• Title/Summary/Keyword: two-step

Search Result 6,004, Processing Time 0.031 seconds

Analysis of Two-step programming characteristics of the flash EEPROM's (Flash EEPROM의 two-step 프로그램 특성 분석)

  • 이재호;김병일;박근형;김남수;이형규
    • Journal of the Korean Institute of Telematics and Electronics D
    • /
    • v.34D no.9
    • /
    • pp.56-63
    • /
    • 1997
  • There generally exists a large variation in the thereshold voltages of the flash EEPROM cells after they are erased by using th fowler-nordheim tunneling, thereby getting some cells to be overeased. If the overerased cells are programmed with the conventional one-step programming scheme where an 12-13V pulse with the duration of 100.mu.S is applie don the control gate for the programming, they can suffer from the significant degradation of the reliability of the gate oxide. A two-step programming schem, where an 8/12 V pulse with a duration of 50.mu.S for each voltage is applied on the control gate for the programming, has been studied to solve the problem. The experimental results hav eshown that there is little difference in the programming characteristics between those two schemes, whereas the degradation of the gate oxide due to the programming can be significantly reduced with the two-step programming scheme compared to that with the one-step programming scheme. This is possibly because the positive charge stored in the floating gate of the overerased cells is compensate dwith the electrons injected into the floating gate while the 8V pulse is applied on the control gate, which leaves the overerased cells in the normally erased state after the duration of the 8V pulse.

  • PDF

Two-Step Etching Characteristics of Single-Si by the Plasma Etching Techique (플라즈마 식각방법에 의한 단결정 실리콘의 Two-Step 식각특성)

  • Lee, Jin Hee;Park, Sung Ho;Kim, Mal Moon;Park, Sin Chong
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.24 no.1
    • /
    • pp.91-96
    • /
    • 1987
  • Plasma etching can obtain less damaged etch surface than reactive ion etching. This study was performed to get anisotropic etching characteristics of Si using two step etching technique with C2CIF5 and SF6 gas mixture. The results show that the etch rate and aspect ratio of silicon was increased with increment of SF6 contents. The bulging phenomenon on trench side wall in the plasma one-step etching technique was eliminated by the two step etching technique. The anisotropy was decreased from 12(at 120m Torr) to 2.2(at 400m Torr) with increasing the chamber pressure. At the low rf power (350 watts) anisotrpy of silicon was obtained 7 lower than that of high rf power (650 watts. A:~9). In Summary we obtained anisotropic etching profiles of silicon with e 6\ulcornerm depth by using the plasma two-step etching technique.

  • PDF

ACYCLIC DIGRAPHS WHOSE 2-STEP COMPETITION GRAPHS ARE P$P_n\cup\ I_2$

  • Cho, Han-Hyun;Kim, Suh-Ryung;Nam, Yunsun
    • Bulletin of the Korean Mathematical Society
    • /
    • v.37 no.4
    • /
    • pp.649-657
    • /
    • 2000
  • The 2-step competition graph of D has the same vertex set as D and an edge between vertices x and y if and only if there exist (x, z)-walk of length 2 and (y, z)-walk of length 2 for some vertex z in D. The 2-step competition number of a graph G is the smallest number k such that G together with k isolated vertices is the 2-step competition graph of an acyclic digraph. Cho, et al. showed that the 2-step competition number of a path of length at least two is two. In this paper, we characterize all the minimal acyclic digraphs whose 2-step competition graphs are paths of length n with two isolated vertices and construct all such digraphs.

  • PDF

Flame-Retardant and Water-Repellent Finishing of Automobile Indoor Fabrics (자동차 내장용 직물의 난연 및 발수가공)

  • 박병기;이방원;김환철;김학용
    • Textile Coloration and Finishing
    • /
    • v.11 no.5
    • /
    • pp.7-12
    • /
    • 1999
  • The objective of this study is to apply water repellent and flame retardant finishes simultaneously to the fabric used for automobile. Both two step and one step methods were tried to apply the finishing agent to the fabric. In the two step method, water repellent agent was treated first, and flame retardant agent was applied next. The reverse finishing process was also attempted. In the one step method, flame retardant agent and water repellent agent treated to the fabric in one bath. The results of two step method revealed that the finishing effect was better when the water repellent agent was treated first than when flame retardant agent was treated first. In one step method, fluoro water repellent agent was superior to silicon water repellent agent.

  • PDF

Electrical Characteristics of Self Aligned Gate GaAs MESFETs Using Ion Beam Deposited Tungsten (이온빔 증착 텅스텐을 이용한 자기정렬 게이트 GaAs MESFET의 전기적 특성)

  • 편광의;박형무;김봉렬
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.27 no.12
    • /
    • pp.1841-1851
    • /
    • 1990
  • Self-aligned gate GaAs MESFETs using ion beam deposited tungsten applicable to GaAs LSI fabrication process have been fabricated. Silicon implanted samples were annealed using isothermla two step RTA process and conventional one step RTA process. The electrical and physicla characteristics of annealed samples were investigated using Hall and I-V measurements. As results of measurements, activation characteristics of the isothermal two step RTA process are better than those of one step annealed ones. Using the developed processes, GaAs SAFETs (Self-Aligned Gate FET) have been fabricated and electdrical characteirstics are measured. As results, subthreshold currents of SAGFETs are 6x10**-10 A/\ulcorner, that is compatible to conventional MESFET, maximum transconductances of 0.75\ulcorner gate MESFET using one step RTA process and 2\ulcorner gate MESFET using isothermal two step RTA process are 18 mS/mm, 41 mS/mm respectively.

