• Title/Summary/Keyword: sidewall

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Investigation on Suppression of Nickel-Silicide Formation By Fluorocarbon Reactive Ion Etch (RIE) and Plasma-Enhanced Deposition

  • Kim, Hyun Woo;Sun, Min-Chul;Lee, Jung Han;Park, Byung-Gook
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.1
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    • pp.22-27
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    • 2013
  • Detailed study on how the plasma process during the sidewall spacer formation suppresses the formation of silicide is done. In non-patterned wafer test, it is found that both fluorocarbon reactive ion etch (RIE) and TEOS plasma-enhanced deposition processes modify the Si surface so that the silicide reaction is chemically inhibited or suppressed. In order to investigate the cause of the chemical modification, we analyze the elements on the silicon surface through Auger Electron Spectroscopy (AES). From the AES result, it is found that the carbon induces chemical modification which blocks the reaction between silicon and nickel. Thus, protecting the surface from the carbon-containing plasma process prior to nickel deposition appears critical in successful silicide formation.

Poly-gate Quantization Effect in Double-Gate MOSFET (폴리 게이트의 양자효과에 의한 Double-Gate MOSFET의 특성 변화 연구)

  • 박지선;이승준;신형순
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.8
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    • pp.17-24
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    • 2004
  • Quantum effects in the poly-gate are analyzed in two dimensions using the density-gradient method, and their impact on the short-channel effect of double-gate MOSFETs is investigated. The 2-D effects of quantum mechanical depletion at the gate to sidewall oxide is identified as the cause of large charge-dipole formation at the corner of the gate. The bias dependence of the charge dipole shows that the magnitude of the dipole peak-value increases in the subthreshold region and there is a large difference in carrier and potential distribution compared to the classical solution. Using evanescent-nude analysis, it is found that the quantum effect in the poly-gate substantially increases the short-channel effect and it is more significant than the quantum effect in the Si film. The penetration of potential contours into the poly-gate due to the dipole formation at the drain side of the gate corner is identified as the reason for the substantial increase in short-channel effects.

An Experimental Study for Vertical Flame Spread Analysis of Aluminum Composite Panel (알루미늄 복합 패널의 수직 화염전파속도 분석을 위한 실험적 연구)

  • Kim, Il-Kwon;Kim, Bong-Chan;Ku, In-hyuck;Seo, Dong-Gu;Lim, Nam Gi;Kwun, Young-Jin
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2013.05a
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    • pp.315-317
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    • 2013
  • To analyze vertical fire spreadability of aluminum composite panel, real scale test of aluminum composite panel and fire retardant aluminum composite panel was conducted as well as analysis of domestic code, test and domestic reaserch resulted in following conclusion. Fire spread risk assessment of aluminum Composite Panel is impossible with the current regulations (Cone Calorimeter Test). It need to changes of regulatory and combustion expanded risk assessment and regulatory changes in the test methods need to be judged. Also, there is quite a big different between the general aluminum Composite Panel and semi-non combustible of aluminum Composite Panel. However it is also deemed to be danger when present in the sidewall to the top consisting of fire spread. From now on, it is needed the study about interpretation of fire spread and sidewall of vertical fire spread analysis not only experiments for aluminum Composite Panel.

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A Study of Design of Sidewalls for Cascade Model with Single Blade Within a 160% Pitch Passage (160% 피치의 유로에서 단일익형에 의한 캐스케이드 실험을 위한 벽면의 설계에 관한 연구)

  • Cho, Chong-Hyun;Kim, Young-Cheol;Ahn, Kook-Young;Cho, Soo-Yong
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.37 no.6
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    • pp.527-536
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    • 2009
  • A cascade apparatus was designed with only one blade. Its passage is a 160% width of the cascade pitch. This kind of apparatus can give more accurate experimental result than those applying multi-blades even though the apparatus is small. However, this causes difficulties to make the periodic condition along the pitchwise direction. In this study, sidewalls were designed to satisfy the periodic condition based on the flow structure using a gradient based optimization and a genetic algorism. The objective function was adopted the surface Mach number obtained on the cascade and fourteen design variables were selected for controlling sidewall shapes. The designed sidewalls using the genetic algorism shows better result.

