• Applied Chemistry for Engineering
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• v.17 no.6
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• pp.597-603
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• 2006

In order to study the effects of $GeO_{2}$ contents in $XSiO_{2}{\cdot}YGeO_{2}$ and $XSiO_{2}{\cdot}YNa_{2}O{\cdot}ZGeO_{2}$ compounds on far infrared ray radiation, we investigated the sample of $XSiO_{2}{\cdot}YGeO_{2}$ and $XSiO_{2}{\cdot}YNa_{2}O{\cdot}ZGeO_{2}$ using TG-DTA, XRD, FT-IR spectrophotometer and FT-IR spectrometer. The far infrared ray emissivity and emission power were increased with the increase of $GeO_{2}$ contents in $XSiO_{2}{\cdot}YGeO_{2}$ and $XSiO_{2}{\cdot}YNa_{2}O{\cdot}ZGeO_{2}$ compounds. The far infrared ray emissivity and emission power of $XSiO_2{\cdot}YGeO_2$ compounds were higher than those of $XSiO_{2}{\cdot}YNa_{2}O{\cdot}ZGeO_{2}$ compounds.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.453-453
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• 2010

In this study, zinc germanate ($Zn_2GeO_4$) thin films has been synthesized by using radio frequency magnetron sputtering and the divalent manganese-activated luminescence was characterized. X-ray diffraction patterns of the as-deposited $Zn_2GeO_4$:Mn films showed only a broad feature, indicative of an amorphous structure. Scanning electron microscopy images revealed that the as-deposited $Zn_2GeO_4$:Mn has a smooth surface morphology. The $Zn_2GeO_4$:Mn films were found to be crystallized by annealing in air ambient at temperatures as low as $700^{\circ}C$. The annealed $Zn_2GeO_4$:Mn possessed a rhombohedral polycrystalline structure. The broad-band photoluminescent emission spectrum from 470 to 650nm was obtained at room temperature from the $Zn_2GeO_4$:Mn films. The emission peak was centered at around 535nm in the green range, which originates from the intrashell transition of manganese $3d^5$ electrons from $^4T_1$ excited-state level to the $^6A_1$ ground state. The PL emission spectrum had an asymmetric line shape, which results from the $^3d_5$ electron transitions of divalent manganese ions located at different sites of the zinc germanate host crystal lattice. Electroluminescent devices were fabricated using $Zn_2GeO_4$:Mn as an emission layer. The fabricated devices showed a green EL emission similar to the PL emission. The CIE chromaticity color coordinates of the EL emission were determined to be x=0.308 and y=0.657.

• Analytical Science and Technology
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• v.8 no.3
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• pp.371-374
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• 1995

An organic germanium compound, Ge-132, was reported to have interferon inducer activity, anti-tumor activity and anti-viral activity. ICP, AA and colorimetry methods were used for the determination of germanium in Ge-132. However these methods have a problem that they only give an information on the total amount of germanium element, and consequently Ge-132 connot be distinguished form toxic inorganic Ge compounds. To overcome this problem, ion chromatography was used to analyze Ge-132. Ge-132 was separated on Ionpac AS4A column with 1.3mM $Na_2B_4O_7$ buffer(pH=9.2) solution as an eluent and detected by the conductivity detector. Correlation coefficient of the calibration curve was 0.999 and the detection limit measured at S/N ratio of 3 was 50pmol. This method was applicable to the analysis of Ge-132 raw material and Ge-132 preparations.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.1 no.2
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• pp.34-45
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• 1991

The fundamental conditions for growing $r-6Bi_2O_3{\cdot}GeO_2$ (BGO) single crystal plates by EFG (Edge -defined Film-fed Growth) method, were investigated and the characterization, quality test were carried out for obtained BGO single crystal plates. The optimum growing conditions determined in this study were as follows: ${\cdot}$ temperature gradient: 22^{\circ}C/cm

• Proceedings of the Materials Research Society of Korea Conference
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• 1997.10a
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• pp.110-110
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• 1997

• Proceedings of the IEEK Conference
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• 1998.06a
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• pp.453-456
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• 1998

The electrical properties of $Si_{1-x}Ge_{x}$ samples have been investigated. The sample structures were grown by MBE (molecular geam epitaxy) with Ge mole-fraction of x=0.0, x=0.05, x=0.1, and x=0.2. To examine the influence of the thermal processing, the $O_{2}$ and N$_{2}$ process were performed at 800[.deg. C] and 900[.deg. C], respectively. After this thermal process, hall measurements have been done over a wide range of the ambient temperature between 320[.deg. K] and 10[.deg. K] to find the temperature dependence using the comparessed-He gas system. The Ge-rich layer has been formed at the $SiO_{2}$/SiGe interface and it has an effect on the hall mobility. And it has been found that hall mobility was increased by the $N_{2}$ annealing process comparing with dry oxidation process at both 800[.deg.C] and900[.deg. C].

