• 제목/요약/키워드: wide bandgap

검색결과 139건 처리시간 0.031초

양면 중첩기법을 이용하는 새로운 광대역의 소형 포토닉 밴드갭 구조 (A Novel Wideband and Compact Photonic Bandgap Structure using Double-Plane Superposition)

  • 김진양;방현국
    • 한국전자파학회:학술대회논문집
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    • 한국전자파학회 2002년도 종합학술발표회 논문집 Vol.12 No.1
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    • pp.413-422
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    • 2002
  • A novel photonic bandgap(PBG) structure is proposed and measured for wide bandgap and compact circuit applications. The proposed structure realizes the ultra-wideband bandgap(2-octave) characteristics by superposing two different PBG structures into a coupled double-plane configuration. A low pass filter fabricated using 3-period of the PBG cells shows 2-octave 10 ㏈ stopband from 4.3 to 16.2 ㎓ and 0.2 ㏈ insertion loss in the passband. Moreover, we confirmed that 44∼70 % size reduction can be achieved using the proposed PBG structures. We expect this novel double-plane PBG structure is widely used for compact and wideband circuit applications, such as compact high-efficiency power amplifiers using harmonic tuning techniques.

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600V급 GaN Power SIT 설계 최적화에 관한 연구 (An Optimization of 600V GaN Power SIT)

  • 오주현;양성민;정은식;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.5-5
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    • 2010
  • Gallium Nitride(GaN)는 LED, Laser 등에 사용되는 광학적 특성뿐만 아니라 Wide Bandgap의 전기적 특성 또한 주목받고 있다. 본 논문은 600V급 GaN(Gallium Nitride) Power SIT(Static Induction Transistor)에 대해서 Design Parameter 변환에 따른 전기적 (Breakdown Voltgage, On-state Voltage Drop)특성과 열적 (Lattice Temperature Distribution)특성변화를 분석하여 소자가 갖는 구조적 손실을 최소화하였다. 또한, 기존 실리콘 기반 전력소자와 특성 비교를 통하여 GaN Power SIT의 우수성을 증명하였다. GaN Power SIT 소자 설계 및 최적화를 위해서 Silvaco사의 소자 시뮬레이터인 ATLAS를 사용하였다. 실험 결과 수 ${\mu}m$의 소자 두께만으로도 실리콘 전력소자에 비해 더 뛰어난 열 특성과 더 적은 전력소모를 갖는 600V급 GaN Power SIT 소자를 구현할 수 있었다.

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High efficiency deep blue phosphorescent organic light emitting diodes using a phenylcarbazole type phosphine oxide as a host material

  • Jeon, Soon-Ok;Yook, Kyoung-Soo;Lee, Jun-Yeob
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.188-191
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    • 2009
  • A high efficiency deep blue phosphorescent organic light-emitting diode (PHOLED) was developed using a new wide triplet bandgap host material (PPO1) with a phenylcarbazole and a phosphine oxide unit. The wide triplet bandgap host material was synthesized by a phosphornation reaction of 2-bromo-Nphenylcarbazole with chlorodiphenylphosphine. A deep blue emitting phosphorescent dopant, tris((3,5-difluoro-4-cyanophenyl)pyridine)iridium (FCNIr), was doped into the PPO1 host and a high quantum efficiency of 17.1 % and a current efficiency of 19.5 cd/A with a color coordinate of (0.14,0.15) were achieved in the blue PHOLED. The quantum efficiency of the deep blue PHOLED was better than any other quantum efficiency value reported up to now.

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Wide bandgap III-nitride semiconductors: opportunities for future optoelectronics

  • Park, Yoon-Soo
    • 한국결정성장학회지
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    • 제12권1호
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    • pp.11-20
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    • 2002
  • The world at the end of the $20^{th}$ Century has become "blue" Indeed, this past decade has witnessed a "blue rush" towards the development of violet-blue-green light emitting diodes (LEDs) and laser diodes (LDs) based on wide bandgap III-Nitride semiconductors. And the hard work has culminated with, first, the demonstration of commercial high brightness blue and green LEDs and of commercial violet LDs, at the very end of this decade. Thanks to their extraordinary properties, these semiconductor materials have generated a plethora of activity in semiconductor science and technology. Novel approaches are explored daily to improve the current optoelectronics state-of-the-art. Such improvements will extend the usage and the efficiency of new light sources (e.g. white LEDs), support the rising information technology age (e.g. high density optical data storage), and enhance the environmental awareness capabilities of humans (ultraviolet and visible photon detectors and sensors). Such opportunities and many others will be reviewed in this presentation.