  • PDF

Two-step electron beam lithography to fabricate 20 nm T-gate (20 nm급 T-형 게이트 제작을 위한 2단 전자 빔 노광 공정)

  • Lee, Kang-Sung;Kim, Young-Su;Lee, Kyung-Taek;Hong, Yun-Ki;Jeong, Yoon-Ha
    • Proceedings of the IEEK Conference
    • /
    • 2006.06a
    • /
    • pp.555-556
    • /
    • 2006
  • In this paper, we have proposed a novel process using two-step electron beam lithography to fabricate 20 nm T-gates for high performance MODFETs. Two-step lithography reduces electron forward scattering by defining the foot on a thin (100 nm) bottom-layer of polymethyl methacrylate (PMMA) at the second step, the T-gate head having been developed at the first step. Adopting a low temperature development technique for the second step reduces the detrimental effect of head exposure on foot definition. We have shown that 20 nm T-gate can be patterned with this process.

  • PDF

A Study on Dynamic Characteristics by Gearbox of High-speed Pump (고속 펌프용 증속기의 동특성에 관한 연구)

  • Lee, Dong-Hwan;Lee, Hyeong-U
    • 연구논문집
    • /
    • s.31
    • /
    • pp.65-75
    • /
    • 2001
  • A dynamic model of pump having one step gearbox and two step gearbox is developed by the lumped parameter method. The model accounts for shafts, ball bearings and journal bearings flexibilities, gyroscopic effects and the force couplings among the transverse and torsion motions due to gearing. Excitation forces of pump having one step gearbox and two step gearbox are considered as the mass unbalance of the rotors and gear transmission error which comes from the modified tooth surface. A Campbell diagram, in which the excitation sources caused by the mass unbalance of the rotors and the transmitted errors of the gearing are considered, shows that there are no critical speeds at the operating speeds. One step and two step gearboxes are manufactured and are estimated for vibration/noise, lubrication and performance.

  • PDF

A two-step approach for variable selection in linear regression with measurement error

  • Song, Jiyeon;Shin, Seung Jun
    • Communications for Statistical Applications and Methods
    • /
    • v.26 no.1
    • /
    • pp.47-55
    • /
    • 2019
  • It is important to identify informative variables in high dimensional data analysis; however, it becomes a challenging task when covariates are contaminated by measurement error due to the bias induced by measurement error. In this article, we present a two-step approach for variable selection in the presence of measurement error. In the first step, we directly select important variables from the contaminated covariates as if there is no measurement error. We then apply, in the following step, orthogonal regression to obtain the unbiased estimates of regression coefficients identified in the previous step. In addition, we propose a modification of the two-step approach to further enhance the variable selection performance. Various simulation studies demonstrate the promising performance of the proposed method.

Studies on the One Bath Two Step Dyeing of Wool/Cationized Cotton Blends with Acid Dye/Reactive Dye (양모/카티온화 면 혼방품의 산성염료/반응성염료에 의한 1욕2단 염색에 관한 연구)

  • 성우경;이춘길;권오경
    • Textile Coloration and Finishing
    • /
    • v.11 no.2
    • /
    • pp.46-54
    • /
    • 1999
  • The conventional dyeing of wool/cotton blends involves a two bath two step method, i.e., after dyeing of the wool component with acid dyes in an acidic dyebath at $100^\circ{C}$, the dyeing of the cotton component with reactive dyes in an alkaline dyebath is performed. In order to overcome the disadvantage of the conventional two bath two step dyeing method of wool/cotton blends, it had prompted significant effort to the development of the one bath dyeing method which can accomplish savings in time, energy and water usage. To improve dyeing property of wool/cotton blends, cotton component was pretreated with cationizing agent containing chlorohydrine group in aqueous solution of sodium hydroxide. This study was carried out to investigate dyeing possibilities of wool/cationized cotton blends with acid dye/reactive dye by one bath two step method.

  • PDF

A Study on The Shape of a Canal Prepared With 'TWO-FILE' Technique (Two-File' 방식에 의한 근관 형성시 근관의 형태에 관한 연구)

  • Han-Soo Park;Seung-Ho Baek
    • Restorative Dentistry and Endodontics
    • /
    • v.26 no.6
    • /
    • pp.507-511
    • /
    • 2001
  • 이 연구의 목적은 'Two File' 방식에 의한 근관형성시 근관의 형태변화 및 전이정도를 분석하고 이를 기존의 근관형성방법과 비교하고자 하는 것이다. 만곡된 근관을 가진 투명한 레진블럭 상에서 step back방식, crown down방식 및 'Two File' 방식으로 근관형성을 시행하고 이를 똑같은 위치가 재현가능한 고정틀에 위치시킨 후 사진의 이중노출 기법을 이용하여 근관형성 전후의 근관의 형태변화 및 전이정도를 분석 한 결과 다음과 같은 결과를 얻었다. 1. step back방식의 경우 형성된 근관이 taper하지 못하고 불규칙한 형태를 보였으며 근관의 전이정도도 다른 두 가지 엔진구동 방식에 의한 경우에 비해 유의하게 컸다(p<0.05) 2. crown down방식의 경우 형성된 근관이 taper한 형태를 보였고, 근관의 전이 정도도 step back방식에 의한 경우보다 유의하게 작았다(p<0.05). 3. 'Two File' 방식의 경우 형성된 근관이 taper한 형태를 보였으며 근관의 전이정도도 step back방식에 의한 경우보다 유의하게 작았으나 crown down방식에 의한 경우와 유의할 만한 차이는 없었다(p<0.05).

  • PDF