• Korean Journal of Materials Research
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• v.6 no.7
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• pp.709-715
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• 1996

The influence of an electric field on the combustion synthesis of ${Ti}_{5}{Si}_{3}$-x ${ZrO}_{2)$(0 $\leq$ x $\leq$0.6)was investigated. Composite of X $\geq$0.45 can only be synthesized in the presence of an electric field. Although in the absence of an electri field the system with x = 0.45 and x=0.6 can sustain a nonsteady combustion wave, the reaction is not complete. That is, an unstable wave propagates to the middle of the sample and them becomes extinguished. Wave velocity o the ${Ti}_{5}{Si}_{3}-{ZrO}_{2}$ Composites slightly increases with the imposition of external field across the sample.

• Korean Chemical Engineering Research
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• v.50 no.5
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• pp.772-777
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• 2012

Factors acting on the deactivation of $V_2O_5/TiO_2$ catalysts were investigated in the selective catalytic reduction(SCR) process for long term operation. The activity of $V_2O_5/TiO_2$ catalysts was decreased rapidly after 8 months from the starting of operation in the selective catalytic reaction processes. From ICP-AES analysis, the deactivation of the used catalysts could be caused from the calcium component included in urea solution as a reducing agent. It was found from the $NH_3$-TPD experiments that the strong basic element like Ca component drastically affected the acidity of the $V_2O_5/TiO_2$ catalyst. The results gave an explanation on the reason why the component of Ca, even though its concentration is very low, could lead to the deactivation of $V_2O_5/TiO_2$ catalyst in the selective catalytic reaction processes.

• Journal of Korean Society of Environmental Engineers
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• v.27 no.1
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• pp.59-66
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• 2005

[ $TiO_2$ ] was deposited by DC magnetron sputtering on glass surface under various sputtering parameters such as discharge power($0.6{\sim}5.2\;kW$, substrate temperature($R.T{\sim}350^{\circ}C$), Ar and $O_2$ flow ratio with $0{\sim}50\;sccm$($Ar+O_2$ 90 sccm) and about 1 mtorr of pressure. TiO-N thin film was prepared under same sputtering conditions for $TiO_2$ thin film except flow ratio($Ar+O_2+N_2$ 90 sccm). The sheet resistance of thin films deposited under these parameters was measured to analyze electronic characteristic and thin film's thickness(${\alpha}$-step), surface roughness(AFM) and formation construction(FE-SEM, XRD) were also measured to draw optimal sputtering parameters. In order to evaluate photo-activity of thin film($TiO_2$, TiO-N) made in optimal parameters for removal of pollutants, toluene among VOCs and Suncion Yellow among reactive dyes were chosen to probe organic compounds for photo-degradation. It was shown that the photo-catalytic thin films had a significant photo-activation for the chosen contaminants and especially TiO-N thin film showed maximum efficiency of 33% for toluene(5 ppm) removal in visible-light range.

• Bulletin of the Korean Chemical Society
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• v.30 no.2
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• pp.302-308
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• 2009

This study investigated the production of hydrogen over Ga (1.0, 2.0, and 5.0 mol%)-$TiO_2$ photocatalysts prepared by a solvothermal method. The absorption band was slightly blue-shifted upon the incorporation of the gallium ions, but the intensity of the photoluminescence (PL) curves of Ga-incorporated $TiO_2$s was distinguishably smaller, with the smallest case being the 2.0 mol% Ga-$TiO_2$, which was related to the recombination between the excited electrons and holes. $H_2$ evolution from photo splitting of water over Ga-incorporated $TiO_2$ in the liquid system was enhanced, compared to that over pure $TiO_2$; particularly, the production of 5.6 mL of $H_2$ gas after 8 h when 1.5 g of the 2.0 mol% Ga-incorporated $TiO_2$ was used.

• Applied Chemistry for Engineering
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• v.7 no.4
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• pp.750-756
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• 1996

$TiO_2$ was dispersed in zeolite and glass filter by soaking them in isopropanol solution of titanium tetraisopropoxide and drying in the air, followed by calcination at $500^{\circ}C$. The analysis of chlorothalnoil was carried out by gas chromatograph with an electron capture detector. Chlorothalnoil was degraded photocatalytically over the matrix-supported $TiO_2$ efficiently and could be completely photodegraded after 3hrs. Production were 5.0ppm of $Cl^-$ for $TiO_2$ supported zeolite, 7.5ppm of $Cl^-$ for $TiO_2$ supported glass filter and 2.0ppm of $Cl^-$ for $TiO_2$ powder. But, $CN^-$ was lower than the detection limit irrespective of matrices.

• Clean Technology
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• v.21 no.4
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• pp.265-270
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• 2015

In order to increase the capacity of the lithium ion battery, the capacity of the anode should be increased. SnO₂ and Li₄Ti₅O₁₂ were studied to replace the graphite as the anode materials. In this study, SnO₂/Li₄Ti₅O₁₂ composite materials were synthesized by solid-state method. The study reported here attempts to enhance the electrochemical capacity of Li₄Ti₅O₁₂ through the incorporation of SnO₂. Sn-based Li ion storage materials are loaded on Li₄Ti₅O₁₂ surface. The SnO₂/Li₄Ti₅O₁₂ composite material has higher capacity than Li₄Ti₅O₁₂, but the cycling capacity was decreased due to SnO₂.

• Journal of the Microelectronics and Packaging Society
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• v.7 no.2
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• pp.37-42
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• 2000

The comparative study of texture of Al/Ti thin films deposited on low-dielectric polymer and $SiO_2$substrates has been investigated. Fifty-nm-thick Ti films and 500-nm-thick Al-1%Si-0.5%Cu (wt%) films were deposited sequentially onto low-k polymers and $SiO_2$by using a DC magnetron sputtering system. The texture of Al thin film was determined using X-ray diffraction (XRD) theta-2theta ($\theta$-2$\theta$) and rocking curve and the microstructure of Al/Ti films on low-k polymer and $SiO_2$substrates was characterized by cross-sectional transmission electron microscopy (TEM). Both the $\theta$-2$\theta$ method and rocking curve measurement suggest that Al/Ti thin films deposited on $SiO_2$have stronger texture than those deposited on low-k polymer. The texture of Al thin films strongly depended on that of Ti films. Cross-sectional TEM revealed that grains of Ti films on $SiO_2$substrates had grown perpendicular to the substrate, while the grains of Ti alms on SiLK substrates were formed randomly. The lower degree of (111) texture of Al thin films on low-k polymer was due to Ti underlayer.

• Proceedings of the KIEE Conference
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• 2008.05a
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• pp.161-163
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• 2008

$TiO_2-V_2O_5$ sol was fabricated using sol-gel method and $TiO_2-V_2O_5$, thin films were fabricated using dip-coating method. $V_2O_5$ sol was added 0.01mole, 0.03mole, 0.05mole into $TiO_2$ sol. Capacitance of thin films decreased with increasing $V_2O_5$ additive and it increased largest at 0.01mole. Because adsorption time and desorption time of thin films was about 2 minutes 40 seconds and about 3 minutes 40 seconds respectively, adsorption time was faster about 1 minutes than desorption time.

• Bulletin of the Korean Chemical Society
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• v.32 no.9
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• pp.3317-3322
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• 2011

This study examines the photoelectric conversion efficiency of dye-sensitized solar cells (DSSCs) when nanometer-sized Zr (0.1, 0.5, and 1.0 mol %)-$TiO_2$ prepared using a solvothermal method is utilized as the working electrode material. The particle sizes observe in the transmission electron microscopy (TEM) images are < 30 nm in all samples. The absorption band is slightly broadened at the tail for the 0.1 mol % Zr-$TiO_2$, and the intensity of the photoluminescence (PL) curves of the Zr-incorporated $TiO_2$ is significantly smaller than that of the pure $TiO_2$. Compared to that using pure $TiO_2$, the energy conversion efficiency is enhanced considerably by the application of Zr-$TiO_2$ in the DSSCs to approximately 6.17% for 0.5 mol % Zr-$TiO_2$ with the N719 dye (10.0 ${\mu}m$ film thickness and 5.0 mm ${\times}$ 5.0 mm cell area) under 100 mW/$cm^2$ of simulated sunlight.

• Journal of Korean Ophthalmic Optics Society
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• v.5 no.1
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• pp.7-11
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• 2000

The anti-reflective anti-static (ARAS) optical film is designed using absorbent materials such as ITO, $TiN_xW_y$, Ag by Essential Macleod program. [air ${\mid}TiN_xW_y{\mid}SiO_2{\mid}$ glass] two layer shows wide-band AR coating in the wavelength range of 450~700 nm. The reflectivity, transmittance of this coating are below 0.5%, about 75%, respectively. [air $SiO_2{\mid}TiO_2{\mid}SiO_2{\mid}$, ITO glass] layer can adjust reflectance of below 0.5% with above 97% transmittance. In the [air ${\mid}SiO_2{\mid}TiO_2{\mid}SiO_2{\mid}$ Ag glass] layer, the transmission can be controlled at above 96% with reflectance of 1~2%.