• Journal of the Korean Society for Heat Treatment
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• v.25 no.1
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• pp.6-13
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• 2012

HVOF thermal spray coating of 80%WC-CoFe powder is one of the most promising candidate for the replacement of the traditional hard chrome plating and hard ceramics coating because of the environmental problem of the very toxic $Cr^{6+}$ known as carcinogen by chrome plating and the brittleness of ceramics coatings. 80%WC-CoFe powder was coated by HVOF thermal spraying for the study of durability improvement of the high speed spindle such as air bearing spindle. The coating procedure was designed by the Taguchi program, including 4 parameters of hydrogen and oxygen flow rates, powder feed rate and spray distance. The surface properties of the 80%WC-CoFe powder coating were investigated roughness, hardness and porosity. The optimal condition for thermal spray has been ensured by the relationship between the spary parameters and the hardness of the coatings. The optimal coating process obtained by Taguchi program is the process of oxygen flow rate 34 FRM, hydrogen flow rate 57 FRM, powder feed rate 35 g/min and spray distance 8 inch. The coating cross-sectional structure was observed scanning electron microscope before chemical etching. Estimation of coating porosity was performed using metallugical image analysis. The Friction and wear behaviors of HVOF WC-CoFe coating prepared by OCP are investigated by reciprocating sliding wear test at $25^{\circ}C$ and $450^{\circ}C$. Friction coefficients (FC) of coating decreases as sliding surface temperature increases from $25^{\circ}C$ to $450^{\circ}C$.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.157-157
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• 2016

최근 많은 산업의 발전으로 인해 환경오염을 유발시키는 폐수가 다량으로 배출되고 있으며, 이러한 폐수 속에는 유기용매, 고분자 물질 및 각종 염 등의 난분해성 물질들이 다량으로 함유되어 있다. 이런 물질들을 분해시키기 위해 물리적, 생물학적 수처리 방법이 많이 이용되고 있지만 이 방법들은 각각 운전비용과 처리비용이 고가인 단점이 있다. 따라서 비용과 효율 측면에서 효과적인 폐수처리를 위해서 전기화학적 폐수처리 방법이 많이 사용되고 있다. 물리적, 생물학적 처리 방법에 비해 비용이 적게 들고, 처리 후 잔류물이 남지 않으며. 독성을 띄는 산화제의 첨가 없이도 높은 폐수처리 능력을 보이기 때문에 친환경적이므로, 전기화학적 폐수산화 처리에 사용되는 불용성 전극에 대한 연구가 많이 진행되어져 오고 있다. 그 중 BDD(Boron-doped diamond) 전극은 표면에서 강력한 산화제인 수산화 라디칼의 높은 발생량으로 인해 뛰어난 폐수처리 능력을 보이므로 불용성 전극 분야에서 활발한 연구가 진행 중이다. 그러나 기존에 BDD 전극의 기판 모재로 이용되던 Si, W, Pb등은 모두 기계적 강도. 폐수처리 능력 및 독성 문제로 인해 한계가 있었고, 특히 Nb기판 위에 형성시킨 BDD 전극은 뛰어난 폐수처리 능력에도 불구하고 비싼 모재 원가로 인해 상용화가 힘든 실정이다. 이런 문제점을 해결하기 위해 높은 기계적 강도와 전기화학적 안정성을 가진 Ti 기판을 사용한 BDD 전극에 대한 연구가 보고되고 있다. 그러나 BDD와 Ti 간의 lattice mismatch, BDD층 형성을 위한 고온 공정 시 탄소의 확산으로 인한 기판 표면에서의 TiC층 형성으로 인해 접착력이 감소하여 박리가 생기는 문제점이 있다. BDD와 Ti의 접착력을 향상시키기 위해 융점이 높고, 전기전도성이 우수한 TiN을 diffusion barrier layer로 삽입하면 탄소 확산에 의한 TiC층의 생성을 억제하여, 내부응력에 기인한 접착력 감소를 방지할 수 있다. 또 하나의 방법으로 Ti 기판의 전처리를 통해 BDD층의 접착력을 향상 시킬 수 있다. Sanding과 etching을 통해 기판 표면의 물리, 화학적인 표면조도를 부여하고, seeding을 통해 diamond 결정 성장에 도움을 주는 seed 입자를 분포시킴으로써, 중간층과 BDD층의 접착력을 향상시키고, BDD 결정핵 성장을 촉진시켜 고품질의 BDD박막 증착이 가능하다. 본 연구에서는 기존 Si, Nb 등의 기판 모재를 Ti로 대체함으로써 제조원가를 절감시키고, TiN 중간층을 삽입하여 접착력을 향상시킴으로써 기존의 BDD 전극과 동등한 수준의 물성 및 수처리 특성을 가진 BDD전극 제작을 목표로 하였다. $25{\times}25mm$의 Ti 기판위에 TiN 중간층을 DC magnetron sputtering을 이용하여 증착 후, BDD 전극 층을 HFCVD로 증착하였다. 전처리를 진행한 기판과 중간층 및 BDD층의 미세구조를 XRD로 분석하였고, 표면 형상을 SEM으로 확인하였다. BDD전극의 접착력 분석을 통해 TiN 중간층의 최적 조성을 도출하고, 최종적으로 BDD/TiN/Ti 전극의 CV특성과 가폐수의 COD분해능력 및 축산폐수, 선박평형수 등의 실제 폐수 처리 능력을 BDD/Si, BDD/Nb 전극과 비교 검토할 것이다.

