• 제목/요약/키워드: thick coating

검색결과 323건 처리시간 0.031초

$NbC_xC_{1-x}/Y_2O_3$ 박막코팅을 이용한 $Al_2O_3/Ti$ 계면특성향상 - (1) 스퍼터링 및 열안정성 (Enhanced $Al_2O_3/Ti$ Interfacial Properties Using $NbC_xC_{1-x}/Y_2O_3$ Interlayers - (1) Sputtering and Thermal Stability)

  • 문철희
    • 한국세라믹학회지
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    • 제34권8호
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    • pp.908-913
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    • 1997
  • Multilayer NbCxC1-x/Y2O3/Ti were sputter-coated on the alumina substrate, starting with a 0.7 ㎛ thick NbCxC1-x layer grown on substrate, followed by 0.7 ㎛ thick Y2O3 layer and 1 ㎛ thick Ti layer. To find out the optimum conditions for thickness uniformity and adhesion, sputtering works have been done with the variation of sputtering power and Ar pressure. After vacuum annealing at 950℃ and 1000℃, the thermal stability of the NbCxC1-x/Y2O3/Ti coated alumina substrates has been investigated by peel off test. The coating scheme didn't cause any debonded layer after an annealing at 950℃ for 3hrs. However, it was peeled off after annealing at 1000℃ for 3hr. It was found that the thermal stability of Al2O3/NbCxC1-x/Y2O3/Ti coating scheme changed with the NbCxC1-x composition.

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에어로졸 데포지션 법을 이용하여 제조한 SiO2 후막의 구조 및 광학 특성 (Structural and Optical Properties of SiO2 Thick Films by Aerosol Deposition Process)

  • 장찬익;고중혁
    • 한국전기전자재료학회논문지
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    • 제26권1호
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    • pp.6-12
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    • 2013
  • Aerosol deposition(AD) coating that enable fabricate films at low temperature have begun to be widely researched for the integration of ceramics as well to realize high-speed deposition rates. For application of ceramic thick film by AD to display and electronic ceramic industry, fabrication of dense structure with a no cracking is required. In this study, to fabricate dense ceramic thick film, the effect of crystal phase of starting powder was investigated. For this study, amorphous and crystalline $SiO_2$ powders were used as starting powders. Two types of $SiO_2$ powders were deposited on glass substrate by AD. In the case of amorphous $SiO_2$ powder, the deposited films had extremely incompact and opaque layer, irrespective of particle size. In contrast to amorphous powder, in the case of crystalline powder, porous structure layer and dense microstructure with no cracking layer were fabricated depending on the particle size. The optimized starting powder size for dense coating layer was $1{\sim}2{\mu}m$. The transmittance of film reached a maximum of 76% at 800 nm.

표면피복종류에 따른 복합열화환경하의 철근콘크리트 부식특성에 관한 실험적 연구 (An experimental study on corrosion properties of reinforcing steel under environment of complex deterioration)

  • 조봉석;김영덕;윤종기;김재환;김용로;김무한
    • 한국콘크리트학회:학술대회논문집
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    • 한국콘크리트학회 2003년도 가을 학술발표회 논문집
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    • pp.86-89
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    • 2003
  • It is recognized that reinforcement corrosion is the main distress behind the present concern regarding concrete durability. In this study, to confirm corrosion of reinforced concrete affected by thickness of cover, kinds of surface coating, measured electric potential, ratio of corrosion area, weight reduction, corrosion velocity of steel bar under environment of complex deterioration. The results showed that an increase in age also increases corrosion of steel bar. Ratio of corrosion area is largely related to ratio of weight reduction. as well, corrosion of steel bar by thickness of cover is superior to l0mm thick than 20mm thick. It showed that an increase in thickness of cover prevent steel bar from deteriorating. The results of this study showed that corrosion velocity was affected by thickness of cover, kinds of surface coating. data on the development of corrosion velocity made with none, organic B, organic A, inorganic B, and inorganic A is shown.

