• Title/Summary/Keyword: $AFM_1$

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Synthesis and application of polymers using atmospheric pressure plasma (대기압 플라즈마를 이용한 폴리머 합성과 그 응용)

  • Yu, In-Geun;Yu, Seung-Min;Kim, Seong-Bong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.11a
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    • pp.346-346
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    • 2015
  • 대기압 플라즈마를 이용해 methyl methacrylate($C_5H_8O_2$) 모노머를 폴리머로 합성했으며, 그 결과를 FTIR, AFM, XRD 등으로 분석하고 특성을 평가했다. FTIR의 결과, C-O, C-H, C=O 등의 피크를 확인할 수 있었다. 그리고 XRD의 관찰결과 C 1s 및 O 1s의 각 binding energy가 reference[1]에서 제시하는 것과 일치하는 것을 확인할 수 있었다. 이렇게 확인된 시료를 AFM으로 관찰한 결과 폴리머 코팅층을 확인할 수 있었다.

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Atomic Force Microscopy(AFM) based Single Cell Manipulation and High Efficient Gene Delivery Technology (원자간력 현미경을 이용한 단일세포 조작 및 고효율 유전자 도입기술)

  • Han, Sung-Woong;Nakamura, Chikashi;Miyake, Jun;Kim, Woo-Sik;Kim, Jong-Min;Chang, Sang-Mok
    • Korean Chemical Engineering Research
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    • v.47 no.5
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    • pp.538-545
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    • 2009
  • The principle and application of a scanning probe microscopy(SPM) are reviewed briefly, and a low-invasive single cell manipulation and a gene delivery technique using an etched atomic force microscopy(AFM) probe tip, which we call a nanoneedle, are explained in detail. The nanoneedle insertion into a cell can be judged by a sudden drop of force in a force-distance curve. The probabilities of nanoneedle insertion into cells were 80~90%, which were higher than those of typical microinjection capillaries. When the diameter of the nanoneedle was smaller than 400 nm, the nanoneedle insertion into a cell over 1 hour had almost no influence on the cell viability. A highly efficient gene delivery and a high ratio of expressed gene per delivered DNA compared the conventional major nonviral gene delivery methods could be achieved using the gene modified nanoneedle.

Studies on the AFM analysis of Cu CMP processes for pattern pitch size and density after global planarization (패턴 피치크기 및 밀도에 따른 Cu CMP 공정의 AFM 분석에 관한 연구)

  • 김동일;채연식;윤관기;이일형;조장연;이진구
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.9
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    • pp.20-25
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    • 1998
  • Cu removal rates for various SiO$_2$ trench pitch sizes and densities and AFM images of surface profiles after global planarization using Cu CMP technology are investigated. In the experimental results, Cu removal rates are increasing as the pattern densities and pattern pitches are getting high and low, respectively, and then decreasing after local planarization. The rms roughness after global planarization are about 120$\AA$. AFM images with a 50% pattern density for 1${\mu}{\textrm}{m}$ and 2${\mu}{\textrm}{m}$ pitches show that thicknesses of 120~330$\AA$ Cu interconnects have been peeled off and oxide erosion of Cu/Sio$_2$ sidewall is observed. However, AFM images with a 50% pattern density for 10${\mu}{\textrm}{m}$ and 15${\mu}{\textrm}{m}$ pitches show that 260~340$\AA$ thick Cu interconnects have been trenched at the boundaries of Cu/Sio$_2$ sidewall.

