• 제목/요약/키워드: thin-sample

검색결과 715건 처리시간 0.032초

유기물 절연 박막에 대한 유전상수의 변화에 대한 연구 (Study on the Variation of Dielectronic Constant for an Organic Insulator Film)

  • 오데레사
    • 한국진공학회지
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    • 제17권4호
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    • pp.341-345
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    • 2008
  • SiOC 박막을 산소와 bistrimethylsilylmethane 전구체의 유량비를 다르게 하여 플라즈마 발생 화학적 기상 증착방법으로 증착하였다. 증착된 SiOC박막은 Fourier transform infrared spectroscopy에 의해서 분석하였으며, 알킬기에 의한 $1000\;cm^{-1}$ 근처에 나타나는 Si-O-C 결합의 형성되는 모양과 유전상수와의 상관성에 대하여 살펴보았다. 열처리 유전상수는 더욱 낮아졌고, BTMSM/$O_2$의 유량비가 증가함에 따라서 유전상수의 선형적인 상관성은 없었다. 구간별로 유전상수는 증가했다가 감소하는 경향성이 반복적으로 나타났으며, 유전상수와의 상관성은 FTIR 스펙트라 분석기에 의해서 $950{\sim}1200\;cm^{-1}$ 에서 나타나는 Si-O-C 결합모드에서 찾을 수 있었다. Si-O-C 결합모양이 넓게 퍼지는 화학적 이동이 관찰되는 곳에서 유전상수는 낮아졌으며, 이러한 화학적 이동이 일어나는 샘플에서 유전상수가 1.65로 조사되었다.

녹차중(綠茶中)의 L-Ascorbic Acid의 정량법(定量法)에 관한 연구(硏究) (Analytical Method of L-Ascorbic Acid Content in Green Tea)

  • 신미경;남창우
    • 한국식품과학회지
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    • 제11권2호
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    • pp.77-80
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    • 1979
  • 녹차중(綠茶中)의 L-ascorbic acid를 정량(定量)함에 있어서 흔히 사용되고 있는 DNP법(法)을 적용할 때 불순물(不純物)에 의한 방해(妨害)여부와 그의 제거방법(除去方法)에 대하여 검토(檢討)한 결과(結果)는 다음과 같다. 즉, DNP법(法)으로 AsA를 측정시 ethyl glyoxal, diacetyl, caffeine둥 불순물질 및 아미노산(酸)들이 방해하였으며, 이들 물질을 제거하는 수단으로 브롬산화(酸化)후 o-phenylenediamine을 반응시킨 다음 chloroform으로 추출제거(抽出除去)하고 Amberlite $IR-120(H^{+})$로 아미노산(酸)을 제거(除去)한 후에 DNP법(法)으로 비색정양(比色定量)하면 L-ascorbic acid 함량(含量)을 정확히 측정(測定)할 수 있었다. 또한 분석소요시간(分析所要時間)이 TLC법(法)에 비해서 현저히 단축되고 재현성(再現性)도 좋아서 녹차중(綠茶中)의 ascorbic acid 정량(定量)에는 본법(本法)이 적합함을 확인하였다.

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Full-scale tests and finite element analysis of arched corrugated steel roof under static loads

