Microfabrication of MEMS Cantilevers for Mechanically Detected High-Frequency ESR Measurement

We fabricated prototype cantilevers for mechanically detected high-frequency ESR measurement. Cantilevers are fabricated from silicon-on-insulator (SOI) wafers using standard MEMS techniques such as lithography, wet etching, and plasma etching. Using commercial SOI wafers, fabrication cost and the number of processes can be substantially reduced. In this study, three types of cantilevers, designed for capacitive and optical detection, are shown. Capacitive type with lateral dimensions of $3.5{\times}1.6mm^2$ is aimed for low spin concentration sample. On the other hand, optical detection type with lateral dimensions of $50{\times}200{\mu}m^2$ is developed for high-sensitive detection of tiny samples such as newly synthesized microcrystals.