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AFM fabrication of oxide patterns on 4H-SiC surface (4H-SiC 표면에서 AFM의 산화 패턴 제작)

  • Jo, Yeong-Deuk;Bahng, Wook;Kim, Sang-Cheol;Kim, Nam-Kyun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.64-64
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    • 2009
  • Atomic force microscopy (AFM) fabrication of oxide patterns is an attractive technique for nanoscale patterns and related device structures, SiC exhibits good performance in high-power, high-frequency, and high-temperature conditions that is comparable to the performance of Si. The AFM fabrication of oxide patterns on SiC is important for electronic applications. However, there has not been much reported investigations on oxidation of SiC using AFM. We achieved the local oxidation of 4H-SiC using the high loading force of ~100 nN, although the oxidation of SiC is generally difficult mainly due to the physical hardness and chemical inactivity. All the experiments were performed using atomic force microscopy (S.I.S. GmbH, Germany) with a Pt/Ir-coated Si tip at ~40% humidity and room temperature. The spring constant and resonance frequency of the tip were around ~3 N/m and ~70 kHz. We fabricated oxide patterns on n-type 4H-SiC ($\sim10^{19}/cm^3$) and n-type Si ($\sim1.9\times10^{16}/cm^3$). In summary, we demonstrated that the oxide patterns can be obtained over the electric field of ${\sim}\times10^7 V/cm$ and the high loading force using the tip as a cathode. The electric field transports the oxyanions (OH-) to the positively biased surface.

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A High-speed Atomic Force Microscope for Precision Measurement of Microstructured Surfaces

  • Cui, Yuguo;Arai, Yoshikazu;Asai, Takemi;Ju, BinFeng;Gao, Wei
    • International Journal of Precision Engineering and Manufacturing
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    • v.9 no.3
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    • pp.27-32
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    • 2008
  • This paper describes a contact atomic force microscope (AFM) that can be used for high-speed precision measurements of microstructured surfaces. The AFM is composed of an air-bearing X stage, an air-bearing spindle with the axis of rotation in the Z direction, and an AFM probe unit. The traversing distance and maximum speed of the X stage are 300 mm and 400 mm/s, respectively. The spindle has the ability to hold a sample in a vacuum chuck with a maximum diameter of 130 mm and has a maximum rotation speed of 300 rpm. The bandwidth of the AFM probe unit in an open loop control circuit is more than 40 kHz. To achieve precision measurements of microstructured surfaces with slopes, a scanning strategy combining constant height measurements with a slope compensation technique is proposed. In this scanning strategy, the Z direction PZT actuator of the AFM probe unit is employed to compensate for the slope of the sample surface while the microstructures are scanned by the AFM probe at a constant height. The precision of such a scanning strategy is demonstrated by obtaining profile measurements of a microstructure surface at a series of scanning speeds ranging from 0.1 to 20.0 mm/s.

Characterization of Light Effect on Photovoltaic Property of Poly-Si Solar Cell by Using Photoconductive Atomic Force Microscopy (Photoconductive Atomic Force Microscopy를 이용한 빛의 세기 및 파장의 변화에 따른 폴리실리콘 태양전지의 광전특성 분석)

  • Heo, Jinhee
    • Korean Journal of Materials Research
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    • v.28 no.11
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    • pp.680-684
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    • 2018
  • We investigate the effect of light intensity and wavelength of a solar cell device using photoconductive atomic force microscopy(PC-AFM). A $POCl_3$ diffusion doping process is used to produce a p-n junction solar cell device based on a polySi wafer, and the electrical properties of prepared solar cells are measured using a solar cell simulator system. The measured open circuit voltage($V_{oc}$) is 0.59 V and the short circuit current($I_{sc}$) is 48.5 mA. Moreover, the values of the fill factors and efficiencies of the devices are 0.7 and approximately 13.6 %, respectively. In addition, PC-AFM, a recent notable method for nano-scale characterization of photovoltaic elements, is used for direct measurements of photoelectric characteristics in limited areas instead of large areas. The effects of changes in the intensity and wavelength of light shining on the element on the photoelectric characteristics are observed. Results obtained through PC-AFM are compared with the electric/optical characteristics data obtained through a solar simulator. The voltage($V_{PC-AFM}$) at which the current is 0 A in the I-V characteristic curves increases sharply up to $18W/m^2$, peaking and slowly falling as light intensity increases. Here, $V_{PC-AFM}$ at $18W/m^2$ is 0.29 V, which corresponds to 59 % of the average $V_{oc}$ value, as measured with the solar simulator. Furthermore, while the light wavelength increases from 300 nm to 1,100 nm, the external quantum efficiency(EQE) and results from PC-AFM show similar trends at the macro scale but reveal different results in several sections, indicating the need for detailed analysis and improvement in the future.