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Adhesive bonding using thick polymer film of SU-8 photoresist for wafer level package

  • Na, Kyoung-Hwan;Kim, Ill-Hwan;Lee, Eun-Sung;Kim, Hyeon-Cheol;Chun, Kuk-Jin
    • 센서학회지
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    • 제16권5호
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    • pp.325-330
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    • 2007
  • For the application to optic devices, wafer level package including spacer with particular thickness according to optical design could be required. In these cases, the uniformity of spacer thickness is important for bonding strength and optical performance. Packaging process has to be performed at low temperature in order to prevent damage to devices fabricated before packaging. And if photosensitive material is used as spacer layer, size and shape of pattern and thickness of spacer can be easily controlled. This paper presents polymer bonding using thick, uniform and patterned spacing layer of SU-8 2100 photoresist for wafer level package. SU-8, negative photoresist, can be coated uniformly by spin coater and it is cured at $95^{\circ}C$ and bonded well near the temperature. It can be bonded to silicon well, patterned with high aspect ratio and easy to form thick layer due to its high viscosity. It is also mechanically strong, chemically resistive and thermally stable. But adhesion of SU-8 to glass is poor, and in the case of forming thick layer, SU-8 layer leans from the perpendicular due to imbalance to gravity. To solve leaning problem, the wafer rotating system was introduced. Imbalance to gravity of thick layer was cancelled out through rotating wafer during curing time. And depositing additional layer of gold onto glass could improve adhesion strength of SU-8 to glass. Conclusively, we established the coating condition for forming patterned SU-8 layer with $400{\mu}m$ of thickness and 3.25 % of uniformity through single coating. Also we improved tensile strength from hundreds kPa to maximum 9.43 MPa through depositing gold layer onto glass substrate.

고온 전자빔 증착에 의한 Ethylene Terephthalate상의 SiOx 박막의 특성 평가 (Characteristics of Defects in SiOx Thin films on Ethylene Terephthalate by High-temperature E-beam Deposition)

  • 한진우;김영환;김종환;서대식;문대규
    • 한국전기전자재료학회논문지
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    • 제19권1호
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    • pp.71-74
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    • 2006
  • In this paper, we investigated the characterization of silicon oxide(SiOx) thin film on Ethylene Terephthalate(PET) substrates by e-beam deposition for transparent barrier application. The temperature of chamber increases from $30^{\circ}C$ to $110^{\circ}C$, the roughness increase while the Water vapor transmission rate (WVTR) decreases. Under these conditions, the WVTR for PET can be reduced from a level of $0.57 g/m^2/day$ (bare subtrate) to $0.05 g/m^2/day$ after application of a 200-nm-thick $SiO_2$ coating at 110 C. A more efficient way to improve permeation of PET was carried out by using a double side coating of a 5-${\mu}m$-thick parylene film. It was found that the WVTR can be reduced to a level of $-0.2 g/m^2/day$. The double side parylene coating on PET could contribute to the lower stress of oxide film, which greatly improves the WVTR data. These results indicates that the $SiO_2$ /Parylene/PET barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

Ni-18%W 코팅의 고온산화막 분석 (Characterization of High Temperature Oxide Scales formed on Ni-18%W Coatings)

  • 고재황;이동복
    • 한국재료학회지
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    • 제14권4호
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    • pp.281-286
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    • 2004
  • The oxide scales formed on Ni-18W(at.%) coating that was electrodeposited on steel were investigated using XRD, SEM and TEM. The oxide scales consisted mainly of an outer NiO layer, and an inner thick ($NiWO_4$+NiO) mixed layer. The unoxidized coating below the oxide scale was rich in Ni and depleted in W, owing to the consumption of Wand the resultant Ni enrichment. The oxidation resistance of Ni-18W coating was poorer than that of the TiN coating, due to the formation of nonprotective NiWO$_4$. During oxidation, Ni and the substrate element of Fe diffused outward, while oxygen inward, according to the concentration gradients.

S45C 모계에 대한 STS304 마찰 육성층 평가 (The Evaluation of STS304 Coating Layer on S45C Substrate by friction Surfacing Process.)