• ETRI Journal
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• v.23 no.4
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• pp.151-157
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• 2001

Spectroscopic and thermal analysis indicates that tellurite glasses doped with $B_2O_3$ and $GeO_2$ are promising candidate host materials for wide-band erbium doped fiber amplifier (EDFA) with a high 980 nm pump efficiency. In this study, we measured the thermal stabilities and the emission cross-sections for $Er^{3+}:^{4}I_{13/2}\;{\to}\;^{4}I_{15/2}$ transition in this tellurite glass system. We also determined the Judd-Ofelt parameters and calculated the radiative transition rates and the multiphonon relaxation rates in this glass system. The 15 mol% substitution of $B_2O_3$ for $TeO_2$ in the $Er^{3+}-doped\;75TeO_2-20ZnO-5K_2O$ glass raised the multiphonon relaxation rate for $^4I_{11/2}\;{\to}\;^4I_{13/2}$ transition from 4960 $s^{-1}$ to 24700 $s^{-1}$, but shortened the lifetime of the $^4I_{13/2}$ level by 14 % and reduced the emission cross-section for the $^4I_{13/2}\;{\to}\;^4I_{15/2}$ transition by 11%. The 15 mol% $GeO_2$ substitution in the same glass system also reduced the emission cross-section but increased the lifetime by 7%. However, the multiphonon relaxation rate for $^4I_{11/2}{\to}^4I_{13/2}$ transition was raised merely by 1000 $s^{-1}$. Therefore, a mixed substitution of $B_2O_3$ and $GeO_2$ for $TeO_2$ was concluded to be suitable for the 980 nm pump efficiency and the fluorescence efficiency of $^4I_{13/2}{\to}^4I_{15/2}$ transition in $Er^{3+}-doped$ tellurite glasses.

• Proceedings of the Materials Research Society of Korea Conference
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• 1993.11a
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• pp.57-58
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• 1993

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.7
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• pp.584-588
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• 2011

The ZnO thin films doped with Ga and Ge (GZO:Ge) were prepared on glass substrate using RF sputtering system. Structural, morphological and optical properties of the films deposited in different temperatures were studied. Proportion of the element of using target was 97 wt% ZnO, 2.5 wt% Ga and 0.5 wt% Ge with 99.99% highly purity. Structural properties of the samples deposited in different temperatures with 200 w RF power were investigated by field emission scanning electron microscopy, FE-SEM images and x-ray diffraction XRD analysis. Atomic force microscopy, AFM images were able to show the grain scales and surface roughness of each film rather clearly than SEM images. it was showed that increasing temperature have better surface smoothness by FE-SEM and AFM images. Transmittance study using UV-Vis spectrometer showed that all the samples have highly transparent in visible region (300~800 nm). In addition, it can be able to calculate bandgap energy from absorbance data obtained with transmittance. The hall resistivity, mobility, and optical band gap energy are influenced by the temperature.

• Journal of the Korean Ceramic Society
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• v.35 no.4
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• pp.364-370
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• 1998

Boron-phoshor-silicate glass was fabricated on Si substrates by FHD(Flame Hydrolysis Deposition) The microstructrue of silica soot deposited at various conditon such as composition and substrate temperature was analysed by SEM. After consolidation the refractive index and composition of the silica layer were in-vestigated. For refractive index control B, P and Ge were used as additive elements while B and Ge oxides are easily mixed into $SiO_2$, P oxide($B_2O_3$) doping is difficult because of the volatile property due to low melt-ing point. Boron-phosphorous-silicate glass (BPSG) layer were fabricated using bertical torch and optimized flame temperature substrate temperature and distance of torch and substrate. P concentration of BPSG lay-er measured 3.3 Wt% and the consolidation temperature was lower than $1180^{\circ}C$. The measured refractive index of BPSG silica layer in $1.55\;\mu\textrm{m}$ wavelength was $1.4480{\pm}1{\times}10^{-1}$ and the thickness was $22{\pm}1\;\mu\textrm{m}$.