• Title/Summary/Keyword: surface display

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Improvement of Luminance and Luminous Efficacy in Mid-gap AC Plasma Display Panels (중간간격을 갖는 교류형 플라즈마 디스플레이 표시기의 효율향상을 위한 연구)

  • Choi, Nak-Won;Min, Chung-Sik;Jeong, Dong-Cheol;Seo, Jeong-Hyun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.58 no.5
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    • pp.982-988
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    • 2009
  • In a surface type ac PDP having $200{\mu}m$ gap between the surface electrodes, the luminous efficacy has a reciprocal dependence on the sustaining frequency. The discharge current flowing to the address electrodes are measured to investigate the phenomena and spectral intensity from visible light to infra red is measured to verify phosphor saturation with the frequency. Experiments show the discharge between the address and surface electrodes deteriorates the efficacy in high sustaining frequencies. Pulse width modulation is introduced to improve the efficacy. In optimum conditions, we obtained 1.99lm/w and 1.79lm/w at 200kHz and 250kHz, respectively.

Numerical modeling of defects nucleation in the liquid crystal devices with inhomogeneous surface (액정 디스플레이 소자 내에서의 불균일한 표면에 의한 결점의 발생과 모델링)

  • Lee Gi-dong;Kang Bongsoon
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.9 no.8
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    • pp.1793-1798
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    • 2005
  • We model the nucleation and motion of defects in the liquid crystal display device with inhomogeneous surface by using fast Q-tensor method, which can calculate scalar order parameter S and nucleation of the defect in the liquid crystal director field. In order to model the defect, homeotropic aligned liquid crystal cell with step inhomogeneous electrode which has a height of $1{\mu}m$ is used. From the simulation, we can observe the nucleation and line of the defect from surface inhomogeneity and the experiment is performed for confirmation.

A Study on Rubbing-induced Molecular Alignment on an Orientation Layer of Polyimide for Liquid Crystal Display (LCD의 폴리이미드 배향막에서 Rubbing에 의한 분자배향에 관한 연구)

  • 최승우;정재원;김승빈;황상만;천희곤;조동율
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.4
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    • pp.306-313
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    • 1998
  • To elucidate the liquid crystal(LC) molecules alignment mechanism, it is important to determine the molecular orientation of the rubbed polymer surface molecules that directly contact with LC molecules. In this work, the molecular orientation on a rubbed surface of polyimide (SE-3310, Nissan) film has been studied by polarized FTIR absorption spectroscopy. It has been found that molecular chain on the rubbed surface of polymide film are oriented along the rubbing direction and are tilted up on an average by 5.0$^{\circ}$. In the SHG(Second Harmonic Generation) measurement, the pretilt angle of molecular chain on the poylmide fim was 4.6$^{\circ}$ fro, the surface plane. And the pedit angle of liquid crystal (ZLI-2293, Merck) molecules measured by crystal rotation method was 5.4$^{\circ}$in the same rubbing condition.

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Characteristic of ITO thin film with plasma surface treatment (플라즈마 표면 처리에 의한 ITO 박막 제작 특성)

  • Kim, Sang-Mo;Son, In-Hwan;Park, Sang-Joon;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.404-405
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    • 2007
  • Tin-doped indium thin film is outstanding material among transparent Conductive Oxide (TCO) materials. ITO thin films show a low electrical resistance(<$10^{-4}\;[{\Omega}{\cdot}m]$) and high transmittance(>80%) in the visible range. ITO thin films usually have been deposited on the glass substrate. In order to apply flexible display, the substrate should have the ability to bend and be deposited without substrate heat. Also properties of ITO thin film depend on what kind of substrate. In this study, we prepared ITO thin film on the polycarbonate (PC) substrate by using Facing Target Sputtering (FTS) system. Before deposition of ITO thin film, PC substrate took plasma surface treatment. The electrical and surface properties of as-deposited thin films were investigated by Hall Effect measurement, UV/VIS spectrometer and the surface property of substrate is investigated by Contact angle measurement.

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Liquid crystal alignment by photo-dimerization reaction of PCEMA photo polymer (PCEMA 광폴리머의 광중합 작용을 이용한 액정배향)

  • 황정연;서대식
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.541-544
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    • 1999
  • We synthesised a novel photo-alignment material of PCEMA (poly(cinnamolyethyl methacrylate)) on photo-dimerization reaction. Next we investigated the electro-optical (EO) characteristics of photo-aligned twisted nematic (TN)-liquid crystal display (LCD) with linearly polarized ultraviolet (UV) light irradiation on PCEHA surface. The excellent voltage-transmittance characteristics of photo-aligned TN-LCD on PCEMA surface were obtained. The threshold voltage of photo-aligned TN-LCD decreases with increasing the UV light irradiation time on PCEMA surface. Also, the response time of photo-aligned TN-LCD on PCEMA surface is almost the same as rubbing-aligned TN-LCD.

