes which have high ionic migrations and low electron conductivities for thin secondary solid batteries. To obtain preferred oriented TiS2 thin films on a substrate by CVD method using TiCl4 and H2S gases three factors of heating temperature, inner pressure of furnace and TiCl4/H2S gas mole fraction were ex-amined systematically. To obtain solid films of Li2O-B2O3-SiO2 electrolytes by r.f. sputtering for thin proto-type batteries of Li/Li2O-B2O3-SiO2TiS2, sputtering conditions were examined. TiS2 cathode films showed columnar structure, namely c axis oriented parallely. At low pressure of reaction chamber and low heating temperature, surface of smooth TiS2 films couldd be obtained. Ionic conductivity of Li2O-B2O3-SiO2 films manufactured by r.f. magnetron sputtering were 3$\times$10-7$\Omega$-1cm-1 and electron conductivities were 10-11$\Omega$-1cm-1. Open cell voltage of thin lithium batteries were 2.32V with a designed prototype cell.

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Effect of Surface Treatment of CdS-TiO2 Composite Photocatalysts with Film Type on Hydrogen Production (수소제조에 관한 박막형 CdS-TiO2 복합 광촉매계의 표면처리 효과)

  • Jang, Jum-Suk;So, Won-Wook;Kim, Kwang-Je;Moon, Sang-Jin
    • Transactions of the Korean hydrogen and new energy society
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    • v.13 no.1
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    • pp.34-41
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    • 2002
  • CdS and $TiO_2$ nanoparticles were made by the precipitation method and sol-gel method, respectively, and they were mixed mechanically and then treated with the hydrothermal processing. CdS-$TiO_2$ composite particulate films were thus prepared by casting CdS-$TiO_2$ mixed sol onto $SnO_2$ conducting glass and a subsequent heat-treatment at $400^{\circ}C$. Again, the physico-chemical and photoelectrochemical properties of these films were controlled by the surface treatment with $TiCl_4$ aqueous solution. The photocurrents and the hydrogen production rates measured under the present experimental conditions varied in the range of $3.5{\sim}4.5mA/cm^2$ and $0.3{\sim}1.8cc/cm^2$-hr, respectively, and showed the maximum values at the $CdS/[CdS+TiO_2]$ mole ratio of 0.2. Also, the surface treatment with $TiCl_4$ aqueous solution caused a considerable improvement in the photocatalytic activity, Probably as a result of close contacts between the primary particles by the etching effect of $TiCl_4$ It was found that the photoelectrochemical performance of these particulate films could be effectively enhanced by this approach.

Anionic Effect on Photocatalytic Decomposition of Benzene (벤젠의 광촉매분해반응에 대한 음이온효과)

  • Kim, Young-Hee;Kim, Tae-Gyun;Lee, Chun-Sik
    • Clean Technology
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    • v.6 no.2
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    • pp.107-111
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    • 2000
  • In the photocatalytic degradation of benzene using $TiO_2$ as photocatalyst, anionic effects were investigated. When near UV and visible light was irradiated, the photodegradation of benzene was slightly increased in which $S_2O{_8}^{2-}$ or $NO{_3}^-$ coexisted with $TiO_2$. But $NO{_2}^-$ or $Cl^-$ diminished it remarkably, because these anions scavenged hydroxyl radical. While in the case of UV light irradiation, $S_2O{_8}^{2-}$ and $NO{_3}^-$ enhanced photodegradation of benzene due to photosensitization of these anions, but $NO{_2}^-$ or $Cl^-$ diminished it little.

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Deposition Of $TiB_2$ Films by High Density Plasma Assisted Chemical Vapor Deposition (고밀도 플라즈마 화학 증착 장치를 이용한 $TiB_2$ 박막 제조)

  • Lee S. H.;Nam K. H.;Hong S. C.;Lee J. J.
    • Journal of the Korean institute of surface engineering
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    • v.38 no.2
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    • pp.60-64
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    • 2005
  • The ICP-CVD (inductively coupled plasma chemical vapor deposition) process was applied to the deposition of $TiB_2$ films. For plasma generation, 13.56 MHz r.f. power was supplied to 2-turn Cu coil placed inside chamber. And the gas mixture of $TiCl_4,\;BCl_3,\;H_2$ and Ar was used for $TiB_2$ deposition. $TiB_2$ films with high hardness (<40 GPa) were obtained at extremely low deposition temperature $(250^{\circ}C)$, and the films hardness increased with ICP power and gas flow ratio of $TiCl_4/BCl_3$. The film structure was changed from (100) preferred orientation to random orientation with increasing RF power. It is supposed that the enhanced hardness of films was caused by a strong Ti-B chemical bonding of stoichiometric $TiB_2$ films and film densification induced by high density plasma.

Preparation of Titanyl Chlorde (鹽化티타닐 製造에 關한 硏究)

  • Chyun, Byong-Doo;Shin, Yoon-Kyung
    • Journal of the Korean Chemical Society
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    • v.4 no.1
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    • pp.15-17
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    • 1957
  • 1. Preparation of Titanium tetrachloride; The following precesses were strictly followed as the preliminary step to obtain pure $TiOCl_2$, titanyl chloride; First, pure Titanium Oxide mixed with carbon is rolled into pills. After drying up perfectly, these pills are heated at 900∼1000${\circ}C$. And then the pills are subjected to the flow of $Cl_2$ gas in a quartz tube heated to 900-1000${\circ}C$. Thus Titanium tetrachloride is obtained. 2. Preparation of $TiOCl_2$ ; Yellowish trobrown solution is made by pouring 80 g of conc. HCl (sp.gr. 1.19) to 45 gr of Titanium tetrachloride (approx. 2 times of theoretical amount). Then this solution is kept settled for 5-days in a desiccator filled with phosphorous pentoxide at room temperature. As the colorless amorphous solid thus obtained is washed with aceton, 36.5 g of the pure salt are obtained. 3. Determination of composition. The analysis of the sample taken from the deposit desiccated gives the following data; (A) Qualitative analysis; a) $Ti(OH)_4$ is precipitated by adding NaOH in water solution of the salt. b) Adding $AgNO_3$ solution, the water solution of the salt gives white precipitate of AgCl. c) When acid and $H_2O_2$ are added, the solution turns its color to redish brown (This proves that $TiO^{++}$ was converted into $TiO^{++}$ by oxidation of $H_2O_2$. (B) Quantitative analysis; a) $Ti(OH)_4$ precipitated by $10{\%}$ NaOH isalitatsubjected consecutively to the filtration and ignition in porcelain crucible at approx. 1000${\circ}C$. , then $TiO_2$ thus formed is weighed and calculated into Ti content. b) Chlorine involved in water solution of the salt is determined by Vorhardt method. Result: The values obtained from previous analysis, devied by their atomic weight gives the following composition: Ti : Cl = 1 : 2 Therefore $TiOCl_2$ should be given as its molecular formula. 4. Summary. When $TiCl_4$ is additated into conc. HCl, $TiO^{++}$ formed exists as a stable form, and forms $TiOCl_2$. However $TiOCl_2$ is unstable to heating. When the temperature is raised to $65{\circ}C$the decomposition of the solution is accelerated, and gives $TiO_2$ aq. $TiOCl_2$ in addition is highly hygroscopic.

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Synthesis of Metallic Gold Colored α-Al2O3 Nanoplate-TiO2 Core-Shell Pigments with Robust and Photo-Stable Smooth TiO2 Shell

  • Lee, Su Jin;You, Myoung Sang;Park, Jin Kyoung;Park, Bum Jun;Im, Sang Hyuk
    • Applied Chemistry for Engineering
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    • v.31 no.4
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    • pp.390-397
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    • 2020
  • To synthesize non-corrosive metallic gold colored α-Al2O3 nanoplate-TiO2 core-shell pigments with controlled roughness, we systematically checked the morphological variation of the TiO2 shell with the mole ratio of TiCl4 and NaOH from 1 : 1 to 1 : 1.5, 1 : 2, 1 : 2.5, 1 : 3, 1 : 3.5, and 1 : 4. The more increased mole ratio of TiCl4 and NaOH resulted in the smoother TiO2 shell due to the promoted formation of anatase TiO2 than that of the rutile one. By the heat-treatment of pigments at 500 ℃, we could improve the adhesiveness between TiO2 shell and α-Al2O3 nanoplates without changing their topology and roughness. In addition, the α-Al2O3 nanoplate with the robust TiO2 by heat-treatment exhibited comparable photo-stability against photo-catalytic degradation by UV exposure compared with the commercially available α-Al2O3/TiO2 lustering pigment.

Dependence of $Cl_2$ Gas Reaction Time on Tribological Properties of TiC Derived Carbon Layer (염소가스 반응시간에 따른 TiC표면 탄소막의 Tribology 특성)

  • Lim, Dae-Soon;Bae, Heung-Taek;Jeong, Ji-Hoon;Na, Byung-Chul
    • Tribology and Lubricants
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    • v.25 no.1
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    • pp.20-24
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    • 2009
  • TiC-derived carbon coatings have been synthesized at $600^{\circ}C$ temperature treatment with $H_2/Cl_2$ mixture gases. From Raman spectroscopy measurements, the modified layer was covered with carbon and the thick-ness of the layer was increased with increasing reaction time. And $I_D/I_G$ ratio was decreased with increasing reaction time. The superior tribological property was obtained from TiC reacted with $Cl_2$ gas for 2 hrs. And the tribological property measurements indicate that TiC-derived carbon layer has $0.9{\times}10_{-6}mm^3/Nm$ in wear coefficient and 0.13 in friction coefficient.

Etching properties of (Pb,Sr)$TiO_3$ thin films using $Cl_2/Ar$ inductively coupled plasma ($Cl_2/Ar$ 유도결합 플라즈마를 이용한 (Pb,Sr)$TiO_3$ 박막의 식각 특성)

  • Kim, Gwan-Ha;Kim, Kyoung-Tae;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.182-185
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    • 2003
  • Etching characteristics of (PB,Sr)$TiO_3$(PST) thin films Were investigated using inductively coupled chlorine based plasma system as functions of gas mixing ratio, RF power and DC bias voltage. It was found that increasing of Ar content in gas mixture' lead to sufficient increasing of etch rate and selectivity of PST to Pt. The maximum etch rate of PST film is 562 ${\AA}$/min and the selectivity of PST film to Pt is 0.8 at $Cl_2/(Cl_2+Ar)$ of 20 %. It was proposed that sputter etching is dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products.

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