• 제목/요약/키워드: using pattern

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연결망 분석도구를 이용한 크리스토퍼 알렉산더 패턴언어 활용 가능성에 관한 연구 (A Study on the Possibility to Use Christopher Alexander's Pattern Language by Using Network Analysis Tool)

  • 정성욱;김문덕
    • 한국실내디자인학회논문집
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    • 제25권3호
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    • pp.31-39
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    • 2016
  • This study is aimed to increase the possibility of using the Christopher Alexander's pattern language. The methodology of this study is (i) to analyze the pattern language by using the network analysis tool in order to understand the complicate network structure of the pattern language, and (ii) to apply the Alexander's method of using the pattern language by using the network analysis tool (Gephi) and to examine the feasibility of the network analysis tool as a tool for using the pattern language. Firstly, as a result of analysing the pattern language, (i) the pattern language classified by pattern number is distinguished by the patterns of towns, buildings and construction, among which the pattern of buildings plays a key function in the networks; (ii) the buildings functions a medium connecting between the towns and the construction; and (iii) the pattern language is divided into 6 sub-modules, through which the user can select a pattern. Secondly, the result of using the network analysis tool as a tool for using the pattern language (i) suggests the new method of using the pattern language by using the network analysis tool (Gephi); (ii) makes it possible to easily figure out the characteristics of the links between the patterns; and (iii) increases the completeness of the pattern language by making it easy to find out the sub-patterns in selecting a pattern.

CAD System을 이용한 패턴디자인설계 활용가능성에 관한 연구(I)-Coat 원형을 중심으로- (A Study on the Possibility of Pattern Design Using CAD System (With concentration on the change of coat basic pattern))

  • 김옥경
    • 복식
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    • 제20권
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    • pp.49-62
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    • 1993
  • The purpose of this research was to utilize of Pattern Design System(P.D.S) by using AM-300 The conclusion were like these : 1. A coat of basic pattern was selected by design sketch. 2. The basic pattern was input into computer by digitizing. 3. The basic pattern was change into designed shape by using various skills. This system were enabled to draw straight lines, curves, delete lines, sections of lines, extend lines, cut pattern into sections, measure line or section reproduce whole pattern shape of section, rotate and mirror pattern and complete patterns. 4. Automatic grading of finished master pattern have been developed by creation and modification of grading rules of basic pattern. 5. Production pattern added seam allowance, not-ches was generated by P.D.S menu option. 6. Finished pattern design was plotted out 100% and 20% size by AM-300 Plotter. This results will be the basic materials to develop the CAD SYSTEM if some problems were improve. Furthermore, the utilization of P.D.S is expected to be developing in pattern making process.

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전통문양을 활용한 Symmetry 디자인 전개 (A Study of Symmetry Design Process Using the Traditional Patterns)

  • 황정순;이송자
    • 한국의류산업학회지
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    • 제10권3호
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    • pp.364-370
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    • 2008
  • This research aims to recognize necessity of modern expression of traditional pattern, understand the matter which is expressed when developing design using traditional pattern, and find the solutions. As the solutions, this research presents design of traditional pattern using symmetry concept and works on the possibility of symmetry as the pattern design. So this research carried out in-depth interview to textile designer working at Gyeongsangnam-do, analyzed the substances. The main results are as follows. First, the presented problems of developing common pattern design and designing using traditional pattern show the necessities for adequate harmony among conception of creative idea, traditional pattern and present pattern. As the solution, the efficient design principles are required. Second, the seven traditional figures can present design applying symmetry, also draw the 8 mapping models for the visuality and utilization. Third, the symmetry-applied traditional pattern design makes it possible for the traditional figure to be represented with the creative and modern sense and provides easier way to the design development by complementing the pattern design formation. As the result, symmetry-utilized traditional pattern design improvement shows the expectation that it will increase the design development ability and ease the figure drawing. In addition, the pattern development which can be applied to any figure presents the time efficiency as well as possibility of the high added value textile industry.

블록 컬러 특징과 패턴의 공간적 상관성을 이용한 영상 검색 (Image retrieval using block color characteristics and spatial pattern correlation)

  • 채석민;김태수;김승진;이건일
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 학술대회 논문집 정보 및 제어부문
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    • pp.9-11
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    • 2005
  • We propose a new content-based image retrieval using a block color co-occurrence matrix (BCCM) and pattern correlogram. In the proposed method, the color feature vectors are extracted by using BCCM that represents the probability of the co-occurrence of two mean colors within blocks. Also the pattern feature vectors are extracted by using pattern correlogram which is combined with spatial correlation of pattern. In the proposed pattern correlogram method. after block-divided image is classified into 48 patterns with respect to the change of the RGB color of the image, joint probability between the same pattern from the surrounding blocks existing at the fixed distance and the center pattern is calculated. Experimental results show that the proposed method can outperform the conventional methods as regards the precision and the size of the feature vector dimension.

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각막과 수정체의 Photoreflection Pattern 측정기구 개발 (The Measurements of the Photoreflection Pattern for Cornea and Crystalline)

  • 김용근;박동화
    • 한국안광학회지
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    • 제3권1호
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    • pp.201-207
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    • 1998
  • 눈의 cornea, crystalline의 reflection pattern을 알기 위해 matrix를 이용하여 image의 위치, size를 이론적으로 계산하였고, 3개의 light source와 reflex camera를 이용하여 reflection pattern를 측정할 수 있는 system을 만들었다. 단일 광원을 이용하여 retina에서 반사 pattern으로부터 눈의 원시 및 근시 등을 측정하였고, 2개의 광원을 이용한 reflection pattern으로부터 cornea, crystalline의 curvature를 측정하였다.