Rhodomine B dye removal and inhibitory effect on B. subtilis and S. aureus by WOx nanoparticles

  • Ying, Yuet Lee;Pung, Swee Yong;Ong, Ming Thong;Pung, Yuh Fen
    • Journal of Industrial and Engineering Chemistry
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    • 제67권
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    • pp.437-447
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    • 2018
  • Visible-light-driven wide bandgap semiconductor photocatalysts were commonly developed via doping or coupling with another narrow bandgap metal oxide. However, these approaches required extra processing. The aim of study was to evaluate the photocatalytic performance of narrow bandgap $WO_x$ nanoparticles. A mixture of $WO_2$ and $WO_3$ nanoparticles were synthesized using solution precipitation technique. The photodegradation of RhB by these nanoparticles more effective in UV light than in visible light. In antibacterial susceptibility assay, $WO_x$ nanoparticles demonstrated good antibacterial against Gram-positive bacteria. The cell wall of bacterial was the main determinant in antibacterial effect other than $W^{4+}/W^{6+}$ ions and ROS.

Ag 함량이 진공증발법으로 형성된 광금지대 (Ag,Cu)(In,Ga)Se2 태양전지에 미치는 영향 (Effects of Ag Content on Co-evaporated Wide Bandgap (Ag,Cu)(In,Ga)Se2 Solar Cells)

  • 박주완;윤재호;조준식;유진수;이희덕;김기환
    • Current Photovoltaic Research
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    • 제3권1호
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    • pp.16-20
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    • 2015
  • Ag addition in chalcopyrite materials is known to lead beneficial changes in aspects of structural and electronic properties. In this work, the effects of Ag alloying of $Cu(In,Ga)Se_2$-based solar cells has been investigated. Wide bandgap $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x = 0.75~0.8) films have been deposited using a three-stage co-evaporation with various Ag/(Ag+Cu) ratios. With Ag alloying the $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x~0.8) films were found to have greater grainsize and film thickness. Device were also fabricated with the $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ (x~0.8) films and their J-V and quantum efficiency measurements were carried out. The highest-efficiency $(Ag,Cu)(In_{1-x},Ga_x)Se_2$ solar cell with Eg > 1.5 eV had an efficiency of 12.2% with device parameters $V_{OC}=0.810V$, $J_{SC}=21.7mA/cm^2$, and FF = 69.0%.

NVM IP용 저전압 기준전압 회로 설계 (Design of Low-Voltage Reference Voltage Generator for NVM IPs)

  • 김명석;정우영;박헌;하판봉;김영희
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2013년도 추계학술대회
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    • pp.375-378
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    • 2013
  • 본 논문에서는 EEPROM이나 MTP 등의 NVM 메모리 IP 설계에 필요로 하는 PVT(Process-Voltage-Temperature) 변동에 둔감한 기준전압(Reference Voltage) 회로를 설계하였다. 매그나칩반도체 $0.18{\mu}m$ EEPROM 공정을 이용하여 설계된 BGR(Bandgap Reference Voltage) 회로는 wide swing을 갖는 캐스코드 전류거울 (cascode current-mirror) 형태의 저전압 밴드갭 기준전압발생기 회로를 사용하였으며, PVT 변동에 둔감한 기준전압 특성을 보이고 있다. 최소 동작 전압은 1.43V이고 VDD 변동에 대한 VREF 민감도(sensitivity)는 0.064mV/V이다. 그리고 온도 변동에 대한 VREF 민감도는 $20.5ppm/^{\circ}C$이다. 측정된 VREF 전압은 평균 전압이 1.181V이고 $3{\sigma}$는 71.7mV이다.

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