• Title/Summary/Keyword: $A_2O$공정

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The Process Control Using Modeling Technique in A2O Sewage Treatment Process (모델링기법을 이용한 A2O 하수처리공정에서 주요 공정관리에 관한 연구)

  • Park, Jung Soo;Kim, Sung Duk;Seung, Dho Hyon
    • Journal of Korean Society of Disaster and Security
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    • v.13 no.2
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    • pp.65-75
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    • 2020
  • The efficiency of sewage treatment was ananlyzed selecting a sewage treatment plant in Gyeonggi-do where A2O process was applied. Statistical techniques based on the operation data of the sewage treatment were used. The main factors directly affecting the efficiency of the treatment process were analyzed using a GPS-X model. The correlation analysis and one-way ANOVA were performed. The T-N and NH4+-N values of the effluent did not generate statistically significant level (p-value:>0.05) when compared with C/N ration values. Removel of nitrogen components form sewage treatment plants were affected by temperature, HRT, SRT and DO. In the case of BOD, all operating factors were affected, while COD was affecte by factors of HRT, STR and DO. In simulations using GPS-X, the parameters that greatly influence was included the maximum sedimentation rate, the dependent nutrient microbial yield (anoxic), the phosphorus saturation coefficient, the dependent nutrient microbial killing rate, the dependent nutrient microbial maximum growth rate, and the independent trophic microorganisms. The maximum growth rate and the maximum setting rate were identified.

Optimum Processing Conditions for Pesticides Removal in Mandarine Orange Peel by Ultraviolet Rays and Photocatalytic Materials (자외선과 광 촉매제를 이용한 감귤껍질 농약제거공정의 최적화)

  • Kim, Hee-Sun;Han, Myung-Ryun;Kim, Ae-Jung;Kim, Myung-Hwan
    • Food Engineering Progress
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    • v.15 no.1
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    • pp.28-33
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    • 2011
  • UV-C and -B types of lamps, and $H_2O_2$ as a photocatalytic material were applied to optimize processing conditions for pesticides removal in Mandarine orange peel. Factors to affect the removal of pestrcides were arranged as a function of irradiation temperature, irradiation time, and $H_2O_2$ spray concentration. The optimum processing conditions for the chloropyrifos and the EPN removals in Mandarine orange peel were irradiation time of 60 min, irradiation temperature of $45^{\circ}C$ and $H_2O_2$ spray concentration of 1000 ppm. However, the optimum processing conditions for methidathion removal were 60 min of irradiation time, $40^{\circ}C$ of irradiation temperature and 1000 ppm of $H_2O_2$ spray concentration. The residual percentages of chloropyrifos, EPN and methidathion were 46, 49 and 28% after above irradiation processing, respectively.

Chemical Stability Evaluation of Ceramic Materials for Liquid Cadmium Cathode (액체카드뮴음금용 세라믹 소재의 화학적 안정성 평가)

  • Ku, Kwang-Mo;Ryu, Hong-Youl;Kim, Seung-Hyun;Kim, Dae-Young;Hwang, Il-Soon;Sim, Jun-Bo;Lee, Jong-Hyeon
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.11 no.1
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    • pp.23-29
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    • 2013
  • LCC (Liquid cadmium cathode) is used for electrowinning in pyroprocessing to recover uranium and transuranic elements simultaneously. It is one of the core technologies in pyroprocessing with higher proliferation resistance than a wet reprocessing because LCC-cell does not separate TRU from uranium. The crucible which holds the LCC is technically important because it should be nonconducting material to prevent deposition of metallic elements on the crucible outer surface. The chemical stability is also crucial factor to choose crucible material due to the strong reactivities of TRU and possible incorporation of Li metal during the operation. In this study, the chemical stabilities of four kinds of representative ceramic materials such as $Al_2O_3$, MgO, $Yl_2O_3$ and BeO were thermodynamically and experimentally evaluated at $500^{\circ}C$ with simulated LCC. The contact angle of LCC on ceramic materials was measured as function of time to predict chemical reactivity. $All_2O_3$ showed poorest chemical stability and the pores in BeO contributed to a decreases in contact angle. MgO and $Y_2O_3$ have superior chemical stability among the materials.

