• 청정기술
• /
• 제22권3호
• /
• pp.203-207
• /
• 2016

Here, we report a novel fabrication technique for patchable organic lasing sheet based on non-volatile liquid organic semiconductors and freestanding polymeric film with high flexibility and patchability. For this work, we have fabricated the second-order DFB grating structure, which leads to surface emission, embedded in the freestanding polymeric film. Using an ultra-violet (UV) curable polyurethaneacrylate (PUA) mixture, the periodic DFB grating structure can be easily prepared on the freestanding polymeric film via a simple UV curing process. Due to unsaturated acrylate remained in the PUA mixture after UV curing, the freestanding PUA film provides adhesive properties, which enable mounting of the patchable organic lasing sheet onto non-flat surfaces with conformal contact. To achieve laser actions in the freestanding resonator structure, a composite material of liquid 9-(2-ethylhexyl)carbazole (EHCz) and organic laser dyes was used as the laser medium. Since the degraded active materials can be easily refreshed by a simple injection of the liquid composite, such a non-volatile liquid organic semiconducting medium has degradation-free and recyclable characteristics in addition to other strong advantages including tunable optoelectronic responses, solvent-free processing, and ultimate mechanical flexibility and uniformity. Lasing properties of the patchable organic lasing sheet were also investigated after mounting onto non-flat surfaces, showing a mechanical tunability of laser emission under variable surface curvature. It is anticipated that these results will be applied to the development of various patchable optoelectronic applications for light-emitting displays, sensors and data communications.

• 폴리머
• /
• 제34권5호
• /
• pp.450-453
• /
• 2010

Iron(III) p-toluenesulfonate(FTS)를 개시제로 한 pyrrole의 중합에서 용액 중합법(LPP)과 기상 중합법(VPP)으로 제조된 PPy 박막의 전기/광학적 특성 및 표면구조를 비교하였다. LPP에 비해서 VPP 방법으로 제조된 PPy 박막은 우수한 전기적 특성을 보여주었다. 표면 특성분석을 이용하여 제조된 PPy 필름의 표면 모폴로지와 표면저항과의 상관관계를 검토하였다. VPP 방법으로 제조된 PPy 박막의 표면이 LPP로 제조된 것보다 평탄하였다. VPP를 응용한 잉크젯 프린팅과 소프트 리소그래피를 사용하여 미세 패턴된 PPy 박막을 효과적으로 제조할 수 있었다.

• 센서학회지
• /
• 제22권5호
• /
• pp.352-356
• /
• 2013

We developed a novel fabrication method of polydimethylsioxane (PDMS) lens, which can easily control the shapes of the lens using soft lithography with common photolithography and water droplet molding. A mold for PDMS lens was prepared by patterning of hydrophobic photoresist on the hydrophilic substrate and dispensing small water droplets onto the predefined hydrophilic patterns. The size of patterns determined the dimension of the lens and the dispensed volume of the water droplet decided the radius of curvature of the PDMS lens independently. The water droplet with photoresist pattern played a robustly fixed mold for lens due to difference in wettability. The radius of curvature could be calculated theoretically because the water droplets could approximate spherical cap on the substrate. Finally, concave and convex PDMS lenses which could reduce or magnify optically were fabricated by curing of PDMS on the prepared mold. The measured radii of the fabricated PDMS lenses were well matched with the estimated values. We believe that our simple and efficient fabrication method can be adopted to PDMS microlens and extended to micro optical device, lab on a chip, and sensor technology.

• 한국진공학회지
• /
• 제18권5호
• /
• pp.372-376
• /
• 2009

현대 반도체 공정에서 일정한 패턴을 생성하기 위하여 리소그래피(Lithography) 공정을 이용하고 있으나 선폭의 감소로 인하여 기존 UV를 이용한 PR(Photoresist) 이외에 e-beam을 이용한 PMMA(Polymethyl methacrylate) 리소그래피에 대한 관심이 높아지고 있다. 또한 리소그래피에 의하여 생성된 패턴은 이후 세정 공정에서 잔류물을 제거하는 과정에서 패턴 붕괴를 일으키게 되는데 이러한 패턴 붕괴에 대한 방어력은 패턴 형성 물질의 탄성력(Elastic modulus)과 비례하는 것으로 알려져 있다. 이 논문에서 우리는 PMMA의 soft-baking 이후 Hardness(H)와 Elastic modulus(Er)의 변화를 압입력을 25 uN에서 8,500 uN으로 134.52 uN 간격으로 증가시키며 측정하였다. 또한 이 실험에서 Hardness(H)와 Elastic modulus(Er)는 Hysitron사의 Triboindenter를 이용하여 측정하였고 압입팁은 Berkovich 팁을 사용하였다.

