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Actinide Drawdown From LiCl-KCl Eutectic Salt via Galvanic/chemical Reactions Using Rare Earth Metals

  • Yoon, Dalsung;Paek, Seungwoo;Jang, Jun-Hyuk;Shim, Joonbo;Lee, Sung-Jai
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.18 no.3
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    • pp.373-382
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    • 2020
  • This study proposes a method of separating uranium (U) and minor actinides from rare earth (RE) elements in the LiCl-KCl salt system. Several RE metals were used to reduce UCl3 and MgCl2 from the eutectic LiCl-KCl salt systems. Five experiments were performed on drawdown U and plutonium (Pu) surrogate elements from RECl3-enriched LiCl-KCl salt systems at 773 K. Via the introduction of RE metals into the salt system, it was observed that the UCl3 concentration can be lowered below 100 ppm. In addition, UCl3 was reduced into a powdery form that easily settled at the bottom and was successfully collected by a salt distillation operation. When the RE metals come into contact with a metallic structure, a galvanic interaction occurs dominantly, seemingly accelerating the U recovery reaction. These results elucidate the development of an effective and simple process that selectively removes actinides from electrorefining salt, thus contributing to the minimization of the influx of actinides into the nuclear fuel waste stream.

Study on the Atomic Layer Deposition System and Process of the MgO Thin Layer for the Thin Film Encapsulation of OLED (OLED의 Thin Film Encapsulation을 위한 MgO 박막의 원자층 증착 장치 및 공정에 관한 연구)

  • Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.22-26
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    • 2021
  • Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al2O3 and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al2O3/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP2 precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.

Nuclear Criticality Analyses of Two Different Disposal Canisters for Deep Geological Repository Considering Burnup Credit

  • Hyungju Yun;Manho Han;Seo-Yeon Cho
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.20 no.4
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    • pp.501-510
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    • 2022
  • The nuclear criticality analyses considering burnup credit were performed for a spent nuclear fuel (SNF) disposal cell consisting of bentonite buffer and two different types of SNF disposal canister: the KBS-3 canister and small standardized transportation, aging and disposal (STAD) canister. Firstly, the KBS-3 & STAD canister containing four SNFs of the initial enrichment of 4.0wt% 235U and discharge burnup of 45,000 MWD/MTU were modelled. The keff values for the cooling times of 40, 50, and 60 years of SNFs were calculated to be 0.79108, 0.78803, and 0.78484 & 0.76149, 0.75683, and 0.75444, respectively. Secondly, the KBS-3 & STAD canister with four SNFs of 4.5wt% and 55,000 MWD/MTU were modelled. The keff values for the cooling times of 40, 50, and 60 years were 0.78067, 0.77581, and 0.77335 & 0.75024, 0.74647, and 0.74420, respectively. Therefore, all cases met the performance criterion with respect to the keff value, 0.95. The STAD canister had the lower keff values than KBS-3. The neutron absorber plates in the STAD canister significantly affected the reduction in keff values although the distance among the SNFs in the STAD canister was considerably shorter than that in the KBS-3 canister.

Design of Copper Alloys Preventing Grain Boundary Precipitation of Copper Sulfide Particles for a Copper Disposal Canister

  • Minkyu Ahn;Jinwoo Park;Gyeongsik Yu;Jinhyuk Kim;Sangeun Kim;Dong-Keun Cho;Chansun Shin
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.21 no.1
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    • pp.1-8
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    • 2023
  • The major concern in the deep geological disposal of spent nuclear fuels include sulfide-induced corrosion and stress corrosion cracking of copper canisters. Sulfur diffusion into copper canisters may induce copper embrittlement by causing Cu2S particle formation along grain boundaries; these sulfide particles can act as crack initiation sites and eventually cause embrittlement. To prevent the formation of Cu2S along grain boundaries and sulfur-induced copper embrittlement, copper alloys are designed in this study. Alloying elements that can act as chemical anchors to suppress sulfur diffusion and the formation of Cu2S along grain boundaries are investigated based on the understanding of the microscopic mechanism of sulfur diffusion and Cu2S precipitation along grain boundaries. Copper alloy ingots are experimentally manufactured to validate the alloying elements. Microstructural analysis using scanning electron microscopy with energy dispersive spectroscopy demonstrates that Cu2S particles are not formed at grain boundaries but randomly distributed within grains in all the vacuum arc-melted Cu alloys (Cu-Si, Cu-Ag, and Cu-Zr). Further studies will be conducted to evaluate the mechanical and corrosion properties of the developed Cu alloys.

