• Applied Microscopy
• /
• v.33 no.1
• /
• pp.49-58
• /
• 2003

The ${\alpha}-{\beta}$ phase transition of titanium was investigated through in-situ EF-TEM heating experiments. Three different areas of a titanium foil were observed to minimize statistical errors. Systematic recording of diffraction patterns and images was carried out from $RT{\rightarrow}600^{\circ}C{\rightarrow}900^{\circ}C{\rightarrow}RT$ on each area. The following results were obtained: (1) Transition of titanium takes place very rapidly at $900^{\circ}C$. Two phases of titanium, ${\alpha}\;and\;{\beta}$, coexist at this temperature. (2) The transited ${\beta}$-phase appears in the form of twinned plates which are arranged in rotation relationship one another. (3) Analyses of electron diffraction patterns and EDS data indicate that the thermal oxidation layer is gradually formed on the surface of titanium above $900^{\circ}C$, which hinders the reversible ${\beta}{\rightarrow}{\alpha}$ phase transition upon cooling.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1998.11a
• /
• pp.38-38
• /
• 1998

• Proceedings of the Korean Magnestics Society Conference
• /
• 2016.11a
• /
• pp.203-203
• /
• 2016

• Journal of the Korean Vacuum Society
• /
• v.8 no.3B
• /
• pp.269-275
• /
• 1999

The phase transition on the surface which several adsorbates (K, Mg, etc.) are deposited was observed by Low Energy Electron Diffraction (LEED) and Reflection High Energy Electron Diffraction (RGEED). We took the photoelectron spectra from the valence and core level at several oxygen exposure. For oxygen adsorption, the surface state in valence spectra diminished concurrently with S1, S2 peaks in core level spectra and surface periodicity turned to 3$\times$2 by post-annealing. These results suggest that the phase transition from 3$\times$2 to 3$\times$ on the Si(113) at initial stage is induced by a rearrangement of atoms on the substrate, not by the formation of overlayer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2000.05b
• /
• pp.323-326
• /
• 2000

In this study, we used Brewster-Angle Microscope(BAM) to study on the molecular orientation of monolayer on the water surface. The behaviors of molecules on three different subphase have been observed. Reproducible $\pi$-A isotherm have been obtained only on information about phase transition by molecular area. BAM facilitates the observation of morphology by optical anisotropy and thickness in monolayer and multilayers as BAM is shown to be sensitive to anisotropy of film. Every transition was found by BAM technique, either as a dramatic change in degree of contrast or as a sudden alteration of molecular action and $\pi$-A isotherm.

• Korean Journal of Materials Research
• /
• v.14 no.10
• /
• pp.683-687
• /
• 2004

The BON thin films were grown on the Si substrate by the RF-PECVD method. When stored at the room temperature, the phase separation or transition of BON thin films occurred on the surface, due to the hydrophilic property of BON. The oxidation of BON thin films occurred mainly by the evaporation of B, O and N. The oxidized BON thin films consisted of an amorphous phase and a bit of the polycrystalline phase.

• Journal of the Korean Ceramic Society
• /
• v.28 no.1
• /
• pp.29-36
• /
• 1991

Microporous glasses in the system TiO2-SiO2-Al2O3-B2O3-CaO-Na2O were prepared by the phase-separation technique. Morphology and distribution of pore and specific surface area of glasses heated and leached out at various conditions were investigated by SEM and Porosimeter. Crystallization of glasses heated above transition temperature was also inspected by X-ray diffraction method. When the heating temperature and time increased, the pore size and volume increased, but the specific surface area decreased above the critical temperature. The phase-separation, specific surface area and pore size showed more sensitive change on the variation of heating temperature than of heating time. The specific surface area and micropore volume of porous glasses prepared in this study were about 120-330$m^2$/g and 0.001-0.01cc/g, respectively. Mean pore size of porous glasses were about 20-90$\AA$. Anatase phases was deposited when the parent glass was heat-treated at 75$0^{\circ}C$ for 6hrs.

• Korean Journal of Materials Research
• /
• v.1 no.2
• /
• pp.93-98
• /
• 1991

The as-grown $YBa_2Cu_3O_{7-x}$ superconducting thin films on MgO(100) substrate have been prepared by a reactive coevaporation method. The superconducting transition temperature, surface morphology and crystalline quality were examined as a function of the substrate temperature ranging from $450^{\circ}C$ to $590^{\circ}C$. From the reflection high energy electron diffraction (RHEED) analysis, it was found the film consisted of almost amorphous phase with a halo pattern deposited at the substrate temperature of $450^{\circ}C$. The film deposited at the substrate temperature of $510^{\circ}C$ consisted of polycrystalline phase, showing a broad ring pattern. On the other hand, for the film deposited at $590^{\circ}C$, RHEED showed spotty pattern indicating that this film consisted of single crystal phase. It has rough film surface due to the surface outgrowth. The surface outgrowth increased as the substrate temperature increased from $510^{\circ}C$ to $590^{\circ}C$. the surface outgrowth may be due to the anisotropic growth rate. The highest transition temperature obtained in this study was $Tc_{zero}$ of 83K with $Tc_{onset}$ of 88K for the film deposited at $590^{\circ}C$ using activated RF oxygen plasma.

• Korean Journal of Materials Research
• /
• v.4 no.1
• /
• pp.107-112
• /
• 1994

The phase transition and the surface and interface morphologies of $TiSi_2$ formed on atomically clean Si substrates are investigated. 200$\AA$ Ti and 400$\AA$ Si films on Si(ll1) have been codeposited at elevated temperatures (400~$800^{\circ}C$) in ultrahigh vacuum. The phase transition of TiSiL is characterized with using XRD. The results distinguish the formation of the C49 and C54 crystalline titanium silicides. The surface and interface morphologies of titanium silicides have been examined with SEM and TEM. A relatively smootb surface is observed for the C49 phase while a rough surface and interface are observed for C54 phase. The islanding of the C54 phase becomes severe at high temperature ($800^{\circ}C$). Islands of TiSiL have been observed at temperatures above $700^{\circ}C$ but no islands are observed at temperatures below $600^{\circ}C$. For films deposited at $400^{\circ}C$ and 500%. weak XRD peaks corresponding to TiSi were observed and TEM micrographs exhibited small crystalline regions of titanium silicide at the interface.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2014.11a
• /
• pp.47-51
• /
• 2014

In this work, a possible mechanism for grain evolution in Al-Mg alloy films during thermal annealing is suggested on the basis of the phase transition and the related residual stress. Al-Mg alloy films with compositions of 14.0 and 18.0 wt% Mg content were deposited on cold-rolled steel substrates by the direct current co-sputtering method using Al and Mg targets. After the deposition, the samples were thermally annealed at $400^{\circ}C$ for 10 min. The featureless, dense cross-sectional microstructure of the as-deposited films turned into a grainy microstructure after the thermal annealing. According to the residual stress evaluated by using the $XRD-sin2{\psi}$ technique and the phase analysis by XRD, it is likely that grains were created in order to relieve the additional accumulation of residual stress originating from the phase transition from face-centered cubic Al (${\alpha}$) to Al3Mg2 (${\beta}$) and Mg (${\delta}$) phases, suggesting interplay between the microstructure and residual stress.