• Title/Summary/Keyword: $N_{2}$ gas

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Effect of irradiation on the oxidation kinetics of TODGA-based extraction mixtures at atmospheric pressure

  • Skvortsov, I.V.;Belova, E.V.;Yudintsev, S.V.
    • Nuclear Engineering and Technology
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    • v.52 no.9
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    • pp.2034-2040
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    • 2020
  • The gas evolution from mixtures consisting of 0.2 M solution of N,N,N',N'-tetra-n-octyldiglycolamide (TODGA) in n-alcohol (n-decanol or n-nonanol) with Isopar-M diluent was investigated during thermal oxidation. The effect of ionizing radiation on their thermal stability has been studied. It has been determined that the volume of gaseous thermolysis products increases by 260% in the case of n-nonanol and 80% in the case of n-decanol compared to non-irradiated solutions. It has been shown that the gas evolution rate and gas volume increase when the irradiated mixture saturated with nitric acid is heated. However, there are no prerequisites for the development of autocatalytic oxidation.

Characteristics of Silicon Nitride Deposited Thin Films on IT Glass by RF Magnetron Sputtering Process (RF Magnetron Sputtering공정에 의해 IT유리에 적층시킨 Silicon Nitride 박막의 특성)

  • Son, Jeongil;Kim, Gwangsoo
    • Korean Journal of Materials Research
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    • v.30 no.4
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    • pp.169-175
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    • 2020
  • Silicon nitride thin films are deposited by RF (13.57 MHz) magnetron sputtering process using a Si (99.999 %) target and with different ratios of Ar/N2 sputtering gas mixture. Corning G type glass is used as substrate. The vacuum atmosphere, RF source power, deposit time and temperature of substrate of the sputtering process are maintained consistently at 2 ~ 3 × 10-3 torr, 30 sccm, 100 watt, 20 min. and room temperature, respectively. Cross sectional views and surface morphology of the deposited thin films are observed by field emission scanning electron microscope, atomic force microscope and X-ray photoelectron spectroscopy. The hardness values are determined by nano-indentation measurement. The thickness of the deposited films is approximately within the range of 88 nm ~ 200 nm. As the amount of N2 gas in the Ar:N2 gas mixture increases, the thickness of the films decreases. AFM observation reveals that film deposited at high Ar:N2 gas ratio and large amount of N2 gas has a very irregular surface morphology, even though it has a low RMS value. The hardness value of the deposited films made with ratio of Ar:N2=9:1 display the highest value. The XPS spectrum indicates that the deposited film is assigned to non-stoichiometric silicon nitride and the transmittance of the glass with deposited SiO2-SixNy thin film is satisfactory at 97 %.

Dielectric Characteristics of $SF_6/N_2$ Mixture Insulation Gas for HV GIL (초고압 GIL을 위한 $SF_6/N_2$ 혼합가스의 절연특성)

  • Chang, Yong-Moo;Kim, Chul-Ho;Kim, Jeong-Tae;Koo, Ja-Yoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.49-49
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    • 2010
  • In this paper, a full scaled gas discharge chamber was designed and fabricated for evaluating the dielectric performance of SF6/N2 mixture gases. And it describes work on AC and lightning impulse dielectric characteristics of SF6/N2 mixture insulation gas from experiments and full scale models.

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Study of CO2+(CO2)n Cluster in a Paul Ion Trap

  • Karimi, L.;Sadat Kiai, S.M.;babazaheh, A.R.;Elahi, M.;Shafaei, S.R.
    • Mass Spectrometry Letters
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    • v.10 no.1
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    • pp.27-31
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    • 2019
  • In this article, the properties of ${CO_2}^+(CO_2)_n$ clusters in a Paul ion trap have been investigated using mass-selective instability mode which conducted by chosen precursor ions, mainly $Ar^+$ and ${CO_2}^+$ produced by a mixture of Ar and $CO_2$. Exposure of ${CO_2}^+$ ions to $CO_2$ molecules, lead to the formation of ${CO_2}^+(CO_2)_n$ clusters. Here, Ar gas react as a buffer gas and lead to form ${CO_2}^+(CO_2)_n$ cluster by collisional effect.

