불소수지의 무전해 동도금을 위한 단계적 플라즈마 전처리법에 관한 연구

Study on Two Step Plasma Treatment for Electroless Cu Plating of Fluoropolymer

  • 신승한 (한국생산기술연구원 나노표면기술팀) ;
  • 한성호 (한국생산기술연구원 나노표면기술팀) ;
  • 김영석 (한국생산기술연구원 나노표면기술팀)
  • Shin, Seung-Han (Surface Nano-technology Team, Korea Institute of Industrial Technology(KITECH)) ;
  • Han, Sung-Ho (Surface Nano-technology Team, Korea Institute of Industrial Technology(KITECH)) ;
  • Kim, Young-Seok (Surface Nano-technology Team, Korea Institute of Industrial Technology(KITECH))
  • 발행 : 2005.06.01

초록

Low temperature plasma treatment with different gases and rf powers were performed to improve the adhesion strength between polytetrafluoroethylene(PTFE) and electroless deposited copper. According to the research, $H_2$ plasma having hydrogen radical was more effective in surface polarity modification than $O_2$ plasma due to the defluorination reaction. However, surface roughness of PTFE was more increased with $O_2$ than $H_2$ plasma. PTFE treated with $120W-O_2$ plasma and $250w-H_2$ plasma, consecutively showed rougher surface than single step $250w-H_2$ plasma treated one and more hydrophilic than single step $120W-O_2$ plasma treated one. And it showed 5B tape test grade, which is better adhesion property than 1B or 3B obtained by single step plasma treatment. In addition, adhesion strength between PTFE and Cu deposit is also deeply affected by residual water on its interface.

키워드

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