• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.53.1-53.1
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• 2009

실리콘 다층박막 태양전지를 위한 초고효율 실리콘 양자점 박막을 연구하기 위해 Silicon target과 Carbon target을 동시에 스퍼터하여 Silicon Carbide 박막을 증착하였다. Silicon Carbide 박막의 조성비는 target에 인가되는 RF Power를 조절하여 Auger Electro Spectroscopy를 사용하여 Si, C, O, N원소의 양을 정량화하여 측정하였다. Si Power를 200W에 고정하고, C Power를 0W에서 400W까지 변화시킬 때, $Si_{1-x}$ $C_x$ 박막에서 조성비 x는 0 ~ 0.43 범위였다. 이 박막을 증착 한 후에 질소 분위기에서 600 ~ $1000^{\circ}C$ 온도로 열처리를 진행하였다. High resolution TEM과 Raman 분석을 통해, 박막의 열처리 후 $Si_{1-x}$ $C_x$ 박막 내에 실리콘 양자점이 형성되었음을 관찰할 수 있었고, 2 ~ 10 nm 의 크기를 가지는 것으로 확인할 수 있었다. 이 실리콘 양자점을 포함한 $Si_{1-x}$ $C_x$ 박막을 적층하여 UV-VIS-NIR spectroscopy, FTIR및 PL와 같은 측정을 통해 광학적 에너지 밴드갭의 변화와 그에 따른 특성을 확인하였다.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.2
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• pp.68-71
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• 2006

A class-E power amplifier is designed using 0.25$\mu$m standard CNMOS technology at 900MHz and the reliability characteristics are studied with the load network. The reliability characteristics is improved when a finite DC-feed inductor is used instead of RF choke. At the one you halt, the PAE(Power Added Efficiency) decreases from 58.0$\%$ to 35.7$\%$ and output power decreases from 120mW to 74mW in power amplifier using RF choke. However, when a finite DC-feed inductor is used with load the PAE decreases from 58.5$\%$ to 54.8$\%$ and output power decreases from 121mW to 112mW. From the simulated results, the class-E power amplifier with a finite DC-feed inductor shows superior reliability characteristics compared to rower amplifier using RF choke inductor.

• Journal of the Semiconductor & Display Technology
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• v.15 no.4
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• pp.36-40
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• 2016

The 2 wt.% Al-doped ZnO(AZO) thin films were fabricated on PET substrates with various RF power 20, 35, 50, 65, and 80W by using RF magnetron sputtering in order to investigate the structure, electrical and optical properties of AZO thin films in this study. The XRD measurements showed that AZO films exhibit c-axis orientation. At a RF power of 80W, the AZO films showed the highest (002) diffraction peak with a FWHM of 0.42. At a RF power of 65W, the lowest electrical resistivity was about $1.64{\times}[10]$ ^(-4) ${\Omega}-cm$ and the average transmittance of all films including substrates was over 80% in visible range. Good transparence and conducting properties were obtained due to RF power control. The obtained results indicate that it is acceptable for applications as transparent conductive electrodes.

• Proceedings of the Korea Contents Association Conference
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• 2007.11a
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• pp.804-806
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• 2007

C-axis oriented zinc oxide thin films were deposited on Si(100) substrate by rf magnetron sputtering. The effects of deposition parameters on the crystallinity and electrical properties of ZnO films were investigated. As-deposited ZnO films showed the strong c-axis growth andexcellent crystallinity under the deposition conditions as follows ; substrate temperaturec : $200^{\circ}C$, rf power : 150W, gas ratio : $O_2/Ar=50/50$, chamber pressure : 10mTorr. The resistivity of ZnO films was significantly affected by deposition parameters. With increasing percentage of oxygen, and decreasing substrate temperature, the resistivity of ZnO films increased.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.5
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• pp.526-529
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• 2004

The nematic liquid crysta](NLC) aligning capabilities using a-C:H thin film deposited at the three kinds of rf bias condition were investigated. A high pretilt angle of NLC on low substrate rf bias applied a-C:H thin films was observed and the low pretilt angle of the NLC on high substrate rf bias applied a-C:H thin films was observed. Consequently, the high NLC pretilt angle and the good aligning capabilities of LC alignment by the IB alignment method on the a-C:H thin film deposited at 1 W rf bias condition can be achieved. It is considered that pretilt angle of the NLC may be attributed to substrate rf bias condition and IB energy time. Therefore, LC alignment is affected by topographical structure forming strong IB energy.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.117-117
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• 1999

최근 광소자와 더불어 발전과 더불어 고효율의 새로운 광소자에 대한 수요가 증가되고 있다. ZnO는 이러한 특성을 가진 재료중에 한가지로서 최근 들어 그 가능성에 대한 연구가 활발히 이루어지고 있다. 특히 상온에서 exciton binding energy가 다른 재료보다 큰 60meV로 고효율의 blue, UV 발광이 가능한 재료로 알려져 있다. 본 연구에서도 광소자로서 ZnO를 활용하기 위해서 RF magnetron sputtering법을 이용하기 위하여 광특성의 향상에 목적을 두고 연구하였다. ZnO 박막은 RF magnetron sputtering법을 이용하여 sapphire (0001) 기판위에 성장시켰다. RF power는 60W에서 120W까지 변화시켰고 박막의 성장온도는 55$0^{\circ}C$와 $600^{\circ}C$로 변화시켰으며, 박막의 성장시간은 60분, ZnO target과 기판과의 거리는 4.5cm로 하여 성장시켰다. 성장된 ZnO 박막은 XRD $\theta$-rocking scan 측정을 통해서 박막의 C-축 배향성과 RBS channeling를 이용하여 ZnO 박막의 epitaxial 성장 정도를 측정하였다. 박막의 상온 발광 특성은 He-Cd laser를 사용한 photoluminescence spectra로 측정하였다. 또한 표면의 morphology는 atomic force microscope(AFM)를 이용하여 관찰하였으며 transmission electron microscopy(TEM)을 사용하여 ZnO박막의 단면적을 관찰함으로서 grain의 성장과 광특성 및 결정성과의 영향에 대해서 연구하였다. ZnO 박막의 성장온도 55$0^{\circ}C$에서 RF power를 60W에서 120W까지 변화시킬 경우 XRD $\theta$-rocking peak의 반치폭이 0.157$^{\circ}$에서 0.436$^{\circ}$까지 변화하였고 80W에서 최소값을 가졌으며 in-plain에 대한 XRD 측정 결과 ZnO 박막의 성장은 sapphire 기판에 대해서 30$^{\circ}$회전되어 성장된 것으로 알 수 있었으며 이는 ZnO [100]∥ Al2O3[110]의 관계를 갖는다는 것을 나타낸다. 광특성의 측정 결과인 PL peak의 반치폭은 133.67meV에서 89.5meV까지 변화함을 알 수 있었고 80W에서 최대값을 가졌으며 이는 RF power의 변화에 따른 결정성의 변화와는 반대되는 현상임을 알 수 있었다. 그러나 성장온도 $600^{\circ}C$일때에는 XRD $\theta$-rocking peak의 반치폭이 0.129$^{\circ}$로 결정성이 우수한 박막임을 확인할 수 있었고 PL peak의 반치폭 또한 Ar과 O2의 비율에 따라 76.32meV에서 98.77meV로 광특성도 우수한 것으로 나타났다. RBS channeling 결과 55$0^{\circ}C$에서는 $\chi$min값이 50~60%였으나 $600^{\circ}C$일 때에는 $\chi$min값이 4~5%로 박막이 epitaxial 성장을 하였다는 것을 알 수 있었다. 결정성과 광특성과의 연관성을 알아보기 위해 TEM을 이용한 박막의 cross section image를 관찰한 결과 광특성이 우수한 시편일수록 grain의 크기가 큰 것으로 나타났고 결정성이 우수한 시편의 경우에서는 XRD분석 결과에서처럼 C-축배향성이 우수한 것을 확인할 수 있었다. 이상의 결과로부터 RF magnetron sputtering 법으로 광특성이 우수한 양질의 ZnO박막 성장이 가능하였다는 것을 알 수 있었으며 광소자로써의 가능성을 확인 할 수 있었다.

