• Title/Summary/Keyword: soft-lithography

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Soft Lithography of Graphene Sheets Via Surface Energy Modification

  • Kim, Hansun;Jung, Min Wook;Myung, Sung;Jung, Daesung;Lee, Sun Sook;Kong, Ki-Jeong;Lim, Jongsun;Lee, Jong-Heun;Park, Chong Yun;An, Ki-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.144.2-144.2
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    • 2013
  • With the synthesis of graphene sheets as large-scale and high quality, it is essentially important to develop suitable graphene patterning process for future industrial applications. Especially, transfer or patterning method of CVD-grown graphene has been studied. We report simple soft lithographic process to develop easily applicable patterning method of large-scale graphene sheets by using chemically functionalized polymer stamp. Also important applications, the prototype capacitors with graphene electrode and commercial polymer dielectrics for the electrostatic-type touch panel are fabricated using the developed soft lithographic patterning and transfer process.

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Fabrication of Superhydrophobic Film with Uniform Structures Using Two Step Lithography and Nanosilica Coating (Two step lithography와 나노 실리카 코팅을 이용한 초발수 필름 제작)

  • Yu, Chaerin;Lee, Dong-Weon
    • Journal of Sensor Science and Technology
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    • v.28 no.4
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    • pp.251-255
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    • 2019
  • We propose a two-step lithography process to minimize edge-bead issues caused by thick photoresist (PR) coating. In the conventional PR process, the edge bead can be efficiently removed by applying an edge-bead removal (EBR) process while rotating the silicon wafer at a high speed. However, applying conventional EBR to the production of desired PR mold with unique negative patterns cannot be used because a lower rpm of spin coating and a lower temperature in the soft bake process are required. To overcome this problem, a two-step lithography process was developed in this study and applied to the fabrication of a polydimethylsiloxane (PDMS) film having super-hydrophobic characteristics. Following UV exposure with a first photomask, the exposed part of the silicon wafer was selectively removed by applying a PR developer while rotating at a low rpm. Then, unique PR mold structures were prepared by employing an additional under-exposure process with a second mask, and the mold patterns were transferred to the PDMS. Results showed that the fabricated PDMS film based on the two-step lithography process reduced the height difference from 23% to 5%. In addition, the water contact angle was greatly improved by spraying of hydrophobic nanosilica on the dual-scaled PDMS surface.

Analysis and Evaluation of Capillary Passive Valves in Microfluidic Systems Using a Centrifugal Force

  • Cho, Han-Sang;Kim, Ho-Young;Kang, Ji-Yoon;Kwak, Seung-Min;Kim, Tae-Song
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.4
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    • pp.155-159
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    • 2004
  • This work reports the theoretical and experimental investigations of capillary bust valves to regulate liquid flow in microchannels. The theoretical analysis uses the Young-Laplace equation and geometrical considerations to predict the pressure at the edge of the valve opening. Numerical simulations are employed to calculate the meniscus shape evolution while the interface is pinned at the valve edge. Microchannels and valves are fabricated using soft lithography. A wafer-rotating system, which can adjust the driving pressure by rotational speed, induces a liquid flow. Experimentally measured valve-bursting pressure agrees with theoretical predictions.

Fabrication of Multi-functional Self-Assembled Monolayers by Microcontact Printing and Their Application for Electronic and Biological Devices (미세접촉인쇄기법을 이용한 다기능성 자기조립막 제작과 전자.생물소자로의 응용)

  • Choi, Dae-Geun;Yu, Hyung-Kyun;Yang, Seung-Man;Jo, Jeong-Dai;Lee, Eung-Sug
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.1021-1024
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    • 2003
  • In this work, we fabricated various 2D metallic and polymeric nanopatterns with the feature resolution of sub-micrometer scale by using the method of microcontact printing ($\mu$ P) based on soft lithography. Silicon masters for the micromolding were made by e-beam lithography. Composite poly(dimethylsiloxane) (PDMS) molds were composed of a thin, hard layer supported by soft PDMS layer. Finally, monodisperse metal or polymer particles could be obtained in the prepared pattern for the application of electronic devices.