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The Pattern Recognition System Using the Fractal Dimension of Chaos Theory

  • Shon, Young-Woo
    • International Journal of Fuzzy Logic and Intelligent Systems
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    • 제15권2호
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    • pp.121-125
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    • 2015
  • In this paper, we propose a method that extracts features from character patterns using the fractal dimension of chaos theory. The input character pattern image is converted into time-series data. Then, using the modified Henon system suggested in this paper, it determines the last features of the character pattern image after calculating the box-counting dimension, natural measure, information bit, and information (fractal) dimension. Finally, character pattern recognition is performed by statistically finding each information bit that shows the minimum difference compared with a normalized character pattern database.

트리패턴매칭기법의 재목적 가능한 중간코드 최적화 시스템 (Retargetable Intermediate Code Optimization System Using Tree Pattern Matching Techniques)

  • 김정숙;오세만
    • 한국정보처리학회논문지
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    • 제6권8호
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    • pp.2253-2261
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    • 1999
  • ACK에서는 패턴 테이블 생성기와 핍홀 최적화기에서 스트링 패턴 매칭 기법을 이용하여 EM 중간 코드에 대한 최적화 코드를 생성한다. 하지만 이 스트링 패턴 매칭 방법은 패턴 결정 시에 반복적으로 많은 비교 동작이 이루어지므로 비효율적이다. 본 논문은 ACK의 중간 코드 최적화기를 개선하기 위해 EM 트리 생성기, 최적화 패턴 테이블 생성기, 트리 패턴 매칭기로 구성된 트리 패턴 매칭 알고리즘을 이용한 EM 중간 코드 최적화 시스템을 설계하고 구현하였다. 이러한 트리 패턴 매칭 알고리즘은 EM 트리를 하향식으로 순회하면서 트리 구조를 가진 패턴 테이블을 참조하여 루트 노드를 중심으로 패턴 매칭을 수행한다. 트리 패턴 매칭 동작은 궁극적으로 ACK의 스트링 패턴 매칭에 비해 최적화 패턴을 찾는데 걸리는 시간을 평균 10.8% 감소시킬 수 있는 효과를 보였다.

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Optical Stepper의 이중노광에 의한 미세한 포토레지스트 패턴의 형성 (Very Fine Photoresist Pattern Formation using Double Exposure of Optical Wafer Stepper)

  • 양전욱;김봉렬;박철순;박형무
    • 전자공학회논문지A
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    • 제31A권7호
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    • pp.69-75
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    • 1994
  • A very fine pattern formation process using double exposure is investigated, which can overcome the resolution limit of optical wafer stepper. The very fine pattern can be obtained by moving the edge profile of large pattern by means of moving the stepper stage. The simulation results show that the light transmittance decrease bellow 9%, and the contrast increase to 16.6% for the 0.3$\mu$m photoresist pattern exposeed by the double exposure using i-line wafer stepper. And the experimental results show that fine photoresist pattern as short as 0.2$\mu$m can be obtained without a loss of photoresist thickness. Also, it proves that the depth of focus for 0.3$\mu$m pattern is longer than $1.5\mu$m. And, the very fine negative photoresist pattern was formmed by using the double exposure technique and the image reversal process.

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3D 동체 모형을 이용한 2D 전개 패턴 연구 (2D Flat Pattern Development Using Simplified 3D Torso Model)

  • 김명수;홍경희
    • 대한인간공학회지
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    • 제24권2호
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    • pp.85-91
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    • 2005
  • To understand the basic relationship between 3D curved surface model and 2D pattern, simplified torso model was generated by commercial CAD program (IDEAS). 3D torso model was then divided into different blocks and unfolded into a flat pattern as in ordinary works of clothing item design. As results, 2D pattern development of different part of 3D torso model was attempted and analyzed mathematically. It was found that different height, radius and tangent slope of 3D blocks resulted in different 2D pattern. The relationships between the shape parameters of 3D torso blocks and those of 2D patterns were analyzed using regression equations. Direct way of drawing a 2D pattern of corresponding 3D torso block was also illustrated for the convenience of pattern making using conventional measurements of upper/ lower radii and height of 3D torso block.

PNF 팔 패턴의 각도 변화가 척추세움근의 근 긴장도 변화와 방산의 효과에 미치는 영향 (The Effect of Elector Spine Muscle Tone Using Irradiation According to the Angular Motion of a Proprioceptive Neuromuscular Facilitation (PNF) Arm Pattern)

  • 양재만;이상무;이정훈
    • PNF and Movement
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    • 제18권3호
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    • pp.435-444
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    • 2020
  • Purpose: This study aimed to compare the elector spine muscle tone using the irradiation of the proprioceptive neuromuscular facilitation (PNF) arm pattern according to angular motion. Methods: Thirty subjects participated in this study. Elector spine muscle tone was measured using a Myotonpro device while in the sitting position according to the angular motion (70°, 100°, 130°) of the PNF arm pattern using a D1 flexion pattern. Each angular motion of the PNF arm pattern was performed with a continuous passive motion (CPM). The change in elector spine muscle tone was statistically evaluated using a repeated one-way ANOVA test. Post-hoc analysis was performed using the Bonferroni method. Results: The results revealed a significant change in elector spine muscle tone when performing the PNF arm pattern using D1 flexion pattern. Specifically, the elector spine muscle tone had significantly increased at 100° and 130° motion in the PNF arm pattern when compared to the initial muscle tone (p < 0.05). No significant muscle tone changes were noted for any of the angular motions of the PNF upper arm pattern (p > 0.05). Conclusion: The results of this study indicate a positive increase in elector spine muscle tone with irradiation of the PNF upper arm pattern exercise with 100° or 130° angular motion. The minimum angle at which the effect of the irradiation of the PNF arm pattern could be seen was 100°.