• Title/Summary/Keyword: transparent display

검색결과 495건 처리시간 0.028초

솔-젤 법을 통해 제조된 강유전체 (Na,K)NbO3 막의 두께에 미치는 PVP의 영향 (Influence of PVP on the Thickness of Ferroelectric (Na,K)NbO3 Film by Sol-Gel)

  • 김대건;유인상;김세훈;김진호
    • 한국재료학회지
    • /
    • 제22권12호
    • /
    • pp.696-700
    • /
    • 2012
  • (Na, K) $NbO_3$ thick film was successfully achieved using a sol-gel coating process with the addition of polyvinylpyrrolidone (PVP) to a metal alkoxide solution. The transparent coating solution, mixed with Nb:PVP = 1:1 in a molar ration, was synthesized by evaporating the solvent to over 62.5 wt%. Additive PVP increased the viscosity of the solution so that the coating thickness could be enhanced. The thickness of the (Na, K) $NbO_3$ film assisted by PVP was ca. 320 nm at the time of deposition; this value is four times thicker than that of the sample fabricated without PVP. Also, due to PVP binding with the OH groups of the metal alkoxide, the condensation reaction in the film was suppressed. The crystalline size of the (Na, K) $NbO_3$ films assisted by PVP was ca. 15 nm smaller than that of the film fabricated without PVP. After the sintering process at $700^{\circ}C$, the (Na, K) $NbO_3$ films were mainly composed of randomly oriented (Na, K) $NbO_3$ phase of perovskite crystal structure, including a somewhat secondary phase of $K_2Nb_4O_{11}$. However, by adding PVP, the content of the secondary phase became quite smaller than that of the sample without PVP. It was thought that the addition of PVP might have the effect of restraining the loss of potassium and that PVP could hold metalloxane by strong hydrogen bonding before complete decomposition. Therefore, the film thickness of the (Na, K) $NbO_3$ films could be considerably advanced and made more crack-free by the addition of PVP.

The Effect of Thickness on Flexible, Electrical and Optical properties of Ti- ZnO films on Flexible Glass by Atomic Layer Deposition

  • 이우재;윤은영;권세훈
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
    • /
    • pp.196.1-196.1
    • /
    • 2016
  • TCO(Transparent Conducting Oxide) on flat glass is used in thin-film photovoltaic cell, flat-panel display. Nowadays, Corning(R) Willow Glass(R), known as flexible substrate, has attracted much attention due to its many advantages such as reliable roll-to-roll glass processing, high-quality flexible electronic devices, high temperature process. Also, it can be an alternative to flexible polymer substrates which have their poor stability and degradation of electrical and optical qualities. For application on willow glass, the flexibility, electrical, optical properties can be greatly influenced by the TCO thin film thickness due to the inherent characterization of thin film in nanoscale. It can be expected that while thick TCO layer causes poor transparency, its sheet resistance become low. Also, rarely reports were focusing on the influence of flexible properties by varying TCO thickness on flexible glass. Therefore, it is very important to optimize TCO thickness on flexible Willow glass. In this study, Ti-ZnO thin films, with different thickness varied from 0 nm to 50 nm, were deposited on the flexible willow glass by atomic layer deposition (ALD). The flexible, electrical and optical properties were investigated, respectively. Also, these properties of Ti-doped ZnO thin films were compared with un-doped ZnO thin film. Based on the results, when Ti-ZnO thin films thickness increased, resistivity decreased and then saturated; transmittance decreased. The Figure of Merit (FoM) and flexibility was the highest when Ti-ZnO thickness was 40nm. The flexible, electrical and optical properties of Ti-ZnO thin films were better than ZnO thin film at the same thickness.

  • PDF

Ni 박막 위치에 따른 GZO 투명전도막의 전기광학적 물성 변화 (Influence of Ni Thin Film Position on the Opto-electrical Properties of GZO Films)