Characteristics of SiOx thin films deposited by atmospheric pressure chemical vapor deposition using a double discharge system

  • Park, Jae-Beom;Gil, El-Ri;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.261-262
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    • 2011
  • 본 연구는 HMDS/$O_2$/He/Ar의 gas mixture를 이용하여 remote-type의 DBD source를 통한 APPECVD를 통한 SiOx 양질의 무기막 증착 공정을 개발하였다. 이때 기판에 바이어스를 인가 하거나 혹은 접지를 하여 대기압 플라즈마의 환경 내에서도 바이어스 효과를 확인할 수 있도록 double discharge system을 구축하였다. 그리고 이 double discharge system의 다양한 특성과 기존의 전형적인 DBD와 비교 하였을 때 어떠한 차이점을 가지는지에 대해서도 관찰하였다. 그리하여 전형적인 DBD system과 double discharge를 통해 증착된 SiOx 무기막의 특성을 역시 비교 관찰하였다. Gas mixture 중 HMDS의 유량이 증가함에 따라, 그리고 $O_2$ gas의 유량이 감소함에 따라 SiOx 무기막의 증착률은 감소하였다. 그러나, SiOx 무기막 내의 불순물들, 예를 들어, carbon 혹은 hydrogen 계열의 chemical bond에 대한 정성적인 양은 HMDS 의 유량이 증가하거나 혹은 $O_2$ gas의 양이 감소함에 따라 오히려 증가함을 관찰할 수 있었다. 그리고 기판에 바이어스를 인가하는 double discharge system을 사용하였을 경우, 같은 HMDS, $O_2$ gas 유량을 사용한 전형적인 DBD type의 증착 공정 보다 더 높은 공정 효율을 나타냄과 동시에 더 낮은 불순물 함량을 가짐을 알 수 있었다. 이러한 double discharge system을 통해 증착된 양질의 SiOx 무기막이 증착 되었음을 FT-IR을 통한 막질 분석을 통해 확인 할 수 있었다. 이러한 double discharge system의 증착 공정에 대한 긍정적인 효과들은 atmospheric discharge의 효율 향상에 따른 gas dissociation efficiency 증가와 이를 통한 HMDS 분해 및 산소와의 recombination 효율의 증가에 따른 결과로 사료된다.

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용액 공정을 통한 HfO2/ZrO2 구조 차이에 따른 Dielectric layer의 특성 변화 분석

  • Kim, Hyeon-Gi;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.312.2-312.2
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    • 2016
  • 본 연구에서는 $HfO_2$$ZrO_2$의 구조적 차이를 통한 Dielectric layer의 특성 변화에 대한 분석을 진행하였다. $HfO_2$$ZrO_2$ layer는 용액 공정을 통해 만들고, 용액의 농도는 0.2 M로 제작하여 Spin Coating으로 소자를 제작하였다. 각 소자들의 구조적인 차이를 위해 $HfO_2$/$HfO_2$, $ZrO_2$/$HfO_2$, $HfO_2$/$ZrO_2$, $ZrO_2$/$ZrO_2$ 층 순서로 제작되었다. 각 소자들의 Capacitance 값은 245.72, 259.81, 294.23, $312.12nF/cm^2$으로 측정 되었고, Leakage current 값은 1.01, 1.79, 0.09, $0.0910-1A/cm^2$으로 다소 높은 값으로 확인되었다. 또한 dielectric constant, k 값이 16.6, 17.6, 19.9, 21.2로 각각의 측정값들 모두 substrate쪽의 dielectric layer에 따라 비슷한 특성을 갖게 되는 것을 확인했다. 이를 통해 Electrode 쪽의 layer보다 Substrate 쪽의 layer의 영향이 더 큰 것을 알 수 있다.

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Removal of Chloramphenicol, Salicylic Acid and Ketoprofen using Various Oxidation Processes : Oxidation Kinetic Evaluation (다양한 산화공정을 이용한 수중의 Chloramphenicol, Salicylic Acid 및 Ketoprofen 의약물질 제거 : 산화 동력학 평가)