  • Wang, X.P.;Jiang, C.R.;Li, G.Q.;Wang, S.Y.
    • Steel and Composite Structures
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    • 제7권4호
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    • pp.339-354
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    • 2007
  • Arched Corrugated Steel Roof (ACSR) is a kind of thin-walled steel shell, composing of arched panels with transverse small corrugations. Four full-scale W666 ACSR samples with 18m and 30m span were tested under full and half span static vertical uniform loads. Displacement, bearing capacities and failure modes of the four samples were measured. The web and bottom flange in ACSR with transverse small corrugations are simplified to anisotropic curved plates, and the equivalent tensile modulus, shear modulus and Poisson's ratio of 18m span ACSR were measured. Two 18 m-span W666 ACSR samples were analyzed with the Finite Element Analysis program ABAQUS. Base on the tests, the limit bearing capacity of ACSR is low, and for half span loading, it is 74-75% compared with the full span loading. When the testing load approached to the limit value, the bottom flange at the sample's bulge place locally buckled first, and then the whole arched roof collapsed suddenly. If the vertical loads apply along the full span, the deformation shape is symmetric, but the overall failure mode is asymmetric. For half span vertical loading, the deformation shape and the overall failure mode of the structure are asymmetric. The ACSR displacement under the vertical loads is large and the structural stiffness is low. There is a little difference between the FEM analysis results and testing data, showing the simplify method of small corrugations in ACSR and the building techniques of FEM models are rational and useful.

차단막 코팅에 의한 염료 태양전지의 전하전송효율 개선에 관한 연구 (Improvement of Charge Transfer Efficiency of Dye-sensitized Solar Cells by Blocking Layer Coatings)

  • 최우진;김광태;곽동주;성열문
    • 전기학회논문지
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    • 제60권2호
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    • pp.344-348
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    • 2011
  • A layer of $TiO_2$ thin film less than ~200nm in thickness, as a blocking layer, was deposited by 13.56 MHz radio frequency magnetron sputtering method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells (DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte ($I^-/{I_3}^-$). The presented DSCs were fabricated with working electrode of F:$SnO_2$(FTO) glass coated with blocking $TiO_2$ layer, dye-attached nanoporous $TiO_2$ layer, gel electrolyte and counter electrode of Pt-deposited FTO glass. The effects of blocking layer were studied with respect to impedance and conversion efficiency of the cells. The, electrochemical impedances of DSCs using this electrode were $R_1$: 13.9, $R_2$: 15.0, $R_3$: 10.9 and $R_h$: $82{\Omega}$. The $R_2$ impedance related by electron movement from nanoporous $TiO_2$ to TCO showed lower than that of normal DSCs. The photo-conversion efficiency of prepared DSCs was 5.97% ($V_{oc}$: 0.75V, $J_{sc}$: 10.5 mA/$cm^2$, ff: 0.75) and approximately 1% higher than general DSCs sample.

사각형 판재성형 시 벽두께 증육을 위한 금형 및 공정 설계 (Process and Die Design of Square Cup Drawing for Wall Thickening)

  • 김진호;홍석무
    • 한국산학기술학회논문지
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    • 제16권9호
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    • pp.5789-5794
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    • 2015
  • 최근 스마트 폰, 모바일 PC 제품의 외관에 필요한 가벼운 금속제품으로 제조를 하기 위하여 알루미늄 압출 공정과 CNC 가공기법을 적용한 생산방식이 널리 사용되고 있다. 하지만, 알루미늄 압출법은 외관 디자인의 제약이 있으며, 특히 CNC 가공 프로세스가 상대적으로 높은 생산 비용 및 낮은 생산성으로 생산단가가 많이 높은 단점이 있다. 본 연구에서, 새로운 처리 방법을 순서 재료비를 대폭 감소시키고, 제조 속도를 향상시키기 위해 판재성형과 부피성형의 두가지 공정을 섞어 새로운 판단조 공정을 개발하였다. 새로운 판단조 공법(hybrid plate forging)이란 우선 일반적인 딥드로잉으로 중간 모양을 만든 후 원하는 벽 부위만 증육을 하는 방법을 의미한다. 이러한 판단조 공법을 활용하여 재료의 낭비와 제조 시간을 최소화하는 것이 가능하게 된다. 본 연구에서는 상용 유한 요소 프로그램 AFDEX-2D를 통해 판단조공정을 설계하였고 최적의 사용 가능한 소재의 두께와 초기 폭을 설계하였다. 최종적으로 실제 노트북 케이스 금형을 제작하여 제안한 방법의 타당성을 검증하였다.

Electrical Properties of V-I Curve of p-ZnO:Al/n-ZnO:Al Junction Fabricate by RF Magnetron Sputtering

  • Jin, Hu-Jie;So, Soon-Jin;Song, Min-Jong;Park, Choon-Bae
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.408-409
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    • 2007
  • Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ by RF magnetron sputtering. Target was ZnO ceramic mixed with 2wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}\;to\;4.04{\times}10^{18}cm^{-3}$, mobilities from 0.194 to $2.3cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4{\Omega}cm$. P-type sample has density of $5.40cm^{-3}$ which is smaller than theoretically calculated value of $5.67cm^{-3}$. XPS spectra show that O1s has O-O and Zn-O structures and A12p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

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PLD 방법에 의해서 증착된 ZnO 박막의 전기적 특성 및 접합 특성에 관한 연구 (Electrical Characterization and Metal Contacts of ZnO Thin Films Grown by the PLD Method)

  • 강수창;신무환
    • 한국전기전자재료학회논문지
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    • 제15권1호
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    • pp.15-23
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    • 2002
  • In this study, metal/ZnO contacts were thermally annealed at different temperatures (as-dep., 400$^{\circ}C$, 600$^{\circ}C$, 800$^{\circ}C$, 1000$^{\circ}C$) for the investigation of electrical properties, and surface and interface characteristics. The analysis of the element composition and the chemical bonding state of the surface was made by the XPS(X-ray photoelectron spectroscopy). An attempt was made to establish the electrical property-microstructure relationship for the (Ti, Au)/ZnO. The Ti/ZnO contact exhibits an ohmic characteristics with a relatively high contact resistance of 4.74${\times}$10$\^$-1/ $\Omega$$\textrm{cm}^2$ after an annealing at 400$^{\circ}C$. The contact showed a schottky characteristics when the samples were annealed at higher temperature than 400$^{\circ}C$. The transition from the ohmic to schottky characteristics was contributed from the formation of the oxide layers as was confirmed by the peaks for O-O and Ti-O bondings in XPS analysis. For the Au/ZnO contact the lowest contact resistance was obtained from the as-deposited sample. The resistance was slowly increased with annealing temperature up to 600$^{\circ}C$. The ohmic characteristics were maintained eden fort 600$^{\circ}C$ annealing. The XPS analysis showed that the Au-O intensity was dramatically decreased with temperature above 600$^{\circ}C$.

Submicron-scale Polymeric Patterns for Tribological Application in MEMS/NEMS

  • Singh R. Arvind;Yoon Eui-Sung;Kim Hong Joon;Kong Hosung;Jeong Hoon Eui;Suh Kahp Y.
    • KSTLE International Journal
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    • 제6권2호
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    • pp.33-38
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    • 2005
  • Submicron-scale patterns made of polymethyl methacrylate (PMMA) were fabricated on silicon-wafer using a capillarity-directed soft lithographic technique. Polyurethane acrylate (PUA) stamps (Master molds) were used to fabricate the patterns. Patterns with three different aspect ratios were fabricated by varying the holding time. The patterns fabricated were the negative replica of the master mold. The patterns so obtained were investigated for their adhesion and friction properties at nano-scale using AFM. Friction tests were conducted in the range of 0-80 nN. Glass (Borosilicate) balls of diameter 1.25 mm mounted on cantilever (Contact Mode type NPS) were used as tips. Further, micro-friction tests were performed using a ball-on-flat type micro-tribe tester, under reciprocating motion, using a soda lime ball (1 mm diameter) under a normal load of 3,000 mN. All experiments were conducted at ambient temperature ($24{\pm}1^{\circ}C$) and relative humidity ($45{\pm}5\%$). Results showed that the patterned samples exhibited superior tribological properties when compared to the silicon wafer and non-patterned sample (PMMA thin film) both at the nano and micro-scales, owing to their increased hydrophobicity and reduced real area of contact. In the case of patterns it was observed that their morphology (shape factor and size factor) was decisive in defining the real area of contact.