  • 노중석;조현진;김흥주;천창근;장웅성
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2005년도 춘계학술발표대회 개요집
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    • pp.229-231
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    • 2005
  • Friction surfacing of STS304 consumable rod on S45C substrate was investigated by microstructural observation and mechanical tests. STS304 layer formed a strongly-bonded thick layer under a wide range of surfacing conditions. The hardness distribution showed the peak value in the boundry layer, while the highest coating efficiency obtained in the condition of 1000rpm-2.5mm/sec-2.5mm/sec. As the consumable rotation rate and the traveling rate increased, the coating efficiency tended to decrease. On the other hand, as the feeding rate increased, the coating efficiency appeared to be increased.

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Sol-Gel 법으로 제조된 후막 PZT의 두께, 전극형상 및 분극 공정에 따른 $e_{31,f}$ 특성 (Transverse Piezoelectric Coefficient ($e_{31,f}$) of Thick PZT films Fabricated by Sol-Gel Method with Thicknesses, Electrode Shapes and Poling Process)

  • 박준식;양성준;박광범;윤대원;박효덕;김승현;강성군;최태훈;이낙규;나경환
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1326-1331
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    • 2003
  • Thick PZT films are required for the cases of micro actuators and sensors with high driving force, high breakdown voltage and high sensitivity, and so on. In this work, thick PZT films were fabricated by Sol-Gel multi-coating method. Total 8 types of samples using thick PZT films with thicknesses, about $1{\mu}m$ and $2{\mu}m$, and Pt top electrodes shapes for measuring transverse piezoelectric coefficient ($e_{31,f}$) were fabricated using MEMS processes. They were characterized by fabricated e31,f measurement system before and after poling. $e_{31,f}$ values of samples after poling were higher than before poling. Those of $2{\mu}m$ thick PZT films were also higher than $1{\mu}m$ thick PZT films. And those with long electrodes as top electrodes were also higher than shorter.

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Negative Thick Photoresist를 이용한 $100{\mu}m$ 높이의 금속 구조물의 제작에 관한 연구 (Fabrication of $100{\mu}m$ High Metallic Structure Using Negative Thick Photoresist and Electroplating)

  • 장현기;김용권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 G
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    • pp.2541-2543
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    • 1998
  • This paper describes the fabrication process to fabricate metallic structure of high aspect ratio using LlGA-like process. SU-8 is used as an electroplating mold. SU-8 is an epoxy-based photoresist, designed for ultrathick PR structure with single layer coating [1,2]. We can get more than $100{\mu}m$ thick layer by single coating with conventional spin coater, and applying multiple coating can make thicker layers. In the experiments, we used different kinds of SU-8, having different viscosity. To optimize the conditions for mold fabrication process, experiments are performed varying spinning time and speed, soft-bake, develop and PEB (Post Expose Bake) condition. With the optimized condition, minimum line and space of $3{\mu}m$ pattern with a thickness of $40{\mu}m$ and $4{\mu}m$ pattern with a thickness of $130{\mu}m$ were obtained. Using the patterned PR as a plating mold, metallic structure was fabricated by electroplating. We have fabricated a electroplated nickel comb actuator using SU-8 as plating mold. The thickness of PR mold is $45{\mu}m$ and that of plated nickel is$40{\mu}m$. Minimum line of the mold is $5{\mu}m$. Patterned metallic layer or polymer layer, which has selectivity with the structural plated metallic layer, can be used as sacrificial layer for fabrication of free-standing structure.

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Aerosol Deposition Method에 의한 수동소자와 능동소자의 동시 직접화를 위한 다양한 유전체 후막 (Various Dielectric Thick Films for Co-Integration of Passive and Active Devices by Aerosol Deposition Method)

  • 남송민
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.348-348
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    • 2008
  • In recent, the concept of system-on-package (SOP) for highly integrated multifunctional systems has been paid attention to for the miniaturization and high frequency of electronic devices. In order to realize SOP, co-integration of passive devices, such as capacitors, resistors and inductors, and active devices should be achieved. If ceramic thick films can be grown at room temperature, we expect to be able to overcome many problems in conventional fabrication processes. So, we focused on the aerosol deposition method (ADM) as room temperature fabrication technology. ADM is a novel ceramic coating method based on the Room Temperature Impact Consolidation (RTIC) phenomena. This method has a wide range potential for fabrication of co-integration of passive and active devices. In this paper, I will present the future potential of ADM introducing various ceramic dielectric thick films for the integration of electronic ceramics.

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