• Journal of the Korean Vacuum Society
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• v.19 no.6
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• pp.460-466
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• 2010

We measured the magnetic properties of stainless steels type 304 and 316L to see if those materials can be used for the applications where non-magnetic materials are required. The results show that the relative permeability of samples was greatly increased during manufacturing processes. After full solution annealing, however the permeability could be reduced to less than 1.02. Thus, the materials may be employed in the low-permeability applications.

• Proceedings of the Korean Vacuum Society Conference
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• 1993.02a
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• pp.122-123
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• 1993

• Proceedings of the Korean Vacuum Society Conference
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• 1993.02a
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• pp.124-125
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• 1993

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.204-205
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• 2011

In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is a most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. For best performance of thin film silicon solar cell, the dopant profiles at p/i and i/n interfaces need to be as sharp as possible. The sharpness of dopant profiles can easily achieved when using multi-chamber PECVD equipment, in which each layer is deposited in separate chamber. However, in a single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of a single-chamber PECVD system in spite of the advantage of lower initial investment cost for the equipment. In order to resolve the cross-contamination problem in single-chamber PECVD systems, flushing method of the chamber with NH3 gas or water vapor after doped layer deposition process has been used. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. A single-chamber VHF-PECVD system was used for superstrate type p-i-n a-Si:H solar cell manufacturing on Asahi-type U FTO glass. A 80 MHz and 20 watts of pulsed RF power was applied to the parallel plate RF cathode at the frequency of 10 kHz and 80% duty ratio. A mixture gas of Ar, H2 and SiH4 was used for i-layer deposition and the deposition pressure was 0.4 Torr. For p and n layer deposition, B2H6 and PH3 was used as doping gas, respectively. The deposition temperature was $250^{\circ}C$ and the total p-i-n layer thickness was about $3500{\AA}$. In order to remove the deposited B inside of the vacuum chamber during p-layer deposition, a high pulsed RF power of about 80 W was applied right after p-layer deposition without SiH4 gas, which is followed by i-layer and n-layer deposition. Finally, Ag was deposited as top electrode. The best initial solar cell efficiency of 9.5 % for test cell area of 0.2 $cm^2$ could be achieved by applying the in-situ plasma cleaning method. The dependence on RF power and treatment time was investigated along with the SIMS analysis of the p-i interface for boron profiles.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.271.1-271.1
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• 2013

Titania is usually used in sun-screens, tooth paste, and other daily used objects as a pigment. However, scientists have focused on titania as photocatalyst due to its excellent activities. By fabricating vanadium doped TiO2 and CuOx co-catalyzed TiO2 nano-size filter, the degradation level of the volatile organic compound (VOC) concentration was tested using 365nm UV LED as light source in a closed chamber. Main purpose for this test is to evaluate the activities of various catalysts for degrading the VOCs which are detrimental to human body and toluene and p-xylene were chosen in the VOC removal test. Target gas materials were injected into the test chamber with dry air as carrier gas which was flowed into the gas washer bottle filled with liquid form of VOC substance. When the VOC gas flows into the chamber, it is circulated by 200 mm fan in order to contact with the set-up filter on the aluminum holder. Target gas concentration in the chamber was monitored using VOC detector (miniRae3000, Raesystems) which was also placed inside the chamber. With the measured concentration, the VOC degradation efficiency and the degradation rate were evaluated and used to compare the catalytic activities.

• Journal of IKEEE
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• v.22 no.2
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• pp.302-308
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• 2018

Multi-Layer Sputtering is aim to develop desired thickness thin film multi-layer with different materials. The multi-layer thin film deposition process occupies a relatively large portion in the process time, because the main reason is that it takes much time to move the substrate to be deposited and to make the chamber into a high vacuum state compared to the process time. Most of semiconductor and display industries sputter a single substance in one chamber and move boards through multi-continuous robots to another chamber to sputter other materials. This will inevitably require multiple chambers, vacuum pumps, and multi-contamination robots within the process facility. To solve these problems, this paper proposes a control system for multi-layer thin film sputtering devices that deposit different materials within a single vacuum chamber and is applied in TFT process. The manufacture and experiment of the control system proved its validity.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2009.11a
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• pp.469-473
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• 2009

