• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.50.1-50.1
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• 2009

Transparent conductive oxides (TCOs) play an important role in thin-film solar cells in terms of low cost and performance improvement. Al-doped ZnO (AZO) is a very promising material for thin-film solar cellfabrication because of the wide availability of its constituent raw materials and its low cost. In this study, AZO films were prepared by low pressurechemical vapor deposition (LPCVD) using trimethylaluminum (TMA), diethylzinc(DEZ), and water vapor. In order to improve the absorbance of light, atypical surface texturing method is wet etching of front electrode using chemical solution. Alternatively, LPCVD can create a rough surface during deposition. This "self-texturing" is a very useful technique, which can eliminate additional chemical texturing process. The introduction of a TMA doping source has a strong influence on resistivity and the diffusion of light in a wide wavelength range.The haze factor of AZO up to a value of 43 % at 600 nm was achieved without an additional surface texturing process by simple TMA doping. The use of AZO TCO resulted in energy conversion efficiencies of 7.7 % when it was applied to thep-i-n a-Si:H thin film solar cell, which was comparable to commercially available fluorine doped tin oxide ($SnO_2$:F).

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.336.2-336.2
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• 2014

Indium Tin Oxide (ITO) thin films are used as the Transparent Conducting Oxide (TCO), such as flat panel display, transparent electrodes, solar cell, touch screen, and various optical devices. ZnO has attracted attention as alternative materials to ITO film due to its resource availability, low cost, and good transmittance at the visible region. Recently, very thin film deposition is important. In order to minimize the damage caused by bending. However, ZnO thin film such as Ga-doped ZnO(GZO) has poor sheet resistance characteristics. To solve this problem, By adding the conductive metal on films can decrease the sheet resistance and increase the mobility of the films. In this study, We analyzed the electrical and optical characteristics of GZO/Ag/GZO (GAG) films by change in Ag and GZO thickness.

• JSTS:Journal of Semiconductor Technology and Science
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• v.16 no.1
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• pp.39-43
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• 2016

The structural, electrical properties of Ga doped MgZnO transparent conductive oxide (TCO) films by ratio-frequency(RF) magnetron sputtering were investigated. Ga doped MgZnO TCO films were deposited on the sapphire substrates at $200^{\circ}C$ varying growth thickness 200 to 600 nm. The optical properties of Ga doped MgZnO TCO films were showed above 85% transmittance from 300 to 1000 nm region. In addition, the current density ($J_{SC}$) of $Cu(In,Ga)Se_2$ (CIGS) solar cells was improved by using the MgZnO:Ga films of 500 nm thickness because of outstanding electrical properties. The $Cu(In,Ga)Se_2$ solar cells with MgZnO:Ga transparent conducing layer yielded an efficiency of 9.8% with current density ($31.8mA/cm^2$), open circuit voltage (540.2 V) and fill factor (62.2) under AM 1.5 illumination.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.182-182
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• 2011

태양전지용 TCO로 사용되는 ITO 박막의 고온에서의 전기적 특성을 향상시키기 위하여 고온 안정성을 가지는 GZO/ITO 박막을 증착 하였다. GZO/ITO 박막의 특성은 버퍼 층인 ITO의 두께 및 구조에 의해 영향을 받는 것을 알 수 있었다.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.37 no.6
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• pp.577-582
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• 2013

AZO (aluminum-doped zinc oxide) is one of the best candidate materials to replace ITO (indium tin oxide) for TCOs (transparent conductive oxides) used in flat panel displays, organic light-emitting diodes (OLEDs), and organic solar cells (OSCs). In the present study, to apply an AZO thin film to the transparent electrode of an organic solar cell, a low-temperature selective atomic layer deposition (ALD) process was adopted to deposit an AZO thin film on a flexible poly-ethylene-naphthalate (PEN) substrate. The reactive gases for the ALD process were di-ethyl-zinc (DEZ) and tri-methyl-aluminum (TMA) as precursors and H2O as an oxidant. The structural, electrical, and optical characteristics of the AZO thin film were evaluated. From the measured results of the electrical and optical characteristics of the AZO thin films deposited on the PEN substrates by ALD, it was shown that the AZO thin film appeared to be comparable to a commercially used ITO thin film, which confirmed the feasibility of AZO as a TCO for flexible organic solar cells in the near future.

• Proceedings of the KIEE Conference
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• 2008.07a
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• pp.1254-1255
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• 2008

Low cost TCO(Transparent Conductive oxide) thin films were prepared by 6" DC/RF magnetron sputtering systems. For the AZO preparation processes a 99.99% AZO target (Zn: 98 wt.%, $Al_2O_3$: 2 wt.%) was used. In order to verify the optical properties of the AZO thin films, the transparency was tested with sputtering conditions using UV-visible spectroscopy. As a result, we got the transmittance properties over 80% and low resistivity in the sputtering conditions of DC 200[W], Ar 30 [sccm], 1 [mtorr], 20 [min].

