• Title/Summary/Keyword: substrate thickness

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Bending Effects of ITO Thin Film Deposited on the Polymer Substrate (고분자 기판에 증착한 ITO 박막의 Bending 효과)

  • Kim, Sang-Mo;Rim, You-Seung;Choi, Hyung-Wook;Choi, Myung-Gyu;Kim, Kyung-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.7
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    • pp.669-673
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    • 2008
  • ITO thin film was deposited on PC substrate in Facing Targets Sputtering (FTS) system with various sputtering conditions. After it is applied to external bending force, we investigated how change the surface and electrical property of as-deposited ITO thin film. As the L(face-plate distance) of substrate decreases, it found that the maximum crack density is increasing at the center position and decreasing crack density as goes to the edge. So to apply same curvature (r) and bending force to PC substrate with ITO thin film, we fixed the L that is equal to curvature radius (2r). Before bending test, ITO thin films that deposited in the input current of 0.4 A and thickness of 200 nm already had biaxial tensile failure because of each different CTE (Coefficient of Thermal Expansion) and Others had been shown no bending or crack. After bending test, all samples had been shown cracks at about 200 times and as increasing the crack density, resistivity increased.

Permittivity Characteristic Analysis of Planar Substrates Using H-shaped Resonant Aperture (H-모양 공진 개구를 이용한 평면 기판의 유전율 특성 분석)

  • Yeo, Junho;Lee, Jong-Ig
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2018.05a
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    • pp.55-56
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    • 2018
  • In this paper, a method for analyzing the dielectric constant of a planar substrate is proposed. To this end, a band-stop filter was created by adding a H-shaped resonant aperture to the ground plane of a microstrip transmission line. A planar substrate of 2 mm thickness was placed behind the ground plane of the microstrip transmission line and the change of the resonant frequency with the change of the dielectric constant of the substrate was investigated. It can be seen that the change ratio of the frequency to the reference resonant frequency is larger than that of the conventional complementary split ring resonator structure.

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Spectral Domain Analysis of Input Impedance and Radiation Pattern in Rectangular Microstrip Patch Antenna on Anisotropy Substrates with Airgap (공기 갭을 갖는 이방성 매질 위의 사각 마이크로스트립 패치 안테나의 입력 임피던스와 방사패턴에 대한파수 영역 해석)

  • 윤중한;곽경섭
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.40 no.5
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    • pp.187-196
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    • 2003
  • Effects of Airgap and anisotropy substrate on input impedance and radiation pattern of rectangular microstrip patch antenna are studied in terms of an integral equation formulation. The input impedance and radiation pattern of microstrip patch antenna is investigated by using Galerkin's moment method in solving the integral equation. Sinusoidal functions are selected as basis functions, which resemble in the actual standing wave on the Patch. From the numerical results, the variation of input impedance and radiation patterns in the variation of air gap thickness, anisotropy ratio of substrate, and relative permittivity of anisotropy substrate are presented.

A study on CIGS thin film characteristic with composition ratio change (조성비 변화에 의한 CIGS박막 특성에 관한 연구)

  • Chu, Soon-Nam;Park, Jung-Cheul
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.10
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    • pp.2247-2252
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    • 2012
  • In this paper, we produced CIGS thin film by co-evaporation method. During the process, substrate temperature and Ga/(In+Ga) composition ratio was altered to observe the change of resistivity and absorbance spectra measurements. As substrate temperature increased, resistivity decreased and as Ga/(In+Ga) composition ratio increased from 0.30 to 0.72, band gap also increased with the range of 1.26eV, 1.30eV, 1.43eV, 1.47eV. With the constant condition of composition ratio, resistivity decreased with increased thickness of the thin film. On this experiment, we assumed that optical absorbance ratio and optical current will be increased with CIGS thin film fabrication.