Premature Stiffening of Cement Paste Associated with AFm Formation

  • Chung, Chul-Woo;Lee, Jae-Yong
    • Journal of the Korea Institute of Building Construction
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    • v.11 no.1
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    • pp.83-90
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    • 2011
  • The purpose of this research is to investigate the effect of AFm formation on the stiffening process of cement paste. High and low alkali sulfate clinkers were used for the experiments. The flow and stiffening behavior of cement paste was investigated using modified ASTM C403 penetration resistance test and oscillatory shear rheology. X-ray powder diffraction (XRD) was used for phase identification associated with stiffening of the paste. It was found from the results that low alkali clinker mixture produced very strong premature stiffening whereas high alkali clinker mixture did not cause premature stiffening. This is because of the large amount of alkali sulfate present in the clinker. Addition of calcium and sodium chloride to the high alkali clinker mixture caused faster stiffening and set.

Study on the Elastic Characteristics of Living Cells using Atomic Force Microscope Indentation Technique

  • Kwon Eun-Young;Kim Young-Tae;Kim Dae-Eun
    • KSTLE International Journal
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    • v.7 no.1
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    • pp.10-13
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    • 2006
  • In this work, imaging and study of elastic property of the living cell was performed. The motivation of this work was to seek the possibility of exploiting Young's modulus as a disease indicator using Atomic Force Microscope (AFM) and also to gain fundamental understanding of cell mechanics for applications in medical nanorobots of the future. L-929 fibroblast adherent cell was used as the sample. Imaging condition in cell culturing media environment was done in very low speed ($20{\mu}m/ s$) compared to that in the ambient environment. For measuring the Young's modulus of the living cell, AFM indentation method was used. From the force-distance curve obtained from the indentation experiment the Young's modulus could be derived using the Hertz model. The Young's modulus of living L-929 fibroblast cell was $1.29{\pm}0.2$ kPa.

The design of XYZ 3-axis stage for AFM system (AFM 시스템을 위한 XYZ 3축 스테이지의 설계)

  • 김동민;김기현;심종엽;권대갑;엄천일
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.36-36
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    • 2002
  • To Establish of standard technique of length measurent in 2D plane, we develope AFM system. The XY scanner scans the sample only in XY plane, while the Z scanner scans the specimen only in Z-direction. Cantilever tip is controlled to has constant height relative to speciman surface by feedback of PSPD signal. To acquire high accuracy, Z-axis measuring sensor will be added.(COXI or others). In this paper we design XYZ stage suitable for this AEM system. For XY stage, single module parallel-kinnematic flexure stage is used which has high orthogonality and minimum out-of-plane motion. To obtain best performance optimal design is performed. For XY stage, to be robust about parasitic motion optimal design of maximizing Z and tilt stiffness is performed under the constraint of motion range and stage size. And for Z stage, optimal design of maximizing 1st resonant frequency is performed. Because if resonant frequency is get higher, scan speed is improved. So it makes reduce the error by sensor drift. Resultly XYZ stage each have 1st natural frequency of 115㎐, 201㎐, 2.66㎑ and range 109㎛, 110㎛, 12㎛.

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Pitch Measurement of One-dimensional Gratings Using a Metrological Atomic Force Microscope and Uncertainty Evaluation (미터 소급성을 갖는 원자간력 현미경을 이용한 1차원 격자 피치 측정과 불확도 평가)

  • Kim Jong-Ahn;Kim Jae Wan;Park Byong Chon;Eom Tae Bong;Kang Chu-Shik
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.4
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    • pp.84-91
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    • 2005
  • We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.