The supersonic gas ejector, as gas dynamic appliance, has been applied for a long time because of simplicity and reliability. However, for the prediction of ejector performances with given parameters, that is, working gas pressure and the nozzle shape, it is necessary to raise accuracy of modelling for properties of ejector gas flow. The purpose of the represented work is to compare one-dimensional modelling and numerical results with experimental results. The ejector with a conic nozzle has been designed and tested (Mach number at the nozzle exit section was 3.31, the nozzle throat diameter - 6 mm). Working gas - nitrogen, was brought from system of gas bottles. Diameter of the mixture chamber at the nozzle exit section was limited by condensation temperature of nitrogen and equaled 20 mm. The one-dimensional theory predicted the minimal starting pressure equaled 8.18 bar (absolute) and 0.051 bar in the vacuum chamber. Accordingly the minimal starting pressure was 9.055 bar and 0.057 in the vacuum chamber bar have been fixed in experiment.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.579-579
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• 2013

We study on Argon metastable and 4p state neutral atom density in magnetized ICP Helicon plasmas by Laser Induced Fluorescence and plasma emission. The results show that metastable density is too low at the center of chamber due to significant neutral depletion. Otherwise, 4p state is high at the center of chamber because electron density is very high. Power and pressure dependence of metastable and 4p state neutral atom have been spatially measured in the radial direction of cylindrical chamber.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.116-116
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• 2010

진공 chamber에서 방전된 plasma 내부를 외부 view port를 통하여 확인하는 것은 극히 제한적이며 leak의 확률을 높이고 plasma의 균일한 방전을 방해한다. 이를 개선하기 위하여 내장형 무선 카메라를 chamber 내부에 위치한 후 고진공 영역에서 촬영을 시도하였으나 일반적인 CCD 카메라로는 촬영할 수 없다. 고진공 영역에서 카메라 내부온도의 급격한 상승이 원인으로 밝혀졌고 적정온도인 $45^{\circ}C$를 초과하여 최대 $96^{\circ}C$까지 4 min 이내에 상승함을 IR camera로 확인할 수 있었으며 이 때 카메라가 작동하지 않았다. 또한 카메라를 고진공 영역에서 촬영 및 녹화하기 위해서는 $46^{\circ}C$의 온도를 낮추어야 함을 진공해제 이후 내부온도가 $50^{\circ}C$로 감소하면서 내장형 무선 카메라가 다시 작동함으로 인해 알 수 있었다. 본 연구에서는 이를 해결하기 위하여 내장형 무선 카메라에 AM 변조 방식의 311 MHz RF remote controller를 장착하여 외부에서 선택적으로 ON/OFF 할 수 있도록 개조하였고 10 L chamber에서 150 L/sec TMP를 이용하여 10-6 Torr의 압력에서 성공적으로 녹화 및 촬영하였다. 또한 내장형 무선 카메라 내부의 반도체 회로 규격 및 발열량과 heat sink의 규격 (열전도도, 복사율)을 추가로 조사하였다. 분자유동 영역에서 열전달은 복사에 의한 영향이 대부분이므로 내장형 무선 카메라 내부 온도를 감소시켜 카메라의 작동 시간을 연장하기 위하여 내부 회로에 emissivity가 높고 전기전도도가 낮아 회로에 영향이 없는 박막을 회로에 증착시키는 추후의 연구가 필요하다.

• Journal of the Korean Society of Propulsion Engineers
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• v.12 no.4
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• pp.16-23
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• 2008

Theoretical and numerical approaches were conducted in order to study supersonic exhaust diffusers to simulate high altitude performance of rockets on the ground. A physical model of concern includes a rocket motor, vacuum chamber, and diffuser, which have axisymmetric configurations. An analysis was conducted to investigate operation characteristics of supersonic exhaust diffusers from a flow-development point of view. Emphasis was placed on theoretical formulation to predict the starting pressure of diffusers, the effect of the vacuum chamber size, and the minimum starting pressure of the rocket motor to start the diffuser.