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Alumina Templates on Silicon Wafers with Hexagonally or Tetragonally Ordered Nanopore Arrays via Soft Lithography

  • Park, Man-Shik;Yu, Gui-Duk;Shin, Kyu-Soon
    • Bulletin of the Korean Chemical Society
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    • v.33 no.1
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    • pp.83-89
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    • 2012
  • Due to the potential importance and usefulness, usage of highly ordered nanoporous anodized aluminum oxide can be broadened in industry, when highly ordered anodized aluminum oxide can be placed on a substrate with controlled thickness. Here we report a facile route to highly ordered nanoporous alumina with the thickness of hundreds-of-nanometer on a silicon wafer substrate. Hexagonally or tetragonally ordered nanoporous alumina could be prepared by way of thermal imprinting, dry etching, and anodization. Adoption of reusable polymer soft molds enabled the control of the thickness of the highly ordered porous alumina. It also increased reproducibility of imprinting process and reduced the expense for mold production and pattern generation. As nanoporous alumina templates are mechanically and thermally stable, we expect that the simple and costeffective fabrication through our method would be highly applicable in electronics industry.

Sub-100nm Hybrid stamp fabrication by Hot embossing (Hot embossing 공정을 이용한 100nm 급 Hybrid stamp 제작)

  • Hong S.H.;Yang K.Y.;Lee Heon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1168-1170
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    • 2005
  • Nanoimprint Lithography(NIL) has increasingly been recognized as a key manufacturing technology for nanosized feature. One of the most important task for nanoimprint lithography is to provide the imprinting stamp with low price. The Stamp fabricated with Si based material by e-beam lithography, RIE is extremely expensive and its throughput is very limited and PDMS replica is too soft to hold high imprinting pressure.(>5atm) In this study, we present the imprinting stamp which can be easily replicated from original mold and is based on PVC film. Replication of original Si mold to PVC film was done by Hot embossing technique, ($120^{\circ}C$ of Temperature, 20 atm applied) As small as 100nm patterns were successfully transferred into PVC film. The size of stamp was up to 100mm in diameter.

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Soft Optical Waveguide Sensors Tuned by Reflective Pigmentation for Robotic Applications (로봇 어플리케이션을 위해 반사 색소로 조정된 소프트 광도파로 센서)

  • Jamil, Babar;Choi, Youngjin
    • The Journal of Korea Robotics Society
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    • v.16 no.1
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    • pp.1-11
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    • 2021
  • Soft robotics has attracted a huge amount of interest in the recent decade or so, be it either actuators or sensors. Recently, a soft optical waveguide sensor has proven its effectiveness for various sensing applications such as strain, force, and bending measurements. The operation principle of the waveguide is simple, but the present technology is far too much complex to manufacture the waveguide. The waveguide fails to attract various practical applications in comparison to other types of sensors despite its superior safety and ease working principle. This study pursues to develop the soft sensors based on the optical phenomena so that the waveguide can be easily manufactured and its design can be conducted. Several physical properties of the waveguide are confirmed through the repetitive experiments in the aspects of strain, force, and bending of the waveguide. Finally, the waveguide sensor is embedded inside the actuator to verify the effectiveness of the proposed waveguide as well as to extend the application fields of the waveguide sensor.

Technology for Roll-based Nanoimprint Lithography Systems (롤 기반 나노임프린트 리소그래피 시스템 기술)

  • Lim, Hyungjun;Lee, Jaejong;Choi, Kee-Bong;Kim, Geehong;Lee, Sunghwi
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.5
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    • pp.1-8
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    • 2013
  • Roll-based, nanoimprint lithography (Roll-NIL) is one effective method to produce large-area nanopatterns continuously. Systems and processes for Roll-NIL have been developed and studied for more than 15 years. Since the shapes of the stamp and the substrate for Roll-NIL can be plates, films, and rolls, there exist many concepts to design and implement roll-NIL systems. Combinations and variations of contact-methods for variously shaped stamps and substrates are analyzed in this paper. The contact-area can be changed by using soft materials such as polydimethylsiloxane (PDMS) or silicone rubber. Ultraviolet (UV) sources appropriate for the roll-to-plate or roll-to-roll process are introduced. Finally, two roll-to-plate nanoimprint lithography systems are illustrated.