Effect of $CeO_2$-addition and Particle Size of Doping Material on Characteristic of High-$T_c$ Superconducting Thick Film Using Diffusion Process ($CeO_2$첨가와 도포물질의 입자크기가 화산공정을 이용한 고온초전도 후막의 특성에 미치는 영향)

  • 임성훈;강형곤;홍세은;윤기웅;황종선;한병성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.2
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    • pp.152-157
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    • 2001
  • For the fabrication of YBa$_2$Cu$_3$O$_{x}$ thick film using diffusion process between $Y_3$BaCuO$_{5}$ and BaO+CuO, each material was selected as substrate and doping material. In this paper, we investigated the characteristic of YBa$_2$Cu$_3$O$_{x}$ thick film due to both addition of CeO$_2$into substrate and initial particle size of doping material. Through X-ray diffraction patterns and SEM photographs, the variation of composition and thickness of the formed phase was observed. It was from the experiment obtained that the addition of CeO$_2$into $Y_2$BaCuO$_{5}$ substrate and the initial particle size of doping material play important part in promoting the reaction between substrate and doping material.aterial.

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OBSERV ATION OF MICRO-STRUCTURE AND OPTICAL PROPERTISE OF TITANIUM DIOXIDE THIN FILMS USING OPTICAL MMEHODS

  • Kim, S.Y.;Kim, H.J.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.788-796
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    • 1996
  • $TiO_2$ films prepared by RF magnetron sputtering, electron beam evaporation, ion assisted deposition (IAD) and sol-gel method are prepared on c-Si substrate and vitreous silica substrate respectively. From the transmission spectra of $TiO_2$ films on vitreous silica substrate in the spectral region from 190 nm to 900 nm, k($\lambda$) of $TiO_2$ is obtained. Using k($\lambda$) in the interband transition region the coefficients of the quantum mechanical dispersion relation of an amorphous $TiO_2$ and hence n($\lambda$) including the optically opaque region of above fundamental transition energy are obtained. The spectroscopic ellipsometry spectra of $TiO_2$ films in the spectral region of 1.5-5.0eV are model analyzed to get the film packing density variation versus i) substrate material, ii) film thickness and iii) film growth technique. The complex refractive index change of these $TiO_2$ films versus water condensation is also studied. Film micro-structures by SE modelling results are compared with those by atomic force microscopy images and X-ray diffraction data.

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The Effect of Far Infrared Radiation of $\beta$-Spodumene Glass-Ceramics Flims Coated on Iron Substrate by Sol-Gel Technique (졸-겔법에 의한 금속기판상의 $\beta$-spodumene 결정성유리의 박영도포와 원적외선상세성)

  • 양중식;신현택;박종옥
    • Journal of the Korean institute of surface engineering
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    • v.27 no.2
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    • pp.99-108
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    • 1994
  • Films of glass-ceramics $Li_2O-Al_2O_3-SiO_2$(LAS)system were prepared on substrate of an iron plate(SCP) by sol-gel technique using metal alkoxide such as Si$(OC_2H_5)_4$,Al$(OC_2H_9)_3$) and Ti$(OC_2H_6)_4$). Sol which was made by means of simple spray coating, on the substrate was hydrolyzed at 75~$80^{\circ}C$ in moisture cabinet (80~90 % humidity) to form the multicomponent gel. The films up to about 0.8~1.0$mu extrm{m}$ in thickness can be obtained by repeating operation, spraylongrightarrowhydrolysis and condensationlongrightarrowdryinglongrightarrowheating and crystallization at $700^{\circ}C$ for 3~5min. The far-infrared radiation spectra of the coated films on substrate were examined by FT-IR and of films was also observed by scanning electron micrograph technique. The thermal evaluation of the gel-film is followed by TG/DTA measurements. The structure evaluation is followedd X-ray diffraction. These results suggest that this process is applicable to far-infrared radiat at thin film technique.

