Journal of Surface Science and Engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Microstructure and Physical Properties of Sputtered Metal Containing Nanocrystalline Structured Carbon Coatings

  • Kim, Sung-I. (Center for Advanced Plasma Surface Technology, SungKyunKwan University) ;
  • Han, Jeon-G. (Center for Advanced Plasma Surface Technology, SungKyunKwan University)
  • Published : 2007.04.30
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Abstract

Metal containing hydrogen free nanocrystalline structured carbon (Me:nc-C) films were synthesized by closed-field unbalanced magnetron sputtering system (CFUBM). The aim of this study was to determine the relationship between the microstructure and physical properties of Me:nc-C films as a function of the concentration of materials. The film structures were examined by x-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The physical properties of the Me:nc-C films were evaluated by using a 4-point probe. The fraction of graphite clusters was found to be increased by containing titanium and the electrical resistivity decreased with increasing amount of containing.

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