  • Son, Hee-Jong
    • Journal of Korean Society of Environmental Engineers
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    • v.32 no.2
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    • pp.219-226
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    • 2010
  • In order to evaluate a removal characteristic of chloramphenicol, salicylic acid and ketoprofen according to dose of oxidants, $Cl_2$, $O_3$ and $O_3/H_2O_2$ are used as oxidants in this study. In case of that $Cl_2$ is used for oxidizing harmaceuticals, chloramphenicol, salicylic acid and ketoprofen is not removed entirely at $Cl_2$ dose rang of 0.5~5.0 mg/L for 60 min. However, removal tendency of salicylic acid is so obviously at $Cl_2$ dose higher than 1.0 mg/L. In addition, as $Cl_2$ dose and contact time increase, the removal rate of salicylic acid is enhanced. When $O_3$ is used as oxidant, chloramphenicol and ketoprofen is not eliminated at $O_3$ dose range of 0.2~2.0 mg/L. On the contrary, 30~70% of salicylic acid is removed at $O_3$ dose of 1.0~5.0 mg/L. Only 30% removal of salicylic acid is achieved at contact time of 5 min, however, the removal rate is enhanced remarkably at contact time over 10 min. In experiments using $O_3/H_2O_2$ as an oxidant, we can find that $O_3/H_2O_2$ is much more effective than $O_3$ only for removal of 3 pharmaceuticals, and the efficiency is raised according to increase of $H_2O_2$ dose. On reaction rate constant and half-life of 3 pharmaceuticals depending on $Cl_2$, $O_3$ and $O_3/H_2O_2$ dose, experiments using $O_3/H_2O_2$ show that oxidation of pharmaceuticals is less effective as the $H_2O_2/O_3$ ratio increases to above pproximately 1.0 related to reaction rate constant. An oxidation of salicylic acid by $Cl_2$ and $O_3$ particularly has a comparatively high reaction rate constant comparing $O_3/H_2O_2$, and thus salicylic acid is easily eliminated in oxidation processes.

Degradation of electrical characteristics in Bio-FET devices by O2 plasma surface treatment and improving by heat treatment (O2 플라즈마 표면처리에 의한 Bio-FET 소자의 특성 열화 및 후속 열처리에 의한 특성 개선)

  • Oh, Se-Man;Jung, Myung-Ho;Cho, Won-Ju
    • Journal of the Korean Vacuum Society
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    • v.17 no.3
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    • pp.199-203
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    • 2008
  • The effects of surface treatment by $O_2$ plasma on the Bio-FETs were investigated by using the pseudo-MOSFETs on the SOI substrates. After a surface treatment by $O_2$ plasma with different RF powers, the current-voltage and field effect mobility of pseudo-MOSFETs were measured by applying back gate bias. The subthreshold characteristics of pseudo-MOSFETs were significantly degraded with increase of RF power. Additionally, a forming gas anneal process in 2 % diluted $H_2/N_2$ ambient was developed to recover the plasma process induced surface damages. A considerable improvement of the subthreshold characteristics was achieved by the forming gas anneal. Therefore, it is concluded that the pseudo-MOSFETs are a powerful tool for monitoring the surface treatment of Bio-FETs and the forming gas anneal process is effective for improving the electrical characteristics of Bio-FETs.

A Basic Study on Capture and Solidification of Rare Earth Nuclide (Nd) in LiCl-KCl Eutectic Salt Using an Inorganic Composite With Li2O-Al2O3-SiO2-B2O3 System (Li2O-Al2O3-SiO2-B2O3 구조의 무기합성매질을 이용한 LiCl-KCl 공융염 내 희토류 핵종(Nd)의 분리 및 고화에 관한 기초연구)

  • Kim, Na-Young;Eun, Hee-Chul;Park, Hwan-Seo;Ahn, Do-Hee
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.15 no.1
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    • pp.83-90
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    • 2017
  • The pyroprocessing of spent nuclear fuel generates LiCl-KCl eutectic waste salt containing radioactive rare earth nuclides. It is necessary to develop a simple process for the treatment of LiCl-KCl eutectic waste in a hot-cell facility. In this study, capture and solidification of a rare earth nuclide (Nd) in LiCl-KCl eutectic salt using an inorganic composite with a $Li_2O-Al_2O_3-SiO_2-B_2O_3$ system was conducted to simplify the existing separation and solidification process of rare earth nuclides in LiCl-KCl eutectic waste salt from the pyroprocessing of spent nuclear fuel. More than 98wt% of Nd in LiCl-KCl eutectic salt was captured when the mass ratio of the composite was 0.67 over $NdCl_3$ in the eutectic salt. The content of $Nd_2O_3$ in the Nd captured-composite reached about 50wt%, and this composite was directly fabricated into a homogeneous and chemical resistant glass waste in a monolithic form. These results will be utilized in designing a process to simplify the existing separation and solidification process.

Oxidation Added Wet Cleaning Process for Synthetic Diamonds (합성 다이아몬드를 위한 산화제가 첨가된 세정공정)

  • Song, Jeongho;Lee, Jiheon;Song, Ohsung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.8
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    • pp.3597-3601
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    • 2013
  • In this study, a wet cleaning process, P II, using aqua-regia and sulfuric acid mixture with oxidant agent ($K_2S_2O_8$, $P_2O_5$, $KMnO_4$, $H_2O_2$ etc) is proposed to remove the metastable phase of graphite such as graphene and DLC for high quality synthetic diamonds. The process employed the conventional acid cleaning process (P I) as well as P I+P II to remove the graphite related impurities from the 200um-diamond powders synthesized at 7GPa-$1500^{\circ}C$-5minutes. The degree of cleaning after P I and P I+P II has been observed by naked-eye, optical microscopy, micro-Raman spectroscopy, and TGA-DTA. After P I+P II, the color of diamond became more vividly yellow with enhanced saturation with naked eye and optical microscopy analysis. Moreover, the disappearance of diamond-like-carbon (DLC) peak ($1440cm^{-1}$) observed by Raman spectroscopy confirmed the decrease in amount of remaining impurities. TGA-DTA results showed that the graphite impurities first started to dissolve at $770.91^{\circ}C$ after PI process. However, the pyrolysis started at $892.18^{\circ}C$ after P I+P II process because of the dissolution of pure diamonds. This result proved the effective dissolution of the metastable phase of graphite. We expect that the proposed P II process may enhance the quality of diamonds through effective removal of surface impurities.

Stability Improvement of Amorphous-InGaZnO Thin-Film-Transistors Based SnO2 Extended-Gate Filed-Effect-Transistor Using Microwave Annealing

  • Lee, In-Gyu;Im, Cheol-Min;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.420-420
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    • 2014
  • 최근, 과학 기술이 발달함에 따라 현장에서의 실시간 검사 및 자가 지단 등 질병 치유에 대한 사람들의 관심이 증가하고 있으며, 이에 따라 의료, 환경, 산업과 같은 많은 분야에서 바이오 센서에 대한 연구가 활발하게 이루어지고 있다. 그 중, EGFET는 전해질 속의 각종 이온 농도를 전기적으로 측정하는 바이오 센서로, 외부 환경으로부터 안전하고, 제작이 쉬우며, 재활용이 가능하여 비용을 절감 할 수 있다는 장점을 가지고 있다 [1]. EGFET는 감지부와 FET부로 분리된 구조를 가지고 있으며, 감지부의 감지막으로는 Al2O3, HfO2, $TiO_2$, SnO2 와 같은 다양한 물질들이 사용되고 있다. 그 중, SnO2는 우수한 감도와 안정성을 가지고 있는 물질로 추가적인 열처리 공정 없이도 우수한 감지 특성을 나타내기 때문에 본 연구에서 감지막으로 사용하였다. 한편, EGFETs 의 FET부로는 기존의 비정질 실리콘 TFTs 에 비해 10배 이상의 높은 이동도와 온/오프 전류비를 갖는 InGaZnO 를 채널층으로 사용한 TFTs 를 사용하였다. a-IGZO 는 넓은 밴드 갭으로 인해 가시광 영역에서 투명하며, 향후 투명 바이오센서 제작 시, 물질들 사이의 반응을 전기적 신호뿐만 아니라 광학적인 분석 방법으로도 검출이 가능하기에 고 신뢰성을 갖는 센서의 제작이 가능할 것으로 기대된다. 한편, a-IGZO TFTs 의 경우 우수한 전기적 특성을 나타냄에도 불구하고 소자 동작 시 문턱 전압이 불안정하다는 단점이 있으며 [2], 이러한 문제의 개선과 향후 투명 기판 위에서의 소자 제작을 위해서는 저온 열처리 공정이 필수적이다. 따라서, 본 연구에서는 저온 열처리 공정인 u-wave 열처리를 통하여 a-IGZO TFTs 의 전기적 특성 및 안정성을 향상시켰으며, 9.51 [$cm2/V{\cdot}s$]의 이동도와 135 [mV/dec] 의 SS값, 0.99 [V]의 문턱 전압, 1.18E+08의 온/오프 전류 비를 갖는 고성능 스위칭 TFTs 를 제작하였다. 최종적으로, 제작된 a-IGZO TFTs 를 SnO2 감지막을 갖는 EGFETs 에 적용함으로써 우수한 감지 특성과 안정성을 갖는 바이오 센서를 제작하였다.

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