• Title/Summary/Keyword: shadow mask

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A Study on AK Shadow Mask with Fe-Ni Alloy Coating for Flat CPTs

  • Kim, Sang-Mun
    • Journal of Information Display
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    • v.5 no.4
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    • pp.27-30
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    • 2004
  • This paper investigates the effects of coating such as Invar (Fe-36% Ni), Fe-Ni Alloys and $WO_3$ on the doming property of aluminum killed (AK) shadow masks, which may be used for flat CPTs. Invar and Fe-Ni Alloys are deposited on AK shadow mask in plasma atmosphere and annealed. $WO_3$ is screen-printed on the deposited layer. The coating is observed to cause a decrease in the doming property of the shadow masks due to their lower thermal expansion coefficients and anti-doming properties.

Structural Design of a Cathode-ray Tube (CRT) to Improve its Mechanical Shockproof Character

  • Park, Sang-Hu;Kim, Won-Jin
    • Journal of Mechanical Science and Technology
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    • v.20 no.9
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    • pp.1361-1370
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    • 2006
  • An electronic beam mis-landing phenomenon on the RGB (red/green/blue) -fluorescent surface has been considered as one of serious problems to be solved in cathode-ray tube (CRT), which is generally caused by mechanical shock and vibration. In this work, structural design concepts on the major parts of the CRT, such as a frame, a shadow mask, and a spring, are studied to improve the mechanical shockproof character of a CRT by FEM-analyses and experimental approaches ; a frame is newly designed to have strength employing the double-corner-beads which reduces considerably the distortion of the frame and the shadow mask : the edge-bead of a shadow-mask is redesigned to maintain the wide curved surface of a shadow-mask after mechanical shock : finally, a spring supporting the frame and the shadow-mask is designed to have enough flexibility along drop-direction. As an example, a conventional type of a 15inch CRT was utilized to demonstrate the feasibility and usefulness of this work. Overall, some favorable information on the structural design of the CRT is achieved, and the mechanical shockproof character of a 15-inch CRT is improved in the degree of 3G $(1G=9.81m/s^2)$ as an average-value.

Electrode-Evaporation Method of III-nitride Vertical-type Single Chip LEDs

  • Kim, Kyoung Hwa;Ahn, Hyung Soo;Jeon, Injun;Cho, Chae Ryong;Jeon, Hunsoo;Yang, Min;Yi, Sam Nyung;Kim, Suck-Whan
    • Journal of the Korean Physical Society
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    • v.73 no.9
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    • pp.1346-1350
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    • 2018
  • An electrode-evaporation technology on both the top and bottom sides of the bare vertical-type single chip separated from the traditional substrate by cooling, was developed for III-nitride vertical-type single chip LEDs with thick GaN epilayer. The post-process of the cooling step was followed by sorting the bare vertical-type single chip LEDs into the holes in a pocket-type shadow mask for deposition of the electrodes at the top and bottom sides of bare vertical-type single chip LEDs without the traditional substrate for electrode evaporation technology for vertical-type single chip LEDs. The variation in size of the hole between the designed shadow mask and the deposited electrodes owing to the use of the designed pocket-type shadow mask is investigated. Furthermore, the electrical and the optical properties of bare vertical-type single chip LEDs deposited with two different shapes of n-type electrodes using the pocket-type shadow mask are investigated to explore the possibility of the e-beam evaporation method.

Effects of electron reflection for the tungsten oxide film coated on shadow mask in CRT (CRT Shadow mask 위에 도포된 산화텅스텐 피막의 전자반사 효과)

  • 김상문;배준호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.129-132
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    • 1998
  • In this paper, we have studied the effect of electron reflection on shadow mask on which tungsten oxide film is coated and have studied the variation of beam mislanding with coating thickness in CRT. We found the method to be able to control coating thicknessed and optimum coating thickness of tungsten oxide film was 1∼2$\mu\textrm{m}$. Mislanding of electron beam was reduced about 20∼48% with increasing coating thickness in CRT

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Electron Reflecting Layer with the WO3-ZnS:Cu.Al-PbO-SiO2 System Concerned in Doming Property of Shadow Mask in CRT

  • Kim, Sang-Mun;Cho, Yoon-Lae
    • Journal of the Korean Ceramic Society
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    • v.39 no.12
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    • pp.1124-1127
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    • 2002
  • In this paper, we studied the effects of the electron reflection on shadow mask on which the electron reflecting materials with $WO_3-ZnS:Cu.Al-PbO-SiO_2$ system were screen-printed and we evaluated the variation of the electron beam mislanding in CRT. As a result, the green emitted spectra on the electron reflecting layer are observed due to the transformation of the electron energy, when the electron impacted on shadow mask. The beam mislanding is reduced about 40% in comperision with that of CRT made by the conventional method.

PM OLED Fabrication with New Method of Metal Cathode Deposition Using Shadow Mask

  • Lee, Ho-Chul;Kang, Seong-Jong;Yi, Jung-Yoon;Kim, Ho-Eoun;Kwon, Oh-June;Hwang, Jo-Il;Kim, Jeong-Moon;Roh, Byeong-Gyu;Kim, Woo-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.987-989
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    • 2006
  • 1.52" $130(RGB){\times}130$ full color PM OLED device with $70\;{\mu}m{\times}210\;{\mu}m$ of sub-pixel pitch was fabricated using shadow mask method for metal cathode deposition. Instead of conventional patterning process to form cathode separator via photolithography, regularly patterned shadow mask was applied to deposit metal cathode in this OLED display. Metal cathode was patterned via 2-step evaporation using shadow mask with shape of rectangular stripe and its alignment margin is $2.5\;{\mu}m$. Technical advantages of this method include reduction of process time according to skipping over photolithographic process for cathode separator and minimizing pixel shrinkage caused by PR cathode separator as well as improving lifetime of OLED device.

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FIB milling on nanostencil membrane (나노스텐실 제작을 위한 FIB 밀링 특성)

  • Kim G.M.;Chung S.I.;Oh H.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.318-321
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    • 2005
  • FIB (Focused ion Beam) milling on a 500-nm-thick silicon nitride membrane was studied in order to fabricate a high-resolution shadow mask, or called a nanostencil. The silicon nitride membrane was fabricated by MEMS processes of LPCVD, photolithography, ICP etching and bulk silicon etching. The apertures made by FIB milling and normal photolithography were compared. The square metal pattern deposited through FIB milled shadow mask showed 6 times smaller comer radius than the case of photolithography. The results show high resolution patterning could be achieved by local deposition through FIB milled shadow-mask.

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High performance γ-ray imager using dