• Title/Summary/Keyword: wet-plasma

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Effect of Plasma Pretreatment on Superconformal Cu Alloy Gap-Filling of Nano-scale Trenches

  • Mun, Hak-Gi;Lee, Jeong-Hun;Lee, Su-Jin;Yun, Jae-Hong;Kim, Hyeong-Jun;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.53-53
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    • 2011
  • As the dimension of Cu interconnects has continued to reduce, its resistivity is expected to increase at the nanoscale due to increased surface and grain boundary scattering of electrons. To suppress increase of the resistivity in nanoscale interconnects, alloying Cu with other metal elements such as Al, Mn, and Ag is being considered to increase the mean free path of the drifting electrons. The formation of Al alloy with a slight amount of Cu broadly studied in the past. The study of Cu alloy including a very small Al fraction, by contrast, recently began. The formation of Cu-Al alloy is limited in wet chemical bath and was mainly conducted for fundamental studies by sputtering or evaporation system. However, these deposition methods have a limitation in production environment due to poor step coverage in nanoscale Cu metallization. In this work, gap-filling of Cu-Al alloy was conducted by cyclic MOCVD (metal organic chemical vapor deposition), followed by thermal annealing for alloying, which prevented an unwanted chemical reaction between Cu and Al precursors. To achieve filling the Cu-Al alloy into sub-100nm trench without overhang and void formation, furthermore, hydrogen plasma pretreatment of the trench pattern with Ru barrier layer was conducted in order to suppress of Cu nucleation and growth near the entrance area of the nano-scale trench by minimizing adsorption of metal precursors. As a result, superconformal gap-fill of Cu-Al alloy could be achieved successfully in the high aspect ration nanoscale trenches. Examined morphology, microstructure, chemical composition, and electrical properties of superfilled Cu-Al alloy will be discussed in detail.

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Preparation and Pharmacokinetic evaluation of Captopril Matrix Tablets with Polyethylene Oxide (폴리에틸렌옥시드를 이용한 캅토프릴 매트릭스 정제의 제조 및 약물동력학적 평가)

  • Jiang, Ge;Baek, Myoung-Ki;Jee, Ung-Kil
    • Journal of Pharmaceutical Investigation
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    • v.29 no.1
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    • pp.7-12
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    • 1999
  • The captopril matrix tablets composed of polyethylene oxide(PEO) was prepared and administered to beagle dogs. Captopril matrix tablets were prepared using direct compressed method and wet granulation compressed method with various ratios of drug to PEO. The diffusion rate of captopril matrix tablets followed on the Higuchi's diffusion model. With increasing hardness of captopril matrix tablets, release rate was decreased. Each formulation was evaluated by the area under the curve (AUC) and time course of plasma captopril concentration after oral administration to beagle dogs. The $AUC_{0-12}$ were $9.126\;{\mu}g\;h/ml$ and $6.417\;{\mu}g\;h/ml$ for the matrix tablets and conventional tablets, respectively. Therefore, the bioavailability of captopril matrix tablets was greater than that of commercial product. It is suggested that captopril matrix tablets using PEO is a useful sustained release formulation.

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Neural Interface with a Silicon Neural Probe in the Advancement of Microtechnology

  • Oh, Seung-Jae;Song, Jong-Keun;Kim, Sung-June
    • Biotechnology and Bioprocess Engineering:BBE
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    • v.8 no.4
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    • pp.252-256
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    • 2003
  • In this paper we describe the status of a silicon-based microelectrode for neural recording and an advanced neural interface. We have developed a silicon neural probe, using a combination of plasma and wet etching techniques. This process enables the probe thickness to be controlled precisely. To enhance the CMOS compatibility in the fabrication process, we investigated the feasibility of the site material of the doped polycrystalline silicon with small grains of around 50 nm in size. This silicon electrode demonstrated a favorable performance with respect to impedance spectra, surface topography and acute neural recording. These results showed that the silicon neural probe can be used as an advanced microelectrode for neurological applications.

Dry-etch Characteristics of InP/InGaAsP Photonic Crystal Structure (InP/InGaAsP 광자결정 구조 제작을 위한 건식 식각 특성)

  • Lee, Ji-Myon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.12
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    • pp.1271-1276
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    • 2004
  • Two-dimensionally arrayed nanocolumn lattices were fabricated by using double-exposure laser holographic method. The hexagonal lattice was formed by rotating the sample with 60 degree while the square lattice by 90 degree before the second laser-exposure. The reactive ion etching for a typical time of 30 min using CH$_4$/H$_2$ plasma enhanced the aspect-ratio by more than 1.5 with a slight increase of the bottom width of columns. The etch-damage was observed by photoluminescence (PL) spectroscopy which was removed by the wet chemical etching using HBr/$H_2O$$_2$/$H_2O$ solution, leading into the enhanced PL intensities of the PCs.