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Deposition of YBCO Thin Film by Aerosol Assisted Spray Pyrolysis Method using Nitrate Precursors (질산염 전구체 원료로 분무 열분해 방법에 의한 YBCO 박막 증착)

  • Kim, Byeong-Joo;Hong, Seok-Kwan;Kim, Jae-Geun;Lee, Jong-Beom;Lee, Hee-Gyoun;Hong, Gye-Won
    • Progress in Superconductivity
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    • v.12 no.1
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    • pp.68-73
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    • 2010
  • Y123 films have been deposited on $LaAlO_3$ (100) single-crystal and IBAD substrates by spray pyrolysis method using nitrate precursors. Ultrasonic atomization was adopted to decrease the droplet size, spraying angle and its moving velocity toward substrate for introducing the preheating tube furnace in appropriate location. A small preheating tube furnace was installed between spraying nozzle and substrate for fast drying and enhanced decomposition of precursors. C-axis oriented films were obtained on both LAO and IBAD substrates at deposition temperature of around $710{\sim}750^{\circ}C$ and working pressures of 10~15 torr. Thick c-axis epitaxial film with the thickness of $0.3{\sim}0.6\;{\mu}m$ was obtained on LAO single-crystal by 10 min deposition. But the XRD results of the film deposited on IBAD template at same deposition condition showed that the buffer layers of the IBAD metal substrate was affected by long residence of metal substrate at high temperature for YBCO deposition.

Electrical and Optical Properties of Ga-doped SnO2 Thin Films Via Pulsed Laser Deposition

  • Sung, Chang-Hoon;Kim, Geun-Woo;Seo, Yong-Jun;Heo, Si-Nae;Huh, Seok-Hwan;Chang, Ji-Ho;Koo, Bon-Heun
    • Journal of the Korean institute of surface engineering
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    • v.44 no.4
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    • pp.144-148
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    • 2011
  • $Ga_2O_3$ doped $SnO_2$ thin films were grown by using pulsed laser deposition (PLD) technique on glass substrate. The optical and electrical properties of these films were investigated for different doping concentrations, oxygen partial pressures, substrate temperatures, and film thickness. The films were deposited at different substrate temperatures (room temperature to $600^{\circ}C$). The best opto-electrical properties is shown by the film deposited at substrate temperature of $300^{\circ}C$ with oxygen partial pressure of 80 m Torr and the gallium concentration of 2 wt%. The as obtained lowest resistivity is $9.57{\times}10^{-3}\;{\Omega}cm$ with the average transmission of 80% in the visible region and an optical band gap (indirect allowed) of 4.26 eV.

Investigation of PEG(polyethyleneglycol) Removal Mechanism during UV/O2 Gas Phase Cleaning for Silicon Technology (UV/O2 가스상 세정을 이용한 실리콘 웨이퍼상의 PEG 반응기구의 관찰)

  • Kwon, Sung-Ku;Kim, Do-Hyun;Kim, Ki-Dong;Lee, Seung-Heun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.11
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    • pp.985-993
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    • 2006
  • An experiment to find out the removal mechanism of PEG(polyethyleneglycol) by using UV-enhanced $O_2$ GPC (gas phase cleaning) at low substrate temperature below $200^{\circ}C$ was executed under various process conditions, such as substrate temperature, UV exposure, and $O_2$ gas. The possibility of using $UV/O_2$ GPC as a low-temperature in-situ cleaning tool for organic removal was confirmed by the removal of a PEG film with a thickness of about 200 nm within 150 sec at a substrate temperature of $200^{\circ}C$. Synergistic effects by combining photo-dissociation and photo oxidation can only remove the entire PEG film without residues within experimental splits. In $UV/O_2$ GPC with substrate temperatures higher than the glass transition temperature, the substantial increase in the PEG removal rate can be explained by surface-wave formation. The photo-dissociation of PEG film by UV exposure results in the formation of end aldehyde by dissociation of back-bone chain and direct decomposition of light molecules. The role of oxygen is forming peroxide radicals and/or terminating the dis-proportionation reaction by forming peroxide.