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http://dx.doi.org/10.5762/KAIS.2013.14.8.3597

Oxidation Added Wet Cleaning Process for Synthetic Diamonds  

Song, Jeongho (Department of Materials Science and Engineering, University of Seoul)
Lee, Jiheon (Department of Materials Science and Engineering, University of Seoul)
Song, Ohsung (Department of Materials Science and Engineering, University of Seoul)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.14, no.8, 2013 , pp. 3597-3601 More about this Journal
Abstract
In this study, a wet cleaning process, P II, using aqua-regia and sulfuric acid mixture with oxidant agent ($K_2S_2O_8$, $P_2O_5$, $KMnO_4$, $H_2O_2$ etc) is proposed to remove the metastable phase of graphite such as graphene and DLC for high quality synthetic diamonds. The process employed the conventional acid cleaning process (P I) as well as P I+P II to remove the graphite related impurities from the 200um-diamond powders synthesized at 7GPa-$1500^{\circ}C$-5minutes. The degree of cleaning after P I and P I+P II has been observed by naked-eye, optical microscopy, micro-Raman spectroscopy, and TGA-DTA. After P I+P II, the color of diamond became more vividly yellow with enhanced saturation with naked eye and optical microscopy analysis. Moreover, the disappearance of diamond-like-carbon (DLC) peak ($1440cm^{-1}$) observed by Raman spectroscopy confirmed the decrease in amount of remaining impurities. TGA-DTA results showed that the graphite impurities first started to dissolve at $770.91^{\circ}C$ after PI process. However, the pyrolysis started at $892.18^{\circ}C$ after P I+P II process because of the dissolution of pure diamonds. This result proved the effective dissolution of the metastable phase of graphite. We expect that the proposed P II process may enhance the quality of diamonds through effective removal of surface impurities.
Keywords
graphite related impurities; oxidant; Raman spectroscopy; synthetic diamonds; TGA;
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Times Cited By KSCI : 1  (Citation Analysis)
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