Characteristics of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using Alternating Exposures of SiH2Cl2 and O3
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Lee Won-Jun
(세종대학교 신소재공학과)
Lee Joo-Hyeon (한국과학기술원 재료공학과) Han Chang-Hee (한밭대학교 재료공학과) Kim Un-Jung (세종대학교 신소재공학과) Lee Youn-Seung (한밭대학교 정보통신컴퓨터공학과) Rha Sa-Kyun (한밭대학교 재료공학과) |
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