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Preparation of Ultrafine Silica Powders by Chemical Vapor Deposition Process

기상반응(CVD)법 의한 실리카 미분말의 제조

  • Choi, Eun-Young (School of Materials Science and Engineering, Pusan National University) ;
  • Lee, Yoon-Bok (School of Materials Science and Engineering, Pusan National University) ;
  • Shin, Dong-Woo (Division of Materials Science and Engineering, Gyeongsang National University) ;
  • Kim, Kang-Ho (School of Materials Science and Engineering, Pusan National University)
  • Published : 2002.11.01

Abstract

Silica powders were prepared from $SiCl_4$-$H_2$O system by chemical vapor deposition process, and investigated on size control of the products with reaction conditions. The products were amorphous and nearly spherical particles with 130nm~50nm in size. The size distribution became narrow with the increase of [$H_2$O]/[SiCl$_4$] concentration ratio. The particle size decreased with the increase of reaction temperature, [$H_2$O]/[SiCl$_4$] concentration ratio and total flow rate. The specific surface area measured by BET method was about three times larger than that of electron microscope method.

Keywords

References

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