Effect of Hydrophobic Coating on Silica for Adsorption and Desorption of Chemical Warfare Agent Simulants Under Humid Condition

  • Park, Eun Ji;Cho, Youn Kyoung;Kim, Dae Han;Jeong, Myung-Geun;Kim, Young Dok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.148.2-148.2
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    • 2013
  • We prepared hydrophobic PDMS-coated porous silica as pre-concentration adsorbent for chemical warfare agents (CWAs). Since CWAs can be harmful to human even with a small amount, detecting low-concentration CWAs has been attracting attention in defense development. Porous silica is one of the promising candidates for CWAs pre-concentration adsorbent since it is thermally stable and its surface area is sufficiently high. A drawback of silica is that adsorption of CWAs can be significantly reduced due to competitive adsorption with water molecule in air since silica is quite hydrophilic. In order to solve this problem, hydrophobic polydimethylsiloxane (PDMS) thin film was deposited on silica. Adsorption and desorption of chemical warfare agent (CWA) simulants (Dimethylmethylphosphonate, DMMP and Dipropylene Glycol Methyl Ether, DPGEM) on bare and PDMS-coated silica were studied using temperature programed desorption (TPD) with and without co-exposing of water vapor. Without exposure of water vapor, desorbed amount of DMMP from PDMS-coated silica was twice larger than that from bare silica. When the samples were exposed to DMMP and water vapor at the same time, no DMMP was desorbed from bare silica due to competitive adsorption with water. On the other hand, desorbed DMMP was detected from PDMS-coated silica with reduced amount compared to that from the sample without water vapor exposure. Adsorption and desorption of DPGME with and without water vapor exposing was also investigated. In case of bare silica, all the adsorbed DPGME was decomposed during the heating process whereas molecular DPGME was observed on PDMS-coated silica. In summary, we showed that hydrophobic PDMS-coating can enhance the adsorption selectivity toward DMMP under humid condition and PDMS-coating also can have positive effect on molecular desorption of DPGME. Therefore we propose PDMS-coated silica could be an adequate adsorbent for CWAs pre-concentration under practical condition.

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DC Magnetron 반응성 스퍼터링 방법을 이용한 stoichiometric $\textrm{Ta}_2\textrm{O}_5$막의 증착조건에 관한 연구 (A Study on the Deposition Condition for Stoichimetric $\textrm{Ta}_2\textrm{O}_5$ Thin Films by DC Magnetron Reactive Sputtering Technique)

  • 조성동;백경욱
    • 한국재료학회지
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    • 제9권6호
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    • pp.551-555
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    • 1999
  • The deposition condition to obtain stoichiometric $Ta_2$O\ulcorner films, which is still controversial, using magnetron reactive sputtering was studied. The films were deposited by varying $O_2$gas flow rate with sputtering power and Ar gas flow rate of 200W and 60 sccm fixed. At the conditions of $O_2$ gas flow rate over 20 sccm, amorphous Tantalum oxide films with the refractive index of 2.1 and dielectric constant of 25 were deposited. Among those films, the capacitors dielectric properties of the film deposited at the condition of $O_2$ gas flow rate 50 sccm was best, the leakage current was 1$\times$10\ulcornerA/$\textrm{cm}^2$ at the electric field strength of 0.5 MC/cm and the breakdown field strength was over 2.0 MV/cm. This result could be explained from the analysis comparing with a standard sample using RBS because the composition of the film deposited at this condition was closest to the stoichiometric $Ta_2$O\ulcorner. The result of XPS analysis convinced that this film was stoichiometric $Ta_2$O\ulcorner film. A maximum cathode voltage was observed when $O_2$gas flow rate was 30 sccm. This shows that the Schiller's proposition that one can obtain stoichiometric films at the condition of maximum cathode voltage is not correct and more oxygen than that of the maximum voltage condition is necessary to deposit the stoichiometric Ta$_2$O\ulcorner films.

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