• Composites Research
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• v.13 no.4
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• pp.42-53
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• 2000

A study has been made to establish an optimum condition in the surface treatment and curing method that is important for the fabrication of Al 7075/CFRP laminates. PAA(Phosphoric Acid Anodizing) provided a good adhesive strength and FPL(Sulfuric / Sodium Dichromate Acid Etching) had a similar adhesive strength with PAA. On the other hand, the poor adhesive strength was shown on vapor degrease and CAA(Chromic Acid Anodizing). By using the atomic force microscope(AFM), it was found that the PAA oxide surface obviously had a greater degree of microroughness as compared to vapor degrease, CAA and FPL treated surfaces. These results support the concept of a mechanical interlocking of the adhesive with-in the oxide pores as the predominant adhesion mechanism. In curing methods, the adhesive strength of co-curing method was higher than that of secondary curing method. With respect to stability of specimen shape, the secondary curing method was better than co-curing method. DMA(Dynamic Mechanical Analysis) test revealed $T_g$ in curing times over 60 min is nearly same, so it is estimated they will have similar degree of curing and joint durability in using FM300M adhesive film.

• Economic and Environmental Geology
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• v.42 no.5
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• pp.479-486
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• 2009

In natural environments, manganese (Mn) exists in the valence of +2, +3, and +4 and plays a pivotal role as a strong oxidant or reductant in the geochemical cycles of elements. Especially, Mn forms varying (oxyhydr)oxides. The oxidation state of structural Mn is characteristic to each oxide and is one of the most important factors controlling its geochemical behaviors such as solubility, sorption capacity, and redox potential. Therefore, it is important to elucidate processes governing Mn oxidation state in predicting the fate and transport of many redox sensitive elements in the environment. X-ray photoelectron spectroscopy (XPS) is a very useful method to determine the oxidation state of various elements in solid phases. In this study, the oxidation states of structural Mn in MnO, $Mn_2O_3$, $MnO_2$ were assessed based on the binding energy spectra of $Mn2p_{3/2}$ and Mn3s using XPS and were compared with those reported elsewhere. $Mn2p_{3/2}$ binding energies were determined as 640.9, 641.5, 641.8 eV for MnO, $Mn_2O_3$, $MnO_2$, respectively, which indicates that the binding energy increased with increasing Mn oxidation state. It was also noted that Ar etching may cause changes in electronic structure configuration on surface of the original sample.

• Restorative Dentistry and Endodontics
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• v.34 no.3
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• pp.184-191
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• 2009

The purpose of this study was to evaluate the physical properties of different self-adhesive resin cements and their shear bond strength on dentin and lithium disilicate ceramic and compare these result with that of conventional resin cement. For this study, four self-adhesive resin cements (Rely-X Unicem, Embrace Wetbond, Mexcem, BisCem), one conventional resin cement (Rely-X ARC) and one restorative resin composite (Z-350) were used. In order to evaluate the physical properties, compressive strength, diametral tensile strength and flexural strength were measured. To evaluate the shear bond strength on dentin, each cement was adhered to buccal dentinal surface of extracted human lower molars. Dentin bonding agent was applied after acid etching for groups of Rely-X ARC and Z-350. In order to evaluate the shear bond strength on ceramic, lithium disilicate glass ceramic (IPS Empress 2) disks were prepared. Only Rely-X ARC and Z-350 groups were pretreated with hydrofluoric acid and silane. And then each resin cement was adhered to ceramic surface in 2 mm diameter. Physical properties and shear bond strengths were measured using a universal testing machine. Results were as follows 1. BisCem showed the lowest compressive strength, diametral tensile strength and flexural strength. (P<0.05) 2. Self-adhesive resin cements showed significantly lower shear bond strength on the dentin and lithium disilicate ceramic than Rely-X ARC and Z-350 (P<0.05) In conclusion, self-adhesive resin cements represent the lower physical properties and shear bond strength than a conventional resin cement.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.77-77
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• 2000