Fabrication of carbon nanostructures using electron beam lithography and pyrolysis for biosensing applications (전자빔 리소그래피와 열처리를 이용한 탄소 나노구조물의 제작 및 바이오센싱 응용연구)

  • Lee, Jung-A;Lee, Kwang-Cheol;Park, Se-Il;Lee, Seung-S.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1727-1732
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    • 2008
  • We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

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MINERAL STATUS OF GRAZING CATTLE IN SOUTH SULAWESI, INDONESIA : 1. MACROMINERALS

  • Prabowo, A.;McDowell, L.R.;Wilkinson, N.S.;Wilcox, C.J.;Conrad, J.H.
    • Asian-Australasian Journal of Animal Sciences
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    • v.4 no.2
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    • pp.111-120
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    • 1991
  • A study was conducted to determine the macromineral status of grazing cattle in three climatic regions of the province of South Sulawesi, Indonesia. Soil, forage, blood and rib bone samples were collected within the Western, Central and Eastern regions, respectively, in February-March and August-September of 1987. Calcium and magnesium were not deficient in soil samples. For forages, calcium and phosphorus were deficient for all regions and forage sodium was deficient except for the western region in the dry season. Crude protein was deficient during the dry season. The overall percentage of deficient plasma phosphorus samples was 17 or 23% for the wet and dry seasons, respectively. Based on these analyses, macrominerals most likely deficient in both seasons were phosphorus and calcium in all regions, in addition to sodium in the Central and Eastern regions.

Fabrication of Depth-probe type Silicon Microelectrode array for Neural signal Recording (신경신호기록용 탐침형 반도체 미세전극 어레이의 제작)

  • Yoon, T.H.;Hwang, E.J.;Shin, D.Y.;Kim, S.J.
    • Proceedings of the KOSOMBE Conference
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    • v.1998 no.11
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    • pp.147-148
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    • 1998
  • In this paper, we developed the process for depth-probe type silicon microelectrode arrays. The process consists of four mask steps only. The steps are for defining sites, windows, and for shaping probe using plasma etch from above, and for shaping using wet etch from below, respectively. The probe thickness is controlled by dry etching, not by impurity diffusion. We used gold electrodes with a triple dielectric system consisting of oxide/nitride/oxide. The shank of the probe taper from 200um to tens of urn tip and has 30 um thickness.

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Adding Effect of TCA-Precipitated Blood Powder to the Phenol Formaldehyde Resin for Plywood (합판용 페놀수지 접착제에 대한 TCA침전 혈액분말의 첨가효과)

  • Lee, Hwa-Hyoung;Lee, Jong-Shin;Jang, Sang-Sik
    • Journal of the Korean Wood Science and Technology
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    • v.24 no.2
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    • pp.15-19
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    • 1996
  • To utilize the waste materials and develope wood adhesive from isolated bloods of slaughtered cow and pig and also to prevent water pollution, simple and rapid method of isolation and purification of plasma proteins from pig bloods with trichloroacetic acid(TCA) treatment was developed. Adding of TCA-precipitated blood powder to the phenol formaldehyde resin(PF) improved dry and wet strength of plywood and resulted in fast hot pressing times.

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Microfabrication of MEMS Cantilevers for Mechanically Detected High-Frequency ESR Measurement

  • Ohmichi, E.;Yasufuku, Y.;Konishi, K.;Ohta, H.
    • Journal of Magnetics
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    • v.18 no.2
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    • pp.163-167
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    • 2013
  • We fabricated prototype cantilevers for mechanically detected high-frequency ESR measurement. Cantilevers are fabricated from silicon-on-insulator (SOI) wafers using standard MEMS techniques such as lithography, wet etching, and plasma etching. Using commercial SOI wafers, fabrication cost and the number of processes can be substantially reduced. In this study, three types of cantilevers, designed for capacitive and optical detection, are shown. Capacitive type with lateral dimensions of $3.5{\times}1.6mm^2$ is aimed for low spin concentration sample. On the other hand, optical detection type with lateral dimensions of $50{\times}200{\mu}m^2$ is developed for high-sensitive detection of tiny samples such as newly synthesized microcrystals.

Characterization of Surface Damage and Contamination of Si Using Cylindrial Magnetron Reactive Ion Etching

  • Young, Yeom-Geun
    • Korean Journal of Materials Research
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    • v.3 no.5
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    • pp.482-496
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    • 1993
  • Radiation damage and contamination of silicons etched in the $CF_4+H_2$ and $CHF_3$ magnetron discharges have been characterized using Schottky diode characteristics, TEM, AES, and SIMS as a function of applied magnetic field strength. It turned out that, as the magnetic field strength increased, the radiation damage measured by cross sectional TEM and by leakage current of Schottky diodes decreased colse to that of wet dtched samples especially for $CF_4$ plasma etched samples, For $CF_4+H_2$and $CHF_3$ etched samples, hydrogen from the plasmas introduced extended defects to the silicon and this caused increased leakage current to the samples etched at low magnetic field strength conditions by hydrogen passivation. The thickness of polymer with the increasing magnetic field strength and showed the minimum polymer residue thickness near the 100Gauss where the silicon etch rate was maximum. Also, other contaminants such as target material were found to be minimum on the etched silicon surface near the highest etch rate condition.

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