• Title/Summary/Keyword: unbalanced magnetron sputtering

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Microstructure and Physical Properties of Sputtered Metal Containing Nanocrystalline Structured Carbon Coatings

  • Kim, Sung-I.;Han, Jeon-G.
    • Journal of Surface Science and Engineering
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    • v.40 no.2
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    • pp.59-62
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    • 2007
  • Metal containing hydrogen free nanocrystalline structured carbon (Me:nc-C) films were synthesized by closed-field unbalanced magnetron sputtering system (CFUBM). The aim of this study was to determine the relationship between the microstructure and physical properties of Me:nc-C films as a function of the concentration of materials. The film structures were examined by x-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The physical properties of the Me:nc-C films were evaluated by using a 4-point probe. The fraction of graphite clusters was found to be increased by containing titanium and the electrical resistivity decreased with increasing amount of containing.

Microstructural and Mechanical Properties of CrTiAlN Nanocomposite thin films synthesis by Closed Field Unbalanced Magnetron Sputtering (비대칭 마그네트론을 이용한 CrTiAlN 나노복합 박막의 미세구조와 기계적 특성)

  • Kim, Yeon-Jun;Lee, Ho-Yeong;Byeon, Tae-Jun;Kim, Gap-Seok;Han, Jeon-Geon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.65-66
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    • 2007
  • 비대칭 마그네트론을 이용하여 사원계 CrTiAlN 나노 복합 박막을 합성하였고 합성된 박막의 특성을 분석하였다. CrTiAlN 나노복합 박막의 미세구조는 CrN (111)과 CrN (200)방향으로 성장하였고 기계적 특성은 $30\;{\sim}\;39\;GPa$의 경도 값을 얻었다. 질소 분압이 0.33 Pa에서 가장 높은 경도 값을 얻을 수 있었다.

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Structure and Mechanical Characteristics of ZrCrAIN Nanocomposite Thin Films by CFUBMS (CFUBMS을 이용한 ZrCrAIN 나노복합 박막의 구조와 기계적 특성)

  • Kim Youn J.;Lee Ho Y.;Shin Kyung S.;Jung Woo S.;Han Jeon G.
    • Journal of Surface Science and Engineering
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    • v.38 no.5
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    • pp.183-187
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    • 2005
  • The quaternary ZrCrAIN nanocomposite thin films are synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS). Microstructure and mechanical properties of ZrCrAIN nanocomposite thin films are studied. Grain refinement of ZrCrAIN nanocomposite thin film is occurred by controlling $N_{2}$ partial pressure. Maximum hardness value according to the various $N_{2}$ partial pressures is obtained at 45 GPa. It is also conformed that critical value of the grain size (d) needs to achieve the maximum hardness.

A study for Application of ion Nitriding on EHA Hydraulic Pump Parts (EHA 유압펌프 부품의 플라즈마 질화기술 적용에 관한 연구)

  • Kim Eun-Young;Kim Bomsok;Lee Sangyul
    • Journal of Surface Science and Engineering
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    • v.38 no.6
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    • pp.234-240
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    • 2005
  • In this study, ion nitriding of a EHA pump part made of AISI 4340 steel was performed under different applied power conditions to study the relationship between dimensional changes of specimens and the type of applied power source. Microstructures and micohardness distribution at different processing conditions were also examined. Duplex surface treatment of ion nitriding with the optimum process conditions to produce the minimum dimensional variation in a EHA pump part and a TiN thin film coating by unbalanced magnetron sputtering was performed and the specimens with a duplex surface treatment were subjected to a high speed wear test to evaluate the wear performance of EHA hydraulic pump parts with various surface treatment conditions. Results indicated that uniform and continuous surface layer with a minimum dimensional variation could be obtained by ion nitriding with bipolar mode power source and much enhanced wear characteristics with a duplex surface treatment could be obtained, compared with results from ion nitriding or single-layerd TiN coating specimens.