  • 문현주;전재현;공태경;서기웅;오정현;김선경;최동혁;손동일;김대일
    • 열처리공학회지
    • /
    • 제28권3호
    • /
    • pp.121-125
    • /
    • 2015
  • GZO single layer, Ni buffered GZO(GZO/Ni), Ni intermediated GZO (GZO/Ni/GZO) and Ni capped GZO (Ni/GZO) films were prepared on poly-carbonate (PC) substrates by RF and DC magnetron sputtering without intentional substrate heating and then the influence of the Ni (2 nm thick) thin film on the optical, electrical and structural properties of GZO films were investigated. As deposited GZO single layer films show the optical transmittance of 81.3% in the visible wavelength region and a resistivity of $1.0{\times}10^{-2}{\Omega}cm$, while GZO/Ni/GZO trilayer films show a lower resistivity of $6.4{\times}10^{-4}{\Omega}cm$ and an optical transmittance of 74.5% in this study. Based on the figure of merit, it can be concluded that the intermediated Ni thin film effectively enhances the opto-electrical performance of GZO films for use as transparent conducting oxides in flexible display applications.

디스플레이용 SiO2/ITO 투명전도막의 반사특성 (Reflection Properties of SiO2/ITO Transparent and Conductive Thin Films for Display)

  • 신용욱;김상우;윤기현
    • 한국세라믹학회지
    • /
    • 제39권3호
    • /
    • pp.233-239
    • /
    • 2002
  • CRT의 전면에 전자파차폐, 정전기 방지 및 저반사 효과를 위해 코팅되는 $SiO_2$/ITO (Indium Tin Oxide) 이층박막의 반사특성에 관하여 연구하였다. 실리카층 및 ITO층의 두께를 변화시키며 나타나는 반사율의 경향을 고찰하고, 이론적인 2층, 3층 저반사코팅의 디자인에 적용시켜 보았다. 입자 상으로 코팅된 ITO는 두께가 증가할수록 기공에 의해 박막의 불균일성이 증가하면서 이론적인 반사모델과의 차이가 커졌다. 실리카와 ITO의 계면에 존재하는 혼합층의 영향으로 인하여 실제측정반사율은 2층으로 디자인한 이론반사율보다 $SiO_2$/$SiO_2$+ITO/ITO의 3층으로 디자인한 반사모델에 보다 잘 적용되었다. 이론적인 저반사 디자인은 근거로 $SiO_2$/ITO 박막의 두께를 90, 65 nm로 조절한 이층막은 기준파장에서 2.5%의 반사율을 나타내었고, 가시광선 영역에서 이론반사율과 유사한 거동을 보였다.

Sol-Gel 법을 이용한 ITO박막의 제조 (Fabrication of ITO Thin Film by Sol-Gel Method)

  • 김지홍;이재호;김영환
    • 전기화학회지
    • /
    • 제3권1호
    • /
    • pp.11-14
    • /
    • 2000
  • 가시광선 영역에서의 높은 투과성과 우수한 전도성을 가진 전도성 ITO박막은 그 전기적 광학적 특성에 의해서 태양 전기 기판의 전극 재료나 Display소자의 투명전극으로 개발되고 있다. 이들의 제작은 현재 sputtering이 주종을 이루나 이들의 높은 생산비를 절감할 목적으로 sol-ge떫을 이용하여 ITO박막을 만들었다. ITO제조용 sol은 유기질 sol로는 indium tri-iso-propoxide를 ethylene glycol monoethyl ether에 녹인 후 $SnCl_4$를 dopant로 사용하여 제조하였다. Acetyl acetone을 넣어 sol이 수화되는 현상을 억제하였다. 무기질 sol로는 indium acetate를 n-propanol에 용해하여 사용하였다. Spin 방법을 이용하여 코팅하였으며 $500^{\circ}C$에서 열처리하였다. 가시 광선 영역에서의 투과도는 $90\%$ 이상을 얻었으며 비저항은 $0.01\Omega{\cdot}cm$가 측정되었다.

Formation of Plasma Damage-Free ITO Thin Flims on the InGaN/GaN based LEDs by Using Advanced Sputtering

