• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1290-1292
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• 2009

Modified-polyol protocol was utilized for synthesis of green-emitting ($^5D_4-^7F_j$ transitions of $Tb^{3+}$ ion) nanocrystalline $LaPO_4:Ce^{3+}$, $Tb^{3+}$ phosphors. Experimental parameters including chemical composition and annealing temperature were optimized to produce highly efficient, uniformly sized nanophosphors. Spin-deposited layer of $LaPO_4:Ce^{3+}$, $Tb^{3+}$ nanophosphors on glass substrate exhibited a transmittance of more than 80 %, indicating their efficacy for transparent display.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.683-686
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• 2007

We have developed the transparent passivation layer for transparent organic light-emitting devices (TOLEDs) using CsCl layer. The CsCl passivation layer improves the optical transmittance of Ca/Ag double layer which have used as a semitransparent cathode, resulting in substantial increase of the luminance by the enhanced light extraction out of the cathode surface of the TOLEDs.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.860-863
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• 2007

ZnO nano film for transparent thin film transistors is prepared by injection type source delivery system of atomic layer deposition. By using this delivery system the source delivery pulse time can dramatically be reduced to 0.005s in ALD system. ZnO nanofilms obtained at $150^{\circ}C$ are characterized.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1411-1413
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• 1997

The thin film that is electrically conductive and optically transparent is called conductive transparent thin film. ITO(Indium-Tin Oxide) which is a kind of conductive transparent thin film has been widely used in solar cell, transparent electrical heater, selective optical filter, FDP(Flat Display Panel) such as LCD (Liquid Crystal Display), PDP(Plasma Display Panel) and so on. Especially in PDP, ITO films is used as a transparent electrode in order to maintain discharge and decrease consumption power through the improvement of cell structure. In this study, we prepared ITO by reactive r.f. sputtering with indium-tin(Sn wt 10%) alloy target instead of indium-tin oxide target. The ITO films deposited at low temperature $150^{\circ}C$ and 8% $O_2$ partial pressure showed about $3.6{\Omega}/{\square}$. At the end of firing, the resistance of ITO was decreased, the optical transparence was improved above 90%.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.77-77
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• 2007

The development of next generation displays such as flexible display is a major challenge. Most materials and processes in current flat panel display industry cannot be transferred to flexible substrates. Typically, indium tin oxide (ITO) thin films are brittle and need to be deposited at high temperature to achieve an optimal opto-electrical property, therefore ITO films cannot be used as a flexible electrode. Up to date, many alternative materials to ITO have been proposed such as conductive polymers, nanometals, solution deposited transparent conductive oxide(TCO) and carbon nanotubes(CNTs). CNT based transparent conductive films are fabricated on glass and polymer substrates. CNT thin films exhibit a sheet resistance ($R_s$) of nearby $10^3\;{\Omega}/sq$ with a transmittance of around 80% on the visible light range, which is attributed by excellent dispersion and interaction among CNTs, solvents and polymeric binders. This talk will present the current studies, opto-electrical properties, design criteria and its applications for CNT-based transparent conductive films.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.990-993
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• 2006

We fabricated top emission organic light emitting diode (TEOLED) with transparent metal cathode Barium and Silver bilayer. Very thin Ba/Ag bilayer was deposited on the organic layer by thermal evaporation. This cathode shows high transmittance over 70% in visible range. And the device with a Ba-Ag has a low turn on voltage and good electrical properties.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.555-557
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• 2004

We report the effect of the particle size (D50) and PSD (Particle Size Distribution) of glass frit on the transparency of transparent dielectric layer of PDP. The milling efficiency of wet milling with water was the best among the dry milling, wet milling with IPA and wet milling with water. The transparency increased with the reduction of particle size of glass frit as the milling time increased. Also the transparency changed by the PSD of glass frit. Glass frits of broad PSD showed high transparency compared with the glass frits of sharp PSD.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1988년도 춘계학술대회 논문집
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• pp.13-16
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• 1988

In this paper, image storage and display of scattering mode using 7/65/35 PLZT ceramics was studied. Scattering in a ferroelectric poly-crystal depends on its grain size and domain orientations. 7/65/35 PLZT ceramics is ferroelectric and transparent. Image can be stored in the ceramic substrate by poling it selectively through a pair of electrodes with the pattern or a set of a photoconductivity film and two transparent electrodes.

• Current Optics and Photonics
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• 제1권2호
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• pp.95-100
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• 2017

The transmittance of the three dimensional (3D) transparent display is an important factor and can be enhanced by adding a see-through area to the displayed 3D image in order to transmit an ambient light with maximum transparency. However, there is a side effect that the perceived 3D resolution can be degraded due to the see-through area. In this paper, we propose an advanced method to resolve the above trade-off relation between the transparency and the 3D resolution by using an active parallax barrier (PB) with a see-through area. The experimental results are also presented to prove the proposed principle.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.601-604
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• 2006

We have developed ZnO TFT array using conventional photolithography and wet etching processes. Transparent 20 nm of ultra thin ZnO film deposited by means of plasma enhanced atomic layer deposition at $100^{\circ}C$ was used for the active channel. The ZnO TFT has a mobility of $0.59cm^2/V.s$, a threshold voltage of 7.2V, sub-threshold swing of 0.64V/dec., and an on/off ratio of $10^8$.