Microstructural and Mechanical Characteristics of TiZrAlN Nanocomposite Thin Films by CFUBMS (CFUBMS을 이용한 TiZrAlN 나노복합 박막의 미세 구조와 기계적 특성)

  • Kim, Youn-J.;Lee, Ho-Y.;Kim, Yong-M.;Kim, Kab-S.;Han, Jeon-G.
    • Journal of Surface Science and Engineering
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    • v.40 no.1
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    • pp.1-5
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    • 2007
  • Quaternary TiZrAlN nanocomposite thin films were synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS), and their microstructure and mechanical characteristics were examined. The grain refinement of the TiZrAlN nanocomposite thin films was controlled by adjusting the $N_2$ partial pressure. The hardness of the film varied with the $N_2$ partial pressure and the maximum value was obtained approximately 47 GPa. It was also confirmed that there is a critical value of the grain size($d_c$) to need maximum hardness.

Investigation of residual stress in cBN thin films deposited with hydrogen

  • Go, Ji-Seon;Kim, Hong-Seok;Park, Jong-Geuk;Lee, Uk-Seong;Baek, Yeong-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.43-43
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    • 2011
  • BN(Boron Nitride)은 온도와 압력 조건에 따라 안정한 상이 sp3 결합인 cubic 구조의 BN(cBN)과 sp2 결합인 hexagonal 구조의 BN(hBN or tBN)으로 나뉘는데, 이 중 cBN은 우수한 기계적, 물리적, 화학적 특성으로 인해 박막 분야에서 매우 높은 응용가능성을 지니고 있다. 하지만 cBN 박막의 합성과정에서의 필수적인 요소인 높은 압축잔류응력은 cBN을 응용분야에 적용하는데 있어 한계점으로 계속 남아 있었다. 그동안 이러한 잔류응력을 감소시키기 위해 열처리, 이온 주입, 제 3의 물질 첨가 등 다양한 관점에서 접근한 연구들이 진행되어 왔다. 본 연구에서는 cBN 합성과정에서 잔류응력을 감소시키기 위한 방법으로 수소를 첨가하였고, 그에 따른 잔류응력의 변화를 분석하고, 그 과정에서 잔류응력의 형성에 수소가 어떤 역할을 하는지 규명하고자 하였다. cBN 박막은 hBN을 target으로한 unbalanced magnetron sputtering를 사용하여, 실리콘 wafer 위에 합성하였다. 증착압력은 1.3mTorr로, 수소의 첨가량을 증가시키며 잔류응력과 cBN fraction을 관찰하였다. cBN fraction은 FTIR로 분석하였고, 잔류응력은 실리콘 strip의 in-situ 곡률측정법으로 계산하였다. cBN 박막의 조성과 구조 분석, 수소의 역할 규명을 위해 RBS 및 HRTEM을 이용하였다.

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Evaluation of Micro-Tensile Properties for Nano-coating Material TiN (나노 코팅재 TiN 의 마이크로 인장 특성 평가)

  • Huh, Yong-Hak;Kim, Dong-Iel;Hahn, Jun-Hee;Kim, Gwang-Seok;Yeon, Soon-Chang;Kim, Yong-Hyub
    • Proceedings of the KSME Conference
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    • 2004.04a
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    • pp.240-245
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    • 2004
  • Tensile properties of hard coating material, TiN, were evaluated using micro-tensile testing system. TiN has been known as a hard coating material commonly used today. Micro-tensile testing system consisted of a micro tensile loading system and a micro-ESPI(Electronic Speckle Pattern Interferometry) system. Micro-tensile loading system had a maximum load capacity of 500mN and a resolution of 4.5 nm in stroke. TiN thin film $1{\mu}m$ thick was deposited on the Si wafer pre-deposited of $Si_3N_4$ film substrate by the closed field unbalanced magnetron sputtering (CFUBMS) process. Three kinds of micro-tensile specimen with the respective width of $50{\mu}m$, $100{\mu}m$ and $500{\mu}m$ were fabricated by MEMS process. The mechanical properties including tensile strength and elastic modulus were determined using the micro-tensile testing system and compared by those obtained by nano-indentation