• Journal of the Microelectronics and Packaging Society
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• v.8 no.3
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• pp.49-53
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• 2001

Vortical etching experiments of ($SrBi_2Ta_2O_9$)/Si thin films have been performed by using the inductively coupled plasma reactive ion etching (ICP-ME) apparatus. The purposes of these experiments are to get the effective area of vertical surface. Because this technology is very important to get good qualities of ferroelectric gate structure, capacitor and the minimum parasitic effects related to the excellent performances of the FRAM (Ferroelectric Random Access Memory) device. The reacting gases were Ar and $Cl_2$gases, and various $Ar/C1_2$flow ratios were used. The etching experiments were carried out at various RF powers such as 700, 700, 500W and at various DC powers such as 200, 150, 100, 50W, respectively. The maximum etch rate of $SrBi_2Ta_2O_9$/Si thin films was 1050 A/min at the $Ar/C1_2$ gas ratio of 20/16, RF power of 700 W and DC power of 200 W. From the SEM (scanning electron microscopy) image of the SBT thin films, the wall angle was as good as about $82^{\circ}$.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.10
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• pp.2497-2502
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• 2014

The 5 wt.% Ga-doped zinc oxide (GZO) thin films were fabricated on PES substrates with various RF power 50~80 W by using RF magnetron sputtering in order to investigate the optical and electrical properties of GZO thin films. The XRD measurement showed that GZO thin films exhibit c-axis orientation. At a RF power of 70W, the GZO thin film showed the highest (002) diffraction peak with a Full-Width-Half-Maximum (FWHM) of $0.44^{\circ}$. AFM analysis showed that the lowest surface roughness (0.20 nm) was obtained for the GZO thin film fabricated at 70 W of RF power. The electrical property indicated that the minimum resistivity ($6.93{\times}10^{-4}{\Omega}{\cdot}cm$) and maximum carrier concentration ($7.04{\times}10^{20}cm^{-3}$) and hall mobility ($12.70cm^2/Vs$) were obtained in the GZO thin film fabricated at 70W of RF power. The optical transmittance in the visible region was higher than 80 %, regardless of RF power. The optical band-gap showed the slight blue-shift with increased in carrier concentration which can be explained by the Burstein-Moss effect.

• Korean Journal of Materials Research
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• v.21 no.4
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• pp.202-206
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• 2011

We have investigated the structural and electrical properties of Ga-doped ZnO (GZO) thin films deposited by an RF magnetron sputtering at various RF powers from 50 to 90W. All the GZO thin films are grown as a hexagonal wurtzite phase with highly c-axis preferred parameters. The structural and electrical properties are strongly related to the RF power. The grain size increases as the RF power increases since the columnar growth of GZO thin film is enhanced at an elevated RF power. This result means that the crystallinity of GZO is improved as the RF power increases. The resistivity of GZO rapidly decreases as the RF power increases up to 70 W and saturates to 90W. In contrast, the electron concentration of GZO increases as the RF power increases up to 70 W and saturates to 90W. GZO thin film shows the lowest resistivity of $2.2{\times}10^{-4}{\Omega}cm$ and the highest electron concentration of $1.7{\times}10^{21}cm^{-3}$ at 90W. The mobility of GZO increases as the RF power increases since the grain boundary scattering decreases due to the reduced density of the grain boundary at a high RF power. The transmittance of GZO thin films in the visible range is above 90%. GZO is a feasible transparent electrode for application as a transparent electrode for thin film solar cells.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.64 no.4
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• pp.277-280
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• 2015

In this paper, we have studied the surface property and transmittance of n- and p-type thin film deposited on ITO substrate. In n-type samples, the average particle size was large and uniform as RF power was increased, and the best results were shown at the condition of the temperature of $300^{\circ}C$ and 200 W of RF power. The transmittance of the sample deposited for 20 minutes was 74.82% and the light wave was increased to 800 nm. In p-type samples, the results were 71.21% and 789 nm at the deposition condition of the RF power of 250 W and the temperature of $250^{\circ}C$.