Browse > Article
http://dx.doi.org/10.4313/JKEM.2002.15.4.314

Effect of CF4 Addition on Ferroelectric YMnO3Thin Film Etching  

박재화 (중앙대학교 전자전기공학부)
김경태 (중앙대학교 전자전기공학부)
김창일 (중앙대학교 전자전기공학부)
장의구 (중앙대학교 전자전기공학부)
이철인 (안산공대 전기과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.4, 2002 , pp. 314-318 More about this Journal
Abstract
The etching behaviors of the ferroelectric $YMnO_3$ thin films were studied by an inductively coupled plasma (ICP). The maximum etch rate of $YMnO_3$ thin film is 300 ${\AA}/min$ at Ar/$Cl_2$of 2/8, RF power of 800W, dc bias voltage of 200V, chamber pressure of 15mTorr and substrate temperature of $30^{\circ}C$. Addition of $CF_4$ gas decrease the etch rate of $YMnO_3$ thin film. From the results of XPS analysis, nonvolatile $YF_x$ compounds were found on the surface of $YMnO_3$ thin film which is etched in Ar/$Cl_2$/CF$_4$plasma. The etch profile of YMnO$_3$film is improved by addition of $CF_4$ gas into the Ar/$Cl_2$ plasma. These results suggest that YF$_{x}$ compound acts as a sidewall passivants which reduce the sticking coefficient of chlorine on $YMnO_3$.
Keywords
Etching; Ferroelectric; $YMnO_3$; ICP; Sidewall passivant;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
연도 인용수 순위
1 Metal-organic decomposition법에 의한 강유전성 YMnO₃박막의 제조 및 특성 /
[ 김제헌;강승구;김응수;김유택;심광보 ] / J. Korean Ceramic Society   과학기술학회마을
2 Pt/SBT/TMnO₃/Si(MFIS)-FET 구조를 위한 YMnO₃박막의 영향 /
[ 윤순길;최규정;신웅철;양정환 ] / 전기전자재료학회논문지   과학기술학회마을
3 Y/Mn 의 혼합비에 따른 YMnO₃ 세라믹의 소결 및 유전특성 /
[ 김재윤;김부근;김강언;정수태;조상희 ] / 전기전자재료학회논문지   과학기술학회마을
4 유도결합 플라즈마를 이용한 YMnO₃박막의 건식 식각 특성 연구 /
[ 김창일;장의구;민병준 ] / 전기전자재료학회논문지   과학기술학회마을
5 Dryetching Characteristics of Pb(Zr,Ti)O₃films in CF₄and Cl₂/CF₄inductively coupled plasmas /
[ Jin-Ki Jung;Won-Jong Lee ] / Jan. J. Appl. Phys.   DOI
6 Lowering the crystallization temperature of YMnO₃thin films by the sol-gel method using yttrium alkoxide /
[ H. Kitahata;K. Tadanaga;T. Minami;N. Fujimura;T. Ito ] / Jan. J. Appl. Phys.   DOI
7 Tungsten pattering for 1:1 x-ray masks /
[ C.W. Jurgensen;R.R. Kola;A.E. November;W.W. Tai;J. Frackoviak;L.E. Trimble;G.K. Celler ] / J. Vac. Sci. Technol.   DOI