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The Structure, Optical and Electrical Characteristics of AZO Thin Film Deposited on PET Substrate by RF Magnetron Sputtering Method  

Lee, Yun seung (Department of Semiconductor Engineering, Cheongju University)
Kim, Hong bae (Department of Semiconductor Engineering, Cheongju University)
Publication Information
Journal of the Semiconductor & Display Technology / v.15, no.4, 2016 , pp. 36-40 More about this Journal
Abstract
The 2 wt.% Al-doped ZnO(AZO) thin films were fabricated on PET substrates with various RF power 20, 35, 50, 65, and 80W by using RF magnetron sputtering in order to investigate the structure, electrical and optical properties of AZO thin films in this study. The XRD measurements showed that AZO films exhibit c-axis orientation. At a RF power of 80W, the AZO films showed the highest (002) diffraction peak with a FWHM of 0.42. At a RF power of 65W, the lowest electrical resistivity was about $1.64{\times}[10]$ ^(-4) ${\Omega}-cm$ and the average transmittance of all films including substrates was over 80% in visible range. Good transparence and conducting properties were obtained due to RF power control. The obtained results indicate that it is acceptable for applications as transparent conductive electrodes.
Keywords
AZO; RF magnetron sputtering; RF Power; PES;
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Times Cited By KSCI : 1  (Citation Analysis)
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