Titanium oxide (TiO2) thin films have valuable properties such as a high refractive index, excellent transmittance in the visible and near-IR frequency, and high chemical stability. Therefore it is extensively used in anti-reflection coating, sensor, and photocatalysis as electrical and optical applications. Specially, TiO2 have a high dielectric constant of 180 along the c axis and 90 along the a axis, so it is highlighted in fabricating dielectric capacitors in micro electronic devices. A variety of methods have been used to produce patterned self-assembled monolayers (SAMs), including microcontact printing ($\mu$CP), UV-photolithotgraphy, e-beam lithography, scanned-probe based micro-machining, and atom-lithography. Above all, thin film fabrication on $\mu$CP modified surface is a potentially low-cost, high-throughput method, because it does not require expensive photolithographic equipment, and it produce micrometer scale patterns in thin film materials. The patterned SAMs were used as thin resists, to transfer patterns onto thin films either by chemical etching or by selective deposition. In this study, we deposited TiO2 thin films on Si (1000 substrateds using titanium (IV) isopropoxide ([Ti(O(C3H7)4)] ; TIP as a single molecular precursor at deposition temperature in the range of 300-$700^{\circ}C$ without any carrier and bubbler gas. Crack-free, highly oriented TiO2 polycrystalline thin films with anatase phase and stoichimetric ratio of Ti and O were successfully deposited on Si(100) at temperature as low as 50$0^{\circ}C$. XRD and TED data showed that below 50$0^{\circ}C$, the TiO2 thin films were dominantly grown on Si(100) surfaces in the [211] direction, whereas with increasing the deposition temperature to $700^{\circ}C$, the main films growth direction was changed to be [200]. Two distinct growth behaviors were observed from the Arhenius plots. In addition to deposition of THe TiO2 thin films on Si(100) substrates, patterning of TiO2 thin films was also performed at grown temperature in the range of 300-50$0^{\circ}C$ by MOCVD onto the Si(100) substrates of which surface was modified by organic thin film template. The organic thin film of SAm is obtained by the $\mu$CP method. Alpha-step profile and optical microscope images showed that the boundaries between SAMs areas and selectively deposited TiO2 thin film areas are very definite and sharp. Capacitance - Voltage measurements made on TiO2 films gave a dielectric constant of 29, suggesting a possibility of electronic material applications.

• Restorative Dentistry and Endodontics
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• v.25 no.2
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• pp.170-179
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• 2000

The rh-BMP-4 is a subgroup of TGF-${\beta}$ superfamily. The application of rh-BMP in alveolar bony defect was reported to new alveolar bone and new cementum formation. For minimized complications following tooth replantation, a operator must replant a tooth fast at the pertinent position. This study was to evaluate the effect of rh-BMP-4 on periodontal regeneration and root resorption following tooth replantation in rats. The 50 Sprague-Dawley rats weighting about 130gm were used in this study. The animals were divided into three groups. Group 1 ; immediate replantation after extraction : Group 2 ; replantation stored teeth extraction of first molar, the removal of periodontal ligament with collagenase, and etching with citric acid : Group 3 ; replantation stored teeth with treated rh-BMP-4 in mesial root. Experimental animals were sacrificed 3, 7, 14 days after replantation by heart infusion. The maxillae were removed, fixed, demineralized, dehydrated, infiltrated and embedded with JB-4 mixture. For light microscopic observation, 5 micron sections were cut and stained with toluidine blue. The results of this study were as follows : 1. After experimental 3 days, all groups were observed dead space between periodontum and root. 2. After experimental 7 days, group 1 and group 3 were observed filling periodontal fibers between alveolar bone and root but group 2 were not. 3. After experimental 7 days, group 3 were observed appearance of attached cementoblast like cell on root surface. Group 1 were observed regular arrangement of fibroblasts and collagen fibers at ${\times}400$ observation. 4. After experimental 14 days, all group were observed filling periodontal fibers between alveolar bone and root. Group 1 were observed normal arrangement of periodontal fibers. Group 3 were observed less abnormal arrangement of periodontal fibers. Group 2 were not observed functional normal arrangement of periodontal fibers. 5. After experimental 14 days, group 2 and 3 were observed several root resorption and irregular root surface but group 1 were not. These results suggest that the rh-BMP-4 can stimulate cementogenesis and enhance to attach collagen fibers.