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Fast Response Characteristics in Liquid Crystal Display in the High birefringence nematic liquid crystal (고굴절 네마틱 액정에서의 액정 디스플레이의 고속응답 특성)

  • Kim, Jong-Hwan;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.498-501
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    • 2003
  • We investigated response characteristics of twisted nematic (TN) cell with different nematic liquid crystals (NLCs) and cell gap d on a rubbed polyimide (PI) surface. High transmittance and fast response time of the TN cell on the rubbed PI surface were achieved by using high birefringence (${\Delta}n$) and low cell gap d. The transmittance and response time of the TN cell on the rubbed PI surface decreased with decreasing ${\Delta}nd$. The fast response time of TN cell using high birefringence with ${\Delta}nd=0.363$ on the rubbed PI surface was measured 5.1 ms.

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Development of a Surface-Strain Measurement System Using the Image Processing Technique (화상처리법을 이용한 곡면변형률 측정 시스템의 개발)

  • Han, Sang-Jun;Kim, Yeong-Su;Kim, Hyeong-Jong;O, Su-Ik
    • Transactions of Materials Processing
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    • v.7 no.6
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    • pp.575-585
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    • 1998
  • An automated surface-strain measuring system using the image processing technique is developed in the present study which consists of the hardware to capture and to display digital images. and the software to calculate the 3-D informations of grid points from two views. New or improved algorithms for the mapping and establishing correspondence of grid points and elements the camera calibration and the subpixel measurement of grid points are implemented. As an application of the present system the surface-strains of deformed blanks in the limitting dome height test the square cup deep-drawing and punch stretching to obtain the forming limit diagram are measured. The results are com-pared with those obtained by conventional manual methods.

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Simple surface biofunctionalization of biphasic calcium phosphates for improving osteogenic activity and bone tissue regeneration

  • Shim, Kyu-Sik;Kim, Hak-Jun;Kim, Sung Eum;Park, Kyeongsoon
    • Journal of Industrial and Engineering Chemistry
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    • v.68
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    • pp.220-228
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    • 2018
  • In this study, we found a simple surface biofunctionalization of biphasic calcium phosphate (BCP) based on the high affinity between alendronate and the calcium ions of BCP, and the strong interaction between heparin and bone morphogenic protein-2 (BMP-2). The biofunctionalized BCP did not be precipitated well and display a remarkable enhancement of osteogenic activity of human adipose-derived stem cells by showing increased alkaline phosphatase (ALP), calcium deposition and osteogenic-related genes (i.e., Runx-2, ALP, osteocalcin, and osteopontin), and bone regeneration in the calvarial defect model. Therefore, this simple surface technique can be used to easily functionalize various calcium phosphates.

Dislocation densities of CMP processed sapphire wafers for GaN epitaxy

  • 황성원;남정환;신귀수;김근주;서남섭
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.05a
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    • pp.18-22
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    • 2003
  • The sapphire wafers for blue light emitting devices were manufactured by the implementation of the surface machining technology based on micro-tribology. This process has been performed by grinding, lapping and polishing. The surfaces of sapphire wafers were mechanically affected by residual stress and surface default. This mechanical stress and strain can be cured by thermal anneal ing process. The sapphire crystalline wafers were annealed at $1100~1400^{\circ}C$ and then characterized by double crystal X-ray diffraction. The sample showed good quality of crystalline wafer surface wi th full width at hal f maximum of 16 arcsec for the 4-hour heat-treatment at $1300^{\circ}C$.

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Enhancement of the Virtual Metrology Performance for Plasma-assisted Processes by Using Plasma Information (PI) Parameters

  • Park, Seolhye;Lee, Juyoung;Jeong, Sangmin;Jang, Yunchang;Ryu, Sangwon;Roh, Hyun-Joon;Kim, Gon-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.132-132
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    • 2015
  • Virtual metrology (VM) model based on plasma information (PI) parameter for C4F8 plasma-assisted oxide etching processes is developed to predict and monitor the process results such as an etching rate with improved performance. To apply fault detection and classification (FDC) or advanced process control (APC) models on to the real mass production lines efficiently, high performance VM model is certainly required and principal component regression (PCR) is preferred technique for VM modeling despite this method requires many number of data set to obtain statistically guaranteed accuracy. In this study, as an effective method to include the 'good information' representing parameter into the VM model, PI parameters are introduced and applied for the etch rate prediction. By the adoption of PI parameters of b-, q-factors and surface passivation parameters as PCs into the PCR based VM model, information about the reactions in the plasma volume, surface, and sheath regions can be efficiently included into the VM model; thus, the performance of VM is secured even for insufficient data set provided cases. For mass production data of 350 wafers, developed PI based VM (PI-VM) model was satisfied required prediction accuracy of industry in C4F8 plasma-assisted oxide etching process.

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