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http://dx.doi.org/10.3740/MRSK.2002.12.11.850

Preparation of Ultrafine Silica Powders by Chemical Vapor Deposition Process  

Choi, Eun-Young (School of Materials Science and Engineering, Pusan National University)
Lee, Yoon-Bok (School of Materials Science and Engineering, Pusan National University)
Shin, Dong-Woo (Division of Materials Science and Engineering, Gyeongsang National University)
Kim, Kang-Ho (School of Materials Science and Engineering, Pusan National University)
Publication Information
Korean Journal of Materials Research / v.12, no.11, 2002 , pp. 850-855 More about this Journal
Abstract
Silica powders were prepared from $SiCl_4$-$H_2$O system by chemical vapor deposition process, and investigated on size control of the products with reaction conditions. The products were amorphous and nearly spherical particles with 130nm~50nm in size. The size distribution became narrow with the increase of [$H_2$O]/[SiCl$_4$] concentration ratio. The particle size decreased with the increase of reaction temperature, [$H_2$O]/[SiCl$_4$] concentration ratio and total flow rate. The specific surface area measured by BET method was about three times larger than that of electron microscope method.
Keywords
Silica powders; Size control of the products; Chemical vapor deposition process;
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