Corrosion Behavior of Hastelloy C-276 for Carbon-anode-based Oxide Reduction Applications

  • Jeon, Min Ku;Kim, Sung-Wook;Choi, Eun-Young
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.18 no.3
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    • pp.383-393
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    • 2020
  • The corrosion behavior of Hastelloy C-276 was investigated to identify its applicability for carbon-anode-based oxide reduction (OR), in which Cl2 and O2 are simultaneously evolved at the anode. Under a 30 mL·min-1 Cl2 + 170 mL·min-1 Ar flow, the corrosion rate was less than 1 g·m-2·h-1 up to 500℃, whereas the rate increased exponentially from 500 to 700℃. The effects of the Cl2-O2 composition on the corrosion rate at flow rates of 30 mL·min-1 Cl2, 20 mL·min-1 Cl2 + 10 mL·min-1 O2, and 10 mL·min-1 Cl2 + 20 mL·min-1 O2 with a constant 170 mL·min-1 Ar flow rate at 600℃ was analyzed. Based on the data from an 8 h reaction, the fastest corrosion rate was observed for the 20 mL·min-1 Cl2 + 10 mL·min-1 O2 case, followed by 30 mL·min-1 Cl2 and 10 mL·min-1 Cl2 + 20 mL·min-1 O2. The effects of the chlorine flow rate on the corrosion rate were negligible within the 5-30 mL·min-1 range. A surface morphology analysis revealed the formation of vertical scratches in specimens that reacted under the Cl2-O2 mixed gas condition.

Study on the OLED Thin Film Encapsulation of the Al2O3 Thin Layer Formed by Atomic Layer Deposition Method (원자층 증착방법에 의한 Al2O3 박막의 OLED Thin Film Encapsulation에 관한 연구)

  • Kim, Ki Rak;Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.1
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    • pp.67-70
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    • 2022
  • In order to prevent water vapor and oxygen permeation in the organic light emitting diodes (OLED), Al2O3 thin-film encapsulation (TFE) technology were investigated. Atomic layer deposition (ALD) method was used for making the Al2O3 TFE layer because it has superior barrier performance with advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the thickness of the Al2O3 layer was varied by controlling the numbers of the unit pulse cycle including Tri Methyl Aluminum(Al(CH3)3) injection, Ar purge, and H2O injection. In this case, several process parameters such as injection pulse times, Ar flow rate, precursor temperature, and substrate temperatures were fixed for analysis of the effect only on the thickness of the Al2O3 layer. As results, at least the thickness of 39 nm was required in order to obtain the minimum WVTR of 9.04 mg/m2day per one Al2O3 layer and a good transmittance of 90.94 % at 550 nm wavelength.

Effects of endurance exercise under hypoxia on acid-base and ion balance in healthy males

  • Nam, Sang-Seok;Park, Hun-Young
    • Korean Journal of Exercise Nutrition
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    • v.24 no.3
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    • pp.7-12
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    • 2020
  • [Purpose] This study was performed to investigate the acid-base and ion balance at rest and after exercise in healthy males under normoxia, moderate hypoxia, and severe hypoxia. [Methods] Ten healthy Korean males completed three different trials on different days, comprising exercise under normoxia (FiO2 = 20.9%, N trial), moderate hypoxia (FiO2 = 16.5%, MH trial), and severe hypoxia (FiO2 = 12.8%, SH trial). They undertook endurance exercise for 30 min on a cycle ergometer at the same relative exercise intensity equivalent to 80% maximal heart rate under all conditions. Capillary blood samples were obtained to determine acid-base and ion balance at rest and after exercise. [Results] Exercise-induced blood lactate elevations were significantly increased as hypoxic conditions became more severe; SH > MH > N trials (P = 0.003). After exercise, blood glucose levels were significantly higher in the SH trial than in the N and MH trials (P = 0.001). Capillary oxygen saturation (SCO2) levels were significantly lowered as hypoxic conditions became more severe; SH > MH > N trials (P < 0.001). The pH levels were significantly lower in the MH trial than that in the N trial (P = 0.010). Moreover, HCO3- levels were significantly lower in the SH trial than in the N trial, with significant interaction (P = 0.003). There were no significant differences in blood Na+, K+, and Ca2+ levels between the trials. [Conclusion] MH and SH trials induced greater differences in glucose, lactate, SCO2, pH, and HCO3- levels in capillary blood compared to the N trial. Additionally, lactate, SCO2, and HCO3- levels showed greater changes in the SH trial than in the MH trial. However, there were no significant differences in Na+, K+, and Ca2+ levels in MH and SH trials compared to the N trial.