• 한국전기전자재료학회논문지
• /
• 제34권4호
• /
• pp.262-268
• /
• 2021

For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.410.1-410.1
• /
• 2014

A soft-lithographic top-down approach is combined with an epitaxial layer transfer process to fabricate high quality III-V compound semiconductor nanowires (NWs) and integrate them on Si/SiO2 substrates, using MBE-grown ultrathin InAs as a source wafer. The channel width of the InAs nanowires is controlled by using solvent-assisted nanoscale embossing (SANE), descumming, and etching processes. By optimizing these processes, the NW width is scaled to less than 50 nm, and the InAs NWFETs has ${\sim}1,600cm^2/Vs$ peak electron mobility, which indicates no mobility degradation due to the size.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.641-644
• /
• 2009

We demonstrated a solvent-assisted soft-lithographic patterning method for producing patterned structure and patterned ordering with lyotropic liquid crystalline polymer (LCP) film. Experimental results showed that the liquid crystalline ordering of lyotropic film could be controlled by shearing effects of the fluidic solvent though the patterned mold channels. In this work, two types of lyotropic LCPs were used to investigate the effects of the alkyl chain length of the lyotropic LCP on producing liquid crystalline ordering through the solvent-assisted fluidic patterning.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
• /
• pp.411-411
• /
• 2012

Over the recent years, surface enhanced Raman spectroscopy (SERS) has dramatically grown as a label-free detecting technique with the high level of selectivity and sensitivity. Conventional SERS-active nanostructured layers have been deposited or patterned on rigid substrates such as silicon wafers and glass slides. Such devices fabricated on a flexible platform may offer additional functionalities and potential applications. For example, flexible SERS-active substrates can be integrated into microfluidic diagnostic devices with round-shaped micro-channel, which has large surface area compared to the area of flat SERS-active substrates so that we may anticipate high sensitivity in a conformable device form. We demonstrate fabrication of flexible SERS-active nanostructured substrates based on soft-lithography for simple, low-cost processing. The SERS-active nanostructured substrates are fabricated using conventional Si fabrication process and inkjet printing methods. A Si mold is patterned by photolithography with an average height of 700 nm and an average pitch of 200 nm. Polydimethylsiloxane (PDMS), a mixture of Sylgard 184 elastomer and curing agnet (wt/wt = 10:1), is poured onto the mold that is coated with trichlorosilane for separating the PDMS easily from the mold. Then, the nano-pattern is transferred to the thin PDMS substrates. The soft lithographic methods enable the SERS-active nanostructured substrates to be repeatedly replicated. Silver layer is physically deposited on the PDMS. Then, gold nanoparticle (AuNP) inks are applied on the nanostructured PDMS using inkjet printer (Dimatix DMP 2831) to deposit AuNPs on the substrates. The characteristics of SERS-active substrates are measured; topology is provided by atomic force microscope (AFM, Park Systems XE-100) and Raman spectra are collected by Raman spectroscopy (Horiba LabRAM ARAMIS Spectrometer). We anticipate that the results may open up various possibilities of applying flexible platform to highly sensitive Raman detection.

• 한국산업융합학회 논문집
• /
• 제5권2호
• /
• pp.141-146
• /
• 2002

Stereolithography is the best known as rapid prototyping system. It uses the STL format data which is generated from CAD system. In this study, One of the main function of this developed CAM system deals with shape modification which divide a shape into two parts or more. The cross section of a STL part by a z-level is composed with nested or single polygonal closed loop. In order to make RP product, closed loops must fill with triangular facets from SSET and recover sliced triangular facets which is located normal direction to the cross sectional plane. The system is development by using Visuall C++ compiler in the environment of pentium PC. Operating system is Windows NT workstaion from Micro-Soft.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2003년도 춘계학술대회 논문집
• /
• pp.624-627
• /
• 2003

Microcontact printing (uCP) of alkanethiols on gold was the first representative of soft-lithography processes. This is an attempt to enhance the accuracy of classical to a precision comparable with optical lithography, creating a low-cost, large-area, and high-resolution patterning process. Microcontact printing relies on replication of a pattered PDMS stamp from a master to form an elastic stamp that can be inked with a SAM solution(monolayer -forming ink) using either immersion inking or contact inking. The inked PDMS stamp is then used to print a pattern that selectively protects the gold substrate during the subsequent etch.