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.337-337
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• 2014

투명 전도성 산화물(transparent conductive oxide: TCO) 박막은 높은 투과율과 낮은 비저항 덕분에 LCD (liquid crystal display), PDP (plasma display panel), OLED (organic light emitting display) 등 평판 디스플레이에 널리 사용되고 있다. 현재 양산되고 있는 ITO (indium tin oxide)는 90% 이상의 높은 투과율과 우수한 전도성으로 인해 TCO 박막 가운데서 디스플레이 산업에서 가장 널리 쓰이고 있다. 그런데, ITO의 인듐산화물에 의한 간질성 폐렴(interstitial pneumonia)의 유발 위험이 있다든가, 인듐의 매장량이 적어 원자재 가격이 비싼 단점도 가지고 있다. 이에 최근 ITO를 대체할 수 있는 TCO물질로 많은 연구가 이루어지고 있는데, 특히 AZO (aluminum-doped zinc oxide)는 그 중 대표적인 대체물질로서 독성이 없고 가격도 저렴하여 많은 관심이 증폭되고 있다. 현재 AZO는 sol-gel 방법이나 CVD (chemical vapor deposition) 또는 스퍼터링 방법 등으로 증착되고 있다. 본 연구에서는 두 개의 이종타겟(hetero target)을 장착한 대향 타겟 스퍼터링(facing target sputtering: FTS) 장치를 사용하여 AZO 박막을 제작한다. 기존의 여러 증착법과 달리, FTS 장치는 두 타겟 사이에 형성되는 플라즈마 내의 ${\gamma}$-전자를 구속하게 되며, 낮은 가스 압력에서 고밀도 플라즈마가 생성되어 빠른 증착 속도와 안정적인 방전을 유지한 상태에서 박막을 증착할 수가 있다. 또한 기판과 플라즈마가 이격되어 있어 높은 에너지를 갖는 입자들의 기판 충돌을 억제할 수 있는 장점들을 갖는다. 이종 타겟인 ZnO와 Al2O3를 사용하고 각 타겟에 인가되는 파워 변화를 통해 AZO 박막 내 Al2O3의 성분비를 조절하였다. ZnO 타겟의 증착 파워를 100 W로 고정할 경우, Al2O3 타겟의 증착 파워가 (50~90) W으로 실험을 하였으며, Al2O3 타겟의 증착 파워가 70 W일 때 AZO 박막의 Al2O3 성분비는 2.02 wt.%이며 박막의 비저항 값은 $5{\times}10^{-4}{\Omega}{\cdot}cm$로 최소값을 보였다. 이러한 비저항의 변화는 파워에 따른 AZO 박막의 캐리어 이동도(Hall mobility)와 캐리어의 농도(Carrier Concentration)의 변화와 밀접한 관계가 있음을 보여주며, 특히 AZO 박막의 캐리어 농도와 캐리어 이동도는 AZO 박막을 형성하고 있는 결정립의 크기에 의존하는 것이 X-선 회절 패턴과 SEM으로부터 확인되었다. 특히, 본 연구에서는 두 개의 이종 타겟(hetero target) Al2O3와 ZnO를 장착하고 각각의 파워를 변화시켜 도핑 량을 조절할 수는 대향 타겟 스퍼터링(FTS: facing-target sputtering) 방법을 이용하여 제작된 AZO 박막에 대해 전기적, 광학적 및 구조적 특성을 분석하고 ITO의 대체물로서의 가능성을 검토하고자 한다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.107-107
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• 2011

오늘 날 transparent conductive oxide는 다양한 분야에서 활용되고 있다. 최근에는 태양전지 분야에서도 많이 활용되고 있으며, 초기에는 transmittance 및 낮은 sheet resistance 특성을 가지는 ITO가 많이 활용되었지만 thin film solar cell와 같이 hydrogenation 공정에 약한 ITO보다는 Al-doped ZnO가 사용되기 시작하면서 많은 연구가 진행되고 있다. 본 연구에서는 thin film solar cell 및 silicon heterojunction solar cell에 적용 가능한 Al-doped ZnO에 관한 연구로써 a-Si:H의 Si-H bonds에 영향을 주지 않는 낮은 영역의 substrate temperature와 power로 Al-doped ZnO를 형성하고 상기 parameter에 따른 Al-doped ZnO의 특성 변화에 대해서 분석하였다. 특히 substrate temperature가 변화할수록 carrier concentration 및 sheet resistance가 많은 변화를 보였으며 이로 인하여 transmittance 특성이 온도에 따라 좋아지다가 너무 높은 온도에서는 오히려 좋지 않게 되었다. 이는 너무 높은 carrier concentration은 free carrier absorption에 의해 transmittance 특성을 오히려 좋지 않게 한다. 우리는 본 연구를 통해 92.677% (450 nm), 90.309% (545 nm), 94.333% (800 nm)의 transmittance를 얻을 수 있었다.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.59 no.4
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• pp.754-758
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• 2010

In general, Dye-sensitized Solar Cells(DSCs) consist of the nanocrystalline titanium dioxide($TiO_2$) layer which is fabricated on a transparent conductive oxide(TCO) layer such as $F/SnO_2$ glass, a dye adhered to the $TiO_2$, an electrolyte solution and platinum-coated TCO. Among these components, two TCO substrates are estimated to be about 60% of the total cost of the DSCs. Currently novel TCO-less structures have been investigated in order to reduce the cost. In this study, TCO-less DSCs consisting of titanium electrodes were investigated. The titanium electrode is deposited on top of the porous $TiO_2$ layer using electron-beam evaporation process. The porosity of the titanium electrode was found out by the SEM analysis and dye adhesion. As a result, when the thickness of the titanium electrode increased, the surface resistance decreased and the conversion efficiency increased relatively.

• Current Photovoltaic Research
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• v.12 no.2
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• pp.37-40
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• 2024

One of the current innovation trends in the solar industry is the increase in the size of silicon wafers. As the wafer size increases, the series resistance of the module rises, highlighting the need for research on methods for cutting and bonding solar cells. Among these, the Infrared (IR) laser scribing technique has been extensively researched. However, there is still insufficient optimization research regarding the thermal damage caused by lasers on the Transparent Conductive Oxide (TCO) layer of Heterojunction (HJT) solar cells. Therefore, in this study, we systematically varied conditions such as IR laser scribing speed, frequency, power, and the number of scribes to investigate their impact on the performance of cut cells under each condition. Additionally, we conducted a comparative analysis of thermal damage effects on the TCO layer based on varying scribing depths.