  • Park, Min Joo;Son, Kwang Jeong;Kwak, Joon Seop
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
    • /
    • pp.312-312
    • /
    • 2013
  • GaN based light emitting diodes (LEDs) are important devices that are being used extensively in our daily life. For example, these devices are used in traffic light lamps, outdoor full-color displays and backlight of liquid crystal display panels. To realize high-brightness GaN based LEDs for solid-state lighting applications, the development of p-type ohmic electrodes that have low contact resistivity, high optical transmittance and high refractive index is essential. To this effect, indiumtin oxide (ITO) have been investigated for LEDs. Among the transparent electrodes for LEDs, ITO has been one of the promising electrodes on p-GaN layers owing to its excellent properties in optical, electrical conductivity, substrate adhesion, hardness, and chemical inertness. Sputtering and e-beam evaporation techniques are the most commonly used deposition methods. Commonly, ITO films on p-GaN by sputtering have better transmittance and resistivity than ITO films on p-GaN by e-bam evaporation. However, ITO films on p-GaN by sputtering have higher specific contact resistance, it has been demonstrated that this is due to possible plasma damage on the p-GaN in the sputtering process. In this paper, we have investigated the advanced sputtering using plasma damage-free p-electrode. Prepared the ITO films on the GaN based LEDs by e-beam evaporation, normal sputtering and advanced sputtering. The ITO films on GaN based LEDs by sputtering showed better transmittance and sheets resistance than ITO films on the GaN based LEDs by e-beam evaporation. Finally, fabricated of GaN based LEDs by using advanced sputtering. And compared the electrical properties (measurement by using C-TLM) and structural properties (HR-TEM and FE-SEM) of ITO films on GaN based LEDs produced by e-beam evaporation, normal sputtering and advanced sputtering. As a result, It is expected to form plasma damage free-electrode, and better light output power and break down voltage than LEDs by e-beam evaporation and normal sputter.

  • PDF

압전폴리머 PVDF를 이용한 복합형 유연 OLED 디스플레이 소자 (Combinational flexible OLED display device using piezoelectric polymer PVDF)

  • 이상엽;배병택;박동희;최지원;최원국
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
    • /
    • pp.55-55
    • /
    • 2008
  • 압전폴리머 PVDF(polyvinylidene difluoride)의 기판소재를 기반으로 한 디스플레이 소자를 연구하였다. 압전 폴리머 PVDF의 양면은 두께 300nm정도의 ITO(Indium Tin Oxide)를 TCO(Transparent conducting oxide)로 R2R(roll to roll)증착하였으며, 이를 적외선 계열 Pulsed Laser로 상온 건식 에칭을 통해 패턴해내고, 이후 고진공 환경에서 Alq3 를 기반의 유기발광소자를 제작하였다. 전기적 신호에 대해서 기계적인 작동이 가능한 투명 압전 폴리머 재료를 디스플레이 발광소자의 기판 소재로 사용함으로써, 궁극적으로 발광기능과 더불어 압전효과에 의한 스피커 기능이 한 개의 개체내에서 독립적으로 구현될 수 있도록 설계하고, 기술적으로 실현시켰다는 점이 본 연구의 의의라고 할 수 있다. 이를 위해서, 섭씨 80도 이상의 온도에서 압전 성질을 상실하는 것으로 알려진 PVDF에 대해서 투명산화전극을 레이져를 이용한 비가열식 승화방법을 통해 패턴화하는 것을 사용했으며, 밀리미터 단위에서 수십 마이크로미터 수준까지 패턴화할 수 있었다. 제작된 복합형 유연 OLED소자는 기계적으로 휘어진 상태에서도 발광 성능과 스피커 성능을 각각 독립적으로 보였으며, Alq3에 의한 녹색발광을 보임을 확인하였고, 이 경우 양자효율은 약 3%이하의 값을 보였다. 또한 각주파수별 음압(SPL: Sound Pressure Level)측정 결과는 압번폴리머가 가청주파수 영역에서 작동함을 보였으며, 고주파영역에서의 SPL값이 증가하는 전형적인 PVDF사용 필름 스피커의 특성을 보였다. 이로부터 제작된 복합형 소자는 본 연구에서 제안된 목적에서 보인 것과 같이, 두 개의 기능이 서로간의 간섭없이 독립적으로 한 개의 개체 내에서 작동함을 확인할 수 있었다. 본 연구 결과로부터 새로운 유연 전자 소자에 대한 디자인 개념을 제시하고, 기타 다른 기능이 접합된 형태의 신개념 전자 소자를 제안하는 것도 가능할 것으로 기대된다.