• Applied Chemistry for Engineering
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• v.30 no.2
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• pp.160-166
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• 2019

In this study, oxygen functional groups were introduced on activated carbon fibers (ACFs) by oxygen plasma treatment to improve the adsorption performance on an acetic acid which is a sick house syndrome induced gas. The active species was generated more as the flow rate of the oxygen gas increased during the plasma treatment. For this reason, the specific surface area (SSA) of the ACFs decreased with much more physical and chemical etching. In particular, the SSA of the sample (A-O60) injected with an oxygen gas flow rate of 60 sccm was reduced to about $1.198m^2/g$, which was about 6.95% lower than that of the untreated samples. On the other hand, the oxygen content introduced into the surface of ACFs increased up to 35.87%. Also, the adsorption performance on the acetic acid gas of the oxygen plasma-treated ACFs was improved by up to 43% compared to that of using the untreated ACFs. It is attributed to the formation of the hydrogen bonding due to the dipole moments between acetic acid molecules and oxygen functional groups such as O=C-O introduced by the oxygen plasma treatment.

• Journal of Dental Rehabilitation and Applied Science
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• v.18 no.3
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• pp.157-170
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• 2002

The purpose of this study is to analyze the shear bond strength according to kinds of surface treatment agents and resin cements after acid etching of IPS Empress 2. For this purpose, test groups were classified into silane-treated bonding groups, silica-coated group and Targis link applied group. Then, nine bonding groups in total, each three groups per kind, were prepared by using three kinds of resin cements-Panavia F, Variolink II and Rely-X ARC, and thirty test specimens per group were prepared. To examine any changes in the oral environment, the shear bond strength of each test specimen was measured after dipping test for 24 hours and for five weeks, respectively, in distilled water at $37^{\circ}C$ and performing heat cycle 10,000 times in total, each 2,000 times per week, during a five weeks of dipping, under the condition similar to the oral environment. The bond failure modes were also observed by means of a scanning electron microscope. The results are summarized as follows 1. Statically significant differences between the surface conditioning materials were observed. The shear strength of the silane treatment was the highest of all three types of surface treatments(p<0.001). 2. Shear strengths varied significantly for different types of resin luting agents. But bond strength of Targis link surface treatments were not significantly different(p<0.05). 3. No significant difference of bonding strengths was found between storage time conditions(24 hours and 5 weeks). Only group II, IV, VII, IX were significantly different(p<0.05). 4. After thermocycling, the shear bond strengths of all groups were significantly decreased (p<0.05). Group III, V, VI were no significantly different. 5. On the SEM observation of fractured surfaces, all groups were shown complex failure.

• The korean journal of orthodontics
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• v.25 no.2 s.49
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• pp.223-233
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• 1995

The purpose of this study was to evaluate the effects of surface conditioning with $10\%$ polyacrylic acid, etching with $38\%$ phosphoric acid, and polishing with a slurry of pumice on shear bond strengths of light-cured glass ionomer cement, chemically cured glass ionomer cement, and a composite resin to enamel, and to observe the failure patterns of bracket bondings. Shear bond strengths of glass ionomer cements were compared with that of a composite resin. Metal brackets were bonded on the extracted human bicuspids after enamel surface treatments, and samples were immersed in the $37^{\circ}C$ distilled water bath, and shear bond strengths of glass ionomer cements and a composite resin were measured on the Instron machine after 24hrs passed, and the deboned samples were measured in respect of adhesive remnant index. Scanning electron micrographs were taken of enamel surfaces after various treatments. The data were evaluated and tested by ANOVA and Duncan's multiple range test, and those results were as follows. 1. Shear bond strength of light-cured glass ionomer cement showed statistically higher than that of chemically cured glass ionomer cement. 2. Shear bond strengths of light-cured and chemically cured glass ionomer cements to enamel treated with $10\%$ polyacrylic acid and $38\%$ phosphoric acid showed statistically higher than those with a slurry of pumice. 3. According to scanning electron micrographs, enamel surface conditioned with $10\%$ polyacrylic acid is slightly etched and cleaned, that etched with $38\%$ phosphoric acid is severely etched, and that polished with a slurry of pumice is irregulary scretched and not completely cleaned. 4. After debonding, light-cured glass ionomer cement to enamel treated with $10\%$ polyacrylic acid showed less residual materials on the enamel solace than composite resin to enamel etched with $38\%$ phosphoric acid. 5. There was no significant difference in the shear bond strength of light-cured glass ionomer cement to enamel treated with $10\%$ polyacrylic acid and that of composite resin to enamel etched with $38\%$ Phosphoric acid.