Effect of CF4 Addition on Ferroelectric YMnO3Thin Film Etching (강유전체 YMnO3 박막 식각에 대한 CF4첨가효과)

  • 박재화;김경태;김창일;장의구;이철인
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.4
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    • pp.314-318
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    • 2002
  • The etching behaviors of the ferroelectric $YMnO_3$ thin films were studied by an inductively coupled plasma (ICP). The maximum etch rate of $YMnO_3$ thin film is 300 ${\AA}/min$ at Ar/$Cl_2$of 2/8, RF power of 800W, dc bias voltage of 200V, chamber pressure of 15mTorr and substrate temperature of $30^{\circ}C$. Addition of $CF_4$ gas decrease the etch rate of $YMnO_3$ thin film. From the results of XPS analysis, nonvolatile $YF_x$ compounds were found on the surface of $YMnO_3$ thin film which is etched in Ar/$Cl_2$/CF$_4$plasma. The etch profile of YMnO$_3$film is improved by addition of $CF_4$ gas into the Ar/$Cl_2$ plasma. These results suggest that YF$_{x}$ compound acts as a sidewall passivants which reduce the sticking coefficient of chlorine on $YMnO_3$.

Silicon trench etching using inductively coupled Cl2/O2 and Cl2/N2 plasmas

  • Kim, Hyeon-Soo;Lee, Young-Jun;Young, Yeom-Geun
    • Journal of Korean Vacuum Science & Technology
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    • v.2 no.2
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    • pp.122-132
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    • 1998
  • Characteristics of inductively coupled Cl2/O2 and Cl2/N2 plasmas and their effects on the formation of submicron deep trench etching of single crystal silicon have been investigated using Langmuir probe, quadrupole mass spectrometer (QMS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM), Also, when silicon is etched with oxygen added chlorine plasmas, etch products recombined with oxygen such as SiClxOy emerged and Si-O bondings were found on the etched silicon surface. However, when nitrogen is added to chlorine, no etch products recombined with nitrogen nor Si-N bondings were found on the etched silicon surface. When deep silicon trenches were teached, the characteristics of Cl2/O2 and Cl2/N2 plasmas changed the thickness of the sidewall residue (passivation layer) and the etch profile. Vertical deep submicron trench profiles having the aspect ratio higher than 5 could be obtained by controlling the thickness of the residue formed on the trench sidewall using Cl2(O2/N2) plasmas.

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Forming process design for the twist reduction of an automotive front side member (프론트 사이드 멤버의 비틀림 저감을 위한 성형공정 설계)

  • Yin, Jeong-Je
    • Journal of the Korean Society of Mechanical Technology
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    • v.13 no.1
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    • pp.105-112
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    • 2011
  • Increasing needs for light weight and high safety in modern automobiles induced the wide application of high strength steels in automotive body structures- The main difficulty in the forming of sheet metal parts with high strength steel is the large amount of springback including sidewall curl and twist in channel shaped member parts- Among these shape defects, twist occurs frequently and requires numerous reworks on the dies to compensate the shape deviation- But until now, it seems to be no effective method to reduce the twist in the forming processes- In this study, a new forming process to reduce the twist deformation during the forming of automotive structural member was suggested- This method consists of forming and restriking of embosses on the sidewall around the stretch flanging area of the part- and was applied in the forming process design of an automotive front side inner member with high strength steel- To evaluate the effectiveness of the method, springback analysis using $Pamstampa^{tm}$ was done- Through the analysis results, the suggested method was proven to be effective in twist reduction of channel shaped parts with stretch flanging area.

Deterioration of Hiking Trails at Great Walksin New Zealand - Case Study on Tongariro Alpine Crossing, Routeburn, and Kepler Tracks - (뉴질랜드 그레이트 워크스의 탐방로 훼손 - 통가리로 알파인 크로싱, 루트번 및 케플러 트랙을 사례로 -)

  • Kim, Taeho
    • Journal of The Geomorphological Association of Korea
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    • v.24 no.4
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    • pp.103-115
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    • 2017
  • This paper shows the types of deteriorated hiking trails and degrading factors at three Great Walks such as Tongariro Alpine Crossing, Routeburn Track and Kepler Track in New Zealand. The deteriorated trails could be classified into gullying, widening, narrowing, branching and sidewall erosion. Department of Conservation carefully manages overland flows on trails for preventing surface erosion, thus the Great Walks show only a minor problem of gully on trails which is usually active in a mountainous area. Widening and branching of trails caused by tread erosion are not also developed due to the restriction of visitors as well as the management of rainwash. However, despite the detailed maintenance and prevention of an overuse of trails, some trails traversing steep slopes in a alpine zone under a periglacial environment are severely degraded along their sidewalls. It suggests that a unvegetated sidewall of trails has to be strictly managed in an early stage of occurrence and a slope-traversing section should be selected with more consideration when establishing a route of hiking trails.