  • PDF

전극과 계면간의 개질에 의한 유기태양전지의 성능 연구 (A performance study of organic solar cells by electrode and interfacial modification)

  • 강남수;어용석;주병권;유재웅;진병두
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
    • /
    • pp.67-67
    • /
    • 2008
  • Application of organic materials with low cost, easy fabrication and advantages of flexible device are increasing attention by research work. Recently, one of them, organic solar cells were rapidly increased efficiency with regioregular poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61-butyricacidmethylester (PCBM) used typical material. To increased efficiency of organic solar cell has tried control of domain of PCBM and crystallite of P3HT by thermal annealing and solvent vapor annealing. [4-6] In those annealing effects, be made inefficiently efficiency, which is increased fill factor (FF), and current density by phase-separated morphology with blended P3HT and PCBM. In addition, increased conductivity by modified hole transfer layer (HTL) such as Poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS), increased both optical and conducting effect by titanium oxide (TiOx), and changed cathode material for control work function were increased efficiency of Organic solar cell. In this study, we had described effect of organic photovoltaics by conductivity of interlayer such as PEDOT:PSS and TCO (Transparent conducting oxide) such as ITO, which is used P3HT and PCBM. And, we have measured with exactly defined shadow mask to study effect of solar cell efficiency according to conductivity of hole transfer layer.

  • PDF

TiO2/Si3N4/Ag/Si3N4/TiO2 다층구조에서 Si3N4 버퍼층이 투과율에 미치는 영향 (Effect of Si3N4 Buffer Layer on Transmittance of TiO2/Si3N4/Ag/Si3N4/TiO2 Multi Layered Structure)

  • 이서희;장건익
    • 한국전기전자재료학회논문지
    • /
    • 제25권1호
    • /
    • pp.44-47
    • /
    • 2012
  • The $TiO_2/Si_3N_4/Ag/Si_3N_4/TiO_2$ multi layered structure was designed for the possible application of transparent electrodes in PDP (Plasma Display Panel). Multi layered film was deposited on a glass substrate at room temperature by DC/RF magnetron sputtering system and EMP (Essential Macleod Program) was adopted to optimize the optical characteristics of film. During the deposition process, the Ag layer in $TiO_2/Ag/TiO_2$ became heavily oxidized and the filter characteristic was degraded easily. In thus study, Si3N4 layer was used as a diffusion buffer layer between $TiO_2$ and Ag. in order to prevent the oxidation of Ag layer in $TiO_2/Si_3N_4/Ag/Si_3N_4/TiO_2$ structure. It was confirmed that $Si_3N_4$ layer is one of candidate materials acting as diffusin barrier between $TiO_2/Ag/TiO_2$.

Enhanced Electrical Properties of Light-emitting Electrochemical Cells Based on PEDOT:PSS incorporated Ruthenium(II) Complex as a Light-emitting layer

  • 강용수;박성희;이혜현;조영란;황종원;최영선
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
    • /
    • pp.139-139
    • /
    • 2010
  • Ionic Transition Metal Complex based (iTMC) Light-emitting electrochemical cells (LEECs) have been drawn attention for cheap and easy-to-fabricate light-emitting device. LEEC is one of the promising candidate for next generation display and solid-state lighting applications which can cover the defects of current commercial OLEDs like complicated fabrication process and strong work-function dependent sturucture. We have investigated the performance characteristics of LEECs based on poly (3, 4-ethylenedioxythiophene):poly (styrene sulfonate) (PEDOT:PSS)-incorporated transition metal complex, which is tris(2, 2'-bipyridyl)ruthenium(II) hexafluorophosphate in this study. There are advantages using conductive polymer-incorporated luminous layer to prevent light disturbance and absorbance while light-emitting process between light-emitting layer and transparent electrode like ITO. The devices were fabricated as sandwiched structure and light-emitting layer was deposited approximately 40nm thickness by spin coating and aluminum electrode was deposited using thermal evaporation process under the vacuum condition (10-3Pa). Current density and light intensity were measured using optical spectrometer, and surface morphology changes of the luminous layer were observed using XRD and AFM varying contents of PEDOT:PSS in the Ruthenium(II) complex solution. To observe enhanced ionic conductivity of PEDOT:PSS and luminous layer, space-charge-limited-currents model was introduced and it showed that the performances and stability of LEECs were improved. Main discussions are the followings. First, relationship between film thickness and performance characteristics of device was considered. Secondly, light-emitting behavior when PEDOT:PSS layer on the ITO, as a buffer, was introduced to iTMC LEECs. Finally, electrical properties including carrier mobility, current density-voltage, light intensity-voltage, response time and turn-on voltages were investigated.

  • PDF