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Pitch Measurement of One-dimensional Gratings Using a Metrological Atomic Force Microscope and Uncertainty Evaluation  

Kim Jong-Ahn (한국표준과학연구원 광기술표준부 길이그룹)
Kim Jae Wan (한국표준과학연구원 광기술표준부 길이그룹)
Park Byong Chon (한국표준과학연구원 광기술표준부 길이그룹)
Eom Tae Bong (한국표준과학연구원 광기술표준부 길이그룹)
Kang Chu-Shik (한국표준과학연구원 광기술표준부 길이그룹)
Publication Information
Journal of the Korean Society for Precision Engineering / v.22, no.4, 2005 , pp. 84-91 More about this Journal
Abstract
We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.
Keywords
Metrological atomic force microscope; Nanometrology; ID grating; Mean pitch; Uncertainty analysis;
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