Studies on the Denitrification in the Submerged Paddy Soil -IV. Influences of soil organic matter contents, soil temperature, pH values, kinds and levels of N-fertilizer on the evolution of N2O gas (논토양(土壤)의 탈질작용(脫窒作用)에 관(關)한 연구(硏究) -제(第)4보(報) 토양유기물함량(土壤有機物含量), 온도(溫度), pH, 질소비종(窒素肥種) 및 시비량(施肥量)이 탈질작용(脫窒作用)에 미치는 영향(影響))

  • Lee, Sang Kyu;Kim, Seung Hwan;Park, Jun Kyu;An, Sang Bae
    • Korean Journal of Soil Science and Fertilizer
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    • v.20 no.1
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    • pp.55-61
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    • 1987
  • A series of laboratory experiments were carried out to find the effects of soil organic matter contents, soil temperature, pH values, kinds and amount of nitrogen fertilizers on the denitrification-$N_2O$ gas evolution-. The results obtained were summarized as follows: 1. Denitrification rate, amount of $N_2O$ gas evolution, was influenced the order of organic matter contents>soil temperature>pH values>kinds of N-fertilizer>levels of N-fertilizer. 2. The highest dentrification rate was observed in organic matter content of 3.0%, pH values at 6.0 with application of $KNO_3$ at levels of 20 mgN/100g soil. 3. For the evolution of I mole $N_2O$ gas, averaged carbon consumption was obtained as 0.5 mole in all these experiment condition. However, the highest carbon consumption rate was obtained in organic matter contents for 1.0% with application of $(NH_4)_2SO_4$ at levels of 10 mgN/100g soil (1.06 mole) while lowest carbon consumption rate was obtained in organic matter contents for 3.0% with application of $KNO_3$ at levels of 20 mgN/100g soil (0.13 mole). 4. According to Michaelis-Menten's equation, the V/2 values for evolution of $N_2O$ gas was estimated by progress curve. The results obtained was as 550 ug for $(NH_2)_2CO$ and 1100 ug $N_2O/100g$ soil by application of $KNO_3$ in organic matter contents of 1.0% soil. On the other hand, when the application $(NH_4)_2SO_4$ the V/2 values of $N_2O$ gas was obtained as the amount of 490 ug/100g soil while V/2 values of $N_2O$ gas by application of $KNO_3$ was on the linear line in soil organic matter contents of 3.0%.

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Properties of the Amorphous Silicon Microbolometer using PECVD (PECVD 이용한 비정질 실리콘형 마이크로 볼로미터 특성)

  • Kang, Tai Young;Kim, Kyung Hwan
    • Journal of the Semiconductor & Display Technology
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    • v.11 no.4
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    • pp.19-23
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    • 2012
  • We report microbolometer characteristic with n-type and p-type amorphous silicon thin film. The n-type and p-type amorphous silicon thin films were made by PECVD. The electrical properties of n-type and p-type a-Si:H thin films were investigated as a function of doping gas flow rate. The doping gas used $B_2H_6/Ar$ (1:9) and $PH_3/Ar$ (1:9). In general, the conductivity of doping a-Si:H thin films increased as doping gas increase but the conductivity of a-Si:H thin films decreased as the doping gas increase because doping gas concentration increase led to dilution gas (Ar) increase as the same time. We fabricated an amorphous silicon microbolometer using surface micromachining technology. The fabricated microbolometer had a negative TCR of 2.3%. The p-type microbolometer had responsivity of $5{\times}10^4V/W$ and high detectivity of $3{\times}10^8cm(Hz)^{1/2}/W$. The p-type microbolometer had more detectivity than n-type for less noise value.

Magnetoresistance Properties of Spin Valves Using MoN Underlayer (MoN 하지층을 이용한 스핀밸브의 자기저항 특성)

  • Kim, Ji-Won;Jo, Soon-Chul;Kim, Sang-Yoon;Ko, Hoon;Lee, Chang-Woo
    • Journal of the Korean Magnetics Society
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    • v.16 no.5
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    • pp.240-244
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    • 2006
  • In this paper, magnetic properties and annealing behavior of spin valve structures using Mo(MoN) layers as underlayers were studied varying the thickness of the underlayers. The spin valve structure was consisted of Si substrate/$SiO_2(2,000{\AA})/Mo(MoN)(t{\AA})/NiFe(21\;{\AA})/CoFe(28\;{\AA})/Cu(22\;{\AA})/CoFe(18\;{\AA})/IrMn(65\;{\AA})/Ta(25\;{\AA})$. Also, MoN films were deposited on Si substrates and their thermal annealing behavior was analyzed. The resistivity of the MoN film increased as the $N_2$ gas flow rate was increased. After annealing at $600^{\circ}C$, XRD results did not show peaks of silicides. XPS results indicated MoN film deposited with 5 sccm of $N_2$ gas flow rate was more stable than the film deposited with 1 sccm of $N_2$ gas flow rate. The variations of MR ratio and magnetic exchange coupling fold were small for the spin valve structures using Mo(MoN) underlayers up to thickness of45 ${\AA}$. MR ratio of spin valves using MoN underlayers deposited with various $N_2$ gas flow rate was about 7.0% at RT and increased to about 7.5% after annealing at $220^{\circ}C$. Upon annealing at $300^{\circ}C$, the MR ratio decreased to about 3.5%. Variation of $N_2$ gas flow rate up to 5 sccm did not change the MR ratio and $H_{ex}$ appreciably.

