• Title/Summary/Keyword: total deposition

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Preparation of Ultrafine Silica Powders by Chemical Vapor Deposition Process (기상반응(CVD)법 의한 실리카 미분말의 제조)

  • Choi, Eun-Young;Lee, Yoon-Bok;Shin, Dong-Woo;Kim, Kang-Ho
    • Korean Journal of Materials Research
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    • v.12 no.11
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    • pp.850-855
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    • 2002
  • Silica powders were prepared from $SiCl_4$-$H_2$O system by chemical vapor deposition process, and investigated on size control of the products with reaction conditions. The products were amorphous and nearly spherical particles with 130nm~50nm in size. The size distribution became narrow with the increase of [$H_2$O]/[SiCl$_4$] concentration ratio. The particle size decreased with the increase of reaction temperature, [$H_2$O]/[SiCl$_4$] concentration ratio and total flow rate. The specific surface area measured by BET method was about three times larger than that of electron microscope method.

ELECTROSTATIC SPRAYER OF AGRICULTURAL CHEMICALS

  • Kang, T.G.;Lee, D.H.;Lee, C.S.;Kim, H.j.;Chung, S.J.
    • Proceedings of the Korean Society for Agricultural Machinery Conference
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    • 2000.11c
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    • pp.811-818
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    • 2000
  • Agricultural chemicals spraying is one of the most efficient methods for pesticides control. General farming groups use Speed Sprayer but its deposition amount on practical crops is only 20% of total amount in SS case. Agricultural chemicals which fail to arrive the crops not only cause environmental contamination but loss of agriculture chemicals by lower deposition efficiency. For the purpose of improvement of these problems, this experiment proposes SS attachment type electrostatic induction spraying apparatus with DC power which improves deposition efficiency of agriculture chemicals on the crops.

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Structural and Electrical Properties of Reactively Sputtered Titanium Nitride Films (DC 반응성 스퍼터링된 TiN 박막의 구조적 및 전기적 특성)

  • 류성용;오원욱;백수현;신두식;오재응;김영남;심태언;이종길
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.8
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    • pp.49-55
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    • 1992
  • We Have investigated the properties of the titanium nitrite films widely used in VLSI devices as diffusion barrier in Al-based metallization. TiN films were formed by reactive sputtering from Ti target in Ar-N$_2$ mixtures, varying deposition parameters such as N$_2$ partial pressure, substrate temperature, power, and total pressure. All the samples received the heat treatment at 45$0^{\circ}C$ for 30 min. The resulting films are characterized by mechanical stylus($\alpha$-step), x-ray diffraction(XRD), scanning electron microscopy(SEM), and four point probe method. The Tin film properties strongly depend on the deposition condition. The stoichiometry and Ti deposition rate are critically affected by nitrogen partial pressure, and the resistivity, in particular, is dependent on both the substrate temperature and sputtering power.

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Effects of PECVD Process Parameters on the Characteristics of SiN Thin Film (PECVD공정 조건의 질화실리콘 박막특성에 대한 효과)

  • 이종무;이철진
    • Journal of the Korean Ceramic Society
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    • v.24 no.2
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    • pp.170-178
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    • 1987
  • Changes of the properties of PECVD-SiN film with the variation of deposition process parameters were investigated and optimum process parameters were determined. The refractive index of the film increased with increasing substrate temperature and pressure, and decreasing rf-power, NH3/SiH4 gas ratio and total gas flow. BHF etch rate and deposition rate show a decreasing tendency with increasing refractive index. The step coverage of the film was not affected much by deposition rate and pressure, but improved apparently with increasing rf-power and NH3/SiH4 gas ratio. Also the optimum process parameters were determined by considering the characteristic properties as well as thickness uniformity of films. The refractive index of the film deposited under this condition was 2.06.

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Computed tomography-guided 3D printed patient-specific regional anesthesia

  • Jundt, Jonathon S.;Chow, Christopher C.;Couey, Marcus
    • Journal of Dental Anesthesia and Pain Medicine
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    • v.20 no.5
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    • pp.325-329
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    • 2020
  • Classic anesthetic techniques for the inferior alveolar nerve, lingual nerve, and long buccal nerve blockade are achieved by estimating the intended location for anesthetic deposition based on palpation, inspection, and subsequent correlation for oral anatomical structures. The present article utilizes computed tomography (CT) data to 3D print a guide for repeatable and accurate deposition of a local anesthetic at the ideal location. This technical report aims to anatomically define the ideal location for local anesthetic deposition. This process has the potential to reduce patient discomfort, risk of nerve damage, and failed mandibular anesthesia, as well as to reduce the total anesthetic dose. Lastly, as robotic-based interventions improve, this provides the initial framework for robot-guided regional anesthesia administration in the oral cavity.