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Oxidation of CrAlN and CrZrN Films (CrAlN과 CrZrN의 산화)

  • Kim, Min-Jeong;Kim, Seul-Gi;Lee, Sang-Yul;Lee, Dong-Bok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2011.05a
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    • pp.33-35
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    • 2011
  • Films of CrAlN and CrZrN were deposited on a steel substrate by closed field unbalanced magnetron sputtering, and their oxidation behaviors were investigated. CrAlN films consisted of dense, polycrystalline CrN and AlN fine columns. The formed oxides consisted primarily of crystalline $Cr_2O_3$ incorporated with $Al_2O_3$. The oxide layers were thin and compact so as to make CrAlN films more protective than CrN films. In case of CrZrN films, Zr atoms were dissolved in the CrN phase. Zr atoms advantageously refined the columnar structure, reduced the surface roughness, and increased the micro-hardness. However, the addition of Zr did not increased oxidation resistance, mainly because Zr was not a protective element. All the deposited films displayed relatively good oxidation resistance, owing to the formation of the highly protective $Cr_2O_3$ on their surface. The $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films oxidized to $Cr_2O_3$ as the major phase and ${\alpha}-ZrO_2$ as the minor one, whereas the CrN film oxidized to $Cr_2O_3$.

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Tribological Behavior Analysis of CrMoN Coating by XPS (XPS 분석을 통한 CrMoN 코팅의 마찰마모 거동 연구)

  • Yang, Young-Hwan;Lyo, In-Woong;Park, Sang-Jin;Lim, Dea-soon;Oh, Yoon-Suk
    • Korean Journal of Metals and Materials
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    • v.50 no.8
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    • pp.549-556
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    • 2012
  • The tribological behavior of CrMoN films with respect to surface chemistry was investigated by using X-ray photoelectron spectroscopy (XPS). All of the films were prepared from a hybrid PVD system consisting of DC unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) sources. The tribological property of the films was evaluated by a friction coefficient using a Ball-on-disk type tribometer. The chemistry of wear track was analyzed by energy dispersive spectroscopy (EDS) and XPS. The friction coefficient was measured to be 0.4 for the CrMoN film, which is lower than that of a monolithic CrN film. EDS and XPS results imply the formation of an oxide layer on the coating surface, which was identified as molybdenum oxide phases, known to be a solid lubricant during the wear test.

Microstructure and Wear Resistance of Ti-Me-N (Me=V, Nb and Si) Nanofilms Prepared by Hybrid PVD (Hybrid PVD로 제조된 Ti-Me-N (Me=V, Si 및 Nb) 나노 박막의 미세구조와 마모특성)

  • Yang, Young-Hwan;Kwak, Kil-Ho;Lee, Sung-Min;Kim, Seong-Won;Kim, Hyung-Tae;Kim, Kyung-Ja;Lim, Dae-Soon;Oh, Yoon-Suk
    • Journal of Surface Science and Engineering
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    • v.44 no.3
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    • pp.95-104
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    • 2011
  • Ti based nanocomposite films including V, Si and Nb (Ti-Me-N, Me=V, Si and Nb) were fabricated by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The pure Ti target was used for arc ion plating and other metal targets (V, Si and Nb) were used for sputtering process at a gas mixture of Ar/$N_2$ atmosphere. Mostly all of the films were grown with textured TiN (111) plane except the Si doped Ti-Si-N film which has strong (200) peak. The microhardness of each film was measured using the nanoindentation method. The minimum value of removal rate ($0.5{\times}10^{-15}\;m^2/N$) was found at Nb doped Ti-Nb-N film which was composed of Ti-N and Nb-N nanoparticles with small amount of amorphous phases.