Experimental study on the ground subsidence due to the excavation of a shallow tunnel (경사지반에서 얕은터널의 굴착에 따른 지표침하에 대한 실험적 연구)

  • Park, Chan Hyuk;Lee, Sang Duk
    • Journal of Korean Tunnelling and Underground Space Association
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    • v.19 no.5
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    • pp.761-778
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    • 2017
  • The need of the underground space for the infrastructures in urban area is increasing, and especially the demand for shallow tunnels increased drastically. It is very important that the shallow tunnel in the urban area should fulfill not only its own safety conditions but also the safety condition for the adjacent structures and the surrounding sub-structure. Most of the studies on the behavior of shallow tunnels concentrated only on their behaviors due to the local deformation of the tunnel, such as tunnel crown or tunnel sidewall. However, few studies have been performed for the behavior of the shallow tunnel due to the deformation of the entire tunnel. Therefore, in this study the behavior of the surrounding ground and the stability caused by deformation of the whole tunnel were studied. For that purpose, model tests were performed for the various ground surface slopes and the cover depth of the tunnel. The model tunnel (width 300 mm, height 200 mm) could be simulationally deformed in the vertical and horizontal direction. The model ground was built by using carbon rods of three types (4 mm, 6 mm, 8 mm), in various surface slopes and cover depth of the tunnel. The subsidence of ground surface, the load on the tunnel crown and the sidewall, and the transferred load near tunnel were measured. As results, the ground surface subsided above the tunnel, and its amount decreased as the distance from the tunnel increased. The influence of a tunnel ceased in a certain distance from the tunnel. At the inclined ground surface, the wider subsidence has been occurred. The loads on the crown and the sidewall were clearly visible, but there was no effect of the surface slope at a certain depth. The load transfer on the adjacent ground was larger when the cover depth (on the horizontal surface) was lager. The higher the level (on the inclined surface), the wider and smaller it appeared. On the shallow tunnel under inclined surface, the transfer of the ambient load on the tunnel sidewall (low side) was clearly visible.

Analysis of Pretreatment Prognostic Factors in Locally Advanced Carcinoma of the Uterine Cervix (국소진행된 자궁경부암에 있어서의 예후인자 분석)

  • Oh, Do-Hoon;Ha, Sung-Whan;Lee, Moo-Song
    • Radiation Oncology Journal
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    • v.10 no.1
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    • pp.69-76
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    • 1992
  • To identify pretreatment prognostic factors in locally advanced carcinoma of the uterine cervix, retrospective analysis was undertaken of 154 patients treated with curative radiation therapy at Seoul National University Hospital, from March 1979 through December 1986. According to FIGO classification, eight patients were stage IIIA, 134 were stage IIIB, and 12 were stage IVA. Five year locoregional control rate was $58\%$, $51\%$, and $27\%$ in stage IIIA, IIIB, and IVA, respectively. Five year disease free survival was $57\%$, $40\%$, and $25\%$ for each stage respectively. Five year overall survival was $67\%$, $51\%$, and $33\%$ in stage IIIA, IIIB, and IVA, respectively. In univariate analysis, fewer than or equal to four of pregnancies, initial hemoglobin of lower than $10\;g\%$, and pelvic sidewall invasion on CT were associated with poor locoregional control. Number of pregnancies, initial hemoglobin level, obstructive uropathy on intavenous pyelography (IVP), pelvic lymph node (LN) status on CT, and pelvic sidewall invasion on CT were significant factors in disease free survival. In terms of overall survival, pelvic sidewall invasion on CT and bladder invasion on CT were prognostically significant. In multivariate analysis, no factor was found to affect locoregional control and pelvic LN status was a sole significant factor affecting disease free survival. in terms of overall survival, the size.

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