Effect of Nitrogen Gas Packing and ${\gamma}-Oryzanol$ Treatment on the Shelf Life of Yukwa(Korean Traditional Snack) (질소치환포장 및 ${\gamma}-Oryzanol$ 첨가가 유과의 저장성에 미치는 영향)

  • Park, Yoon-Jung;Chun, Hyang-Sook;Kim, Sang-Sook;Lee, Jong-Mee;Kim, Kyu-Heun
    • Korean Journal of Food Science and Technology
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    • v.32 no.2
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    • pp.317-322
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    • 2000
  • This study examined the effect of nitrogen$(N_2)$ gas packing and ${\gamma}-oryzanol$ treatment on the shelf life of Yukwa(Korean traditional snack). Yukwa were stored with $N_2$ gas packing(AN), $N_2$ gas packing with ${\gamma}-oryzanol$ treatment(ANA), and PE film packing with air(PE) for 20 days at $60^{\circ}C$. They were evaluated by POV, AV, conjugated diene, hexanal, color and sensory characteristics. The POV, AV and conjugated diene content increased abruptly in PE and AN, but increased slowly in ANA with prolonged storage. Higher sensory scores for Yukwa were found in ANA as compared to those in PE and AN. Hexanal content, yellowness and redness in AN were higher than those in ANA and PE. The moisture content, which is supposed to be related with browning of Yukwa, was 3 times higher in AN than that in PE. Oxygen content of each Yukwa pack, even in $N_2$ gas packing, increased remarkably as storage period increased because their highly porous, fragile and syrup-coated structure resulted in incomplete degassing before $N_2$ gas was flushed into package. Consequently, $N_2$ gas packing was inefficient, but $N_2$ gas packing combined with antioxidant(such as ${\gamma}-oryzanol$) treatment was effective for the extension of shelf life of Yukwa.

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A study on the ${NO}_{2}$ gas detection characteristics of the organic ultra-thin films (CuTBP, ${Li}_{2}Pc$, ${C}_{22}$Py(TCNQ), PAAS LB Films) (유기 초박막 (CuTBP, ${Li}_{2}Pc$, ${C}_{22}$Py(TCNQ), PAAS LB막)의 ${NO}_{2}$ 가스 탐지 특성에 관한 연구)

  • 김형석;유병호;조형근;한영재;김태완;김정수
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.44 no.4
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    • pp.496-501
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    • 1995
  • The N $O_{2}$ gas-detection characteristics were investigated using the functional organic Langmuir-Blodgett (LB) films of Copper-tetra-tert-butylphthalocyanine (CuTBP), Dilithium phthalocyanine (Li$_{2}$Pc), N-docosylpyridinium TCNQ(C$_{22}$Py(TCNQ)), Polyamic acid alkylamine salts (PAAS). The optimum conditions for a film deposition were obtained through a study of .pi.-.ALPHA. isotherms and the deposited film status was confirmed by electrical and optical methods such as UV/visible absortion spectra, thickness measurements by ellipsometry, and electrical capacitances. A response of the LB films to the N $O_{2}$ gas was measured by a change of the electrical conductivities when the film is exposed to the gases. The CuTBP LB film shows the biggest change of the electrical conductivities when it is exposed to the N $O_{2}$ gases. And the order of gas-detection performance is the following;Li$_{2}$Pc, $C_{22}$Py(TCNQ), and PAAS LB films. Especially, the CuTBP and Li$_{2}$Pc LB films not only show the bigger change in the electircal conductivities when exposed to the gas, but return to the original state when the gas is desorbed.d.

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Physical Property of W-C-N Diffusion Barrier through Stress-Strain curve (Stress-Strain curve를 이용한 W-C-N 확산방지막 물성 특성 연구)

  • Lee, Kyu-Young;Kim, Soo-In;Park, Sang-Jae;Lee, Dong-Kwan;Jeong, Yong-Rok;Jung, Jun;Lee, Jong-Rim;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
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    • v.20 no.4
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    • pp.266-270
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    • 2011
  • This paper suggest tungsten (W)-carbon (C)-nitrogen (N) thin films for diffusion barrier that W is main material and C and N are additives. W-C-N thin films are deposited with fixed rates of W and C but with a variation of $N_2$ gas flow and W-C-N thin films are heated at $600^{\circ}C$. From the experimental results, the variation of elastoplastic region for W-C-N thin film measured by tribological property is larger than that of elastic region with a variation of $N_2$ gas flow. These results show that the $N_2$ gas flow is more directly related with the elastoplastic region of W-C-N thin film. Nanoindenting test executed 16 times consecutively and we got the stress-strain curve graphs and hardness datas at each sample. Through the stress-strain curve graphs, the standard diviation of stress-strain curve for $N_2$ gas flow rate of 2.0 sccm is smaller than that of 0, 0.5, 1.5 sccm. Consequently, the physical stability of W-C-N thin film depends on the flow rate of $N_2$ gas.