Properties of Electrical Destruction of Polyimide Thin Film Fabricated by The Methode of Electrophoretic Deposi pion (전기영동법을 이용한 폴리이미드 박막의 절연파괴특성)

  • 박귀만;김종석;박강식;김석기;정광희
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.05a
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    • pp.103-107
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    • 1994
  • An experimental study was carried out to investigate the fabrication process and electrical breakdown of electrodeposted polyimide film from nonaqueous emulsion onto metal electrode surface. The thickness of imide film control led by the deposition voltage and time are proportional to the voltage or time. From the results, yeilds is proportional to the total elctrical charge flow through the electrode. When electrophoretic deposition voltage is 30 [V] deposition time is 30 sec, 40 sec, 50 sec, then the thickness of the films are 2.13 $\mu\textrm{m}$, 2.69 $\mu\textrm{m}$, 3.16 $\mu\textrm{m}$, 3.94 $\mu\textrm{m}$, respectively Electrical breakdown voltage of polyimide thin film shows very high. As film thicknes increase, the breakdown voltage are increased, but are net directly proprotional to thickness of the film.

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Prediction for Slag Mass Accumulation in the Kick Motor (킥모터 슬래그 적층량 예측)

  • Jang, Je-Sun;Kim, Byung-Hun;Cho, In-Hyun
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2008.11a
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    • pp.217-220
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    • 2008
  • Slag mass deposition was required to predict accurate performance of kick motor (KM) system. Slag mass accumulation was analyzed through the aluminum oxide particle paths to predict slag mass deposition. Numerical analysis to solve both flow field and droplet accumulation was performed with Fluent 6.3 program. The effects for the acceleration and diameters of the aluminum oxide particles was analyzed, finally total slag mass accumulation was acquired. It confirmed that the slag mass deposition was agreed well with previously slag mass prediction based on KM ground test.

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SILICON DIOXIDE FILMS FOR INTERMETAL DIELECTRIC APPLICATIONS DEPOSITED BY AN ECR HIGH DENSITY PLASMA SYSTEM

  • Denison, D.R.;Harshbarger, W.R.
    • Journal of the Korean Vacuum Society
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    • v.4 no.S1
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    • pp.130-137
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    • 1995
  • Deopsition of thermal quality SiO2 using a high density plasma ECR CVD process has been demonstrated to give void and seam free gap fill of high aspect ratio metallization structures with a simple oxygen-silane chemistry. This is achieved by continuous sputter etching of the film during the deposition process. A two-step process is utilized to deposit a composite layer for higher manufacturing efficiency. The first step, which has a deposition rate of approximately 0.5 $\mu$m/min., is used to provide complete gap fill between the metal lines. The second step, which has a deposition rate of up to 1.5 $\mu$m/min., is used to deposit a total thickness of 2.0$\mu$m for the intermetal dielectric film. The topography of this composite film is very compatible with subsequent chemicl mechanical polishing(CMP) planarization processing.

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STUDY ON ATMOSPHERIC BEHAVIOR OF POLYCYCLIC AROMATIC HYDROCARBONS IN URBAN AREA, JEONJU

  • Kim, Hyoung-Seop;Kim, Jong-Guk;Kim, Kyoung-Soo
    • Environmental Engineering Research
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    • v.12 no.3
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    • pp.118-127
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    • 2007
  • Between June and November 2002, the atmospheric concentrations and dry deposition fluxes of polycyclic aromatic hydrocarbons (PAHs) in Chonju were measured four times each over five days. The total concentration of PAHs in ambient air was $84\;ng/m^3$, with about 90% existing in the vapor phase. Plots of log ($K_p$) vs. log (${P_L}^0$) indicated that PAHs partitioning was not in equilibrium and the particulate characteristics did not change with seasonal variations. The PAHs fluxes to a water surface sampler (WSS) and a dry deposition plate (DDP) were about 14.15 and $1.92\;{\mu}g/m^2/d$, respectively. The flux of the gaseous phase, acquired by subtracting the DDP from the WSS results, was about $12.23\;{\mu}g/m^2/d$. A considerable correlation was shown between the atmospheric concentrations and deposition fluxes in the gaseous phase, but not in the particulate phase, as the fluxes of the particulate phase were dependent on the physical velocity differences of the particulates based on the particle diameter.