The Effect of Sampling Intervals on VO2 Plateau and Reinvestigation of Other Criteria During VO2max Test. (최대산소섭취량 측정 시 측정간격에 따른 정체현상의 변화와 종료기준의 적용)

  • Yoon, Byung-Kon;Kwak, Yi-Sub
    • Journal of Life Science
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    • v.17 no.9 s.89
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    • pp.1255-1259
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    • 2007
  • The purpose of this study was to elucidate incidence of $VO_2$ plateau by comparing data derived from different time averaging intervals during incremental cycling exercise to $VO_2max$. Seventeen subjects (age: $23.5{\pm}3.3$ years and $VO_2max$: $3.65{\pm}0.73$ L/min, respectively) completed $VO_2max$ tests on cycle ergometer which breath by breath gas ex-change data were obtained. These data were time-averaged into 11-breath, 15, 30 and 60 s sampling intervals. The incidence of plateau were 100, 35, 24 and 6% for the 11 breath, 15 s, 30 s and 60 s averaging, respectively. No correlation was between ${\Delta}$ $VO-2$ at $VO_2max$ and $VO_2max$ (r=0.008). 53% (maximal HR within 10 b/min) and 100% $(RER{\geq}1.15)$ of subjects met the criteria for attainment of $VO_2max$. This data indicate that shorter sampling intervals (11 breath) is the most suitable for de-tection of the $VO_2$ plateau and RER can be used for the criteria for attainment of $VO_2max$ but not maximal HR. Also, the incidence of a plateau is not related to training status or physical fitness of subjects.

Characteristics of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using Alternating Exposures of SiH2Cl2 and O3 (SiH2Cl2 와 O3을 이용한 원자층 증착법에 의해 제조된 실리콘 산화막의 특성)

  • Lee Won-Jun;Lee Joo-Hyeon;Han Chang-Hee;Kim Un-Jung;Lee Youn-Seung;Rha Sa-Kyun
    • Korean Journal of Materials Research
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    • v.14 no.2
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    • pp.90-93
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    • 2004
  • Silicon dioxide thin films were deposited on p-type Si (100) substrates by atomic layer deposition (ALD) method using alternating exposures of $SiH_2$$Cl_2$ and $O_3$ at $300^{\circ}C$. $O_3$ was generated by corona discharge inside the delivery line of $O_2$. The oxide film was deposited mainly from $O_3$ not from $O_2$, because the deposited film was not observed without corona discharge under the same process conditions. The growth rate of the deposited films increased linearly with increasing the exposures of $SiH_2$$Cl_2$ and $O_3$ simultaneously, and was saturated at approximately 0.35 nm/cycle with the reactant exposures over $3.6 ${\times}$ 10^{9}$ /L. At a fixed $SiH_2$$Cl_2$ exposure of $1.2 ${\times}$ 10^{9}$L, growth rate increased with $O_3$ exposure and was saturated at approximately 0.28 nm/cycle with $O_3$ exposures over$ 2.4 ${\times}$ 10^{9}$ L. The composition of the deposited film also varied with the exposure of $O_3$. The [O]/[Si] ratio gradually increased up to 2 with increasing the exposure of $O_3$. Finally, the characteristics of ALD films were compared with those of the silicon oxide films deposited by conventional chemical vapor deposition (CVD) methods. The silicon oxide film prepared by ALD at $300^{\circ}C$ showed better stoichiometry and wet etch rate than those of the silicon oxide films deposited by low-pressure CVD (LPCVD) and atmospheric-pressure CVD (APCVD) at the deposition temperatures ranging from 400 to $800^{\circ}C$.

Improved Cycle Life and Storage Performance in High-Voltage Operated Li2MnO3-LiMO2(M=Ni, Co, Mn)/Graphite Cell System by Fluorine Compounds as Main Electrolyte Solvent (고전압 구동 Li2MnO3-LiMO2(M=Ni, Co, Mn)/graphite 시스템에서의 전지 수명 및 고온 방치 특성 향상에 효과적인 플루오로 화합물계 전해액에 대한 연구)

  • Yu, Jung-Yi;Shin, Woocheol;Lee, Byong-Gon
    • Journal of the Korean Electrochemical Society
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    • v.16 no.3
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    • pp.162-168
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    • 2013
  • $Li_2MnO_3-LiMO_2$(M=Ni, Co, Mn) nano-composite is a promising cathode material for xEV application due to its high theoretic capacity. However high voltage operating system of $Li_2MnO_3-LiMO_2$(M=Ni, Co, Mn) has worked as a hurdle in its application because of the inherent demerits, such as cycle life degradation and gas evolution. In order to enhance cell performance of $Li_2MnO_3-LiMO_2$(M=Ni, Co, Mn)/graphite cell, we examined electrolyte mainly composed of FEC, fluroalkyl ether and $LiPF_6$ (F-based EL). F-based EL showed much better discharging retention ratio than 1.3 M $LiPF_6$ EC/EMC/DMC (3/4/3, v/v/v) (STD). Furthermore gas evolution, especially CO and $CO_2$ during $60^{\circ}C$ storage for 30 days was dramatically reduced owing to thermal stable SEI formation effect of F-based EL.