한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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- Pages.410.1-410.1
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- 2014
Soft Lithographic Approach to Fabricate Sub-50 nm Nanowire Field-effect Transistors
- 발행 : 2014.02.10
초록
A soft-lithographic top-down approach is combined with an epitaxial layer transfer process to fabricate high quality III-V compound semiconductor nanowires (NWs) and integrate them on Si/SiO2 substrates, using MBE-grown ultrathin InAs as a source wafer. The channel width of the InAs nanowires is controlled by using solvent-assisted nanoscale embossing (SANE), descumming, and etching processes. By optimizing these processes, the NW width is scaled to less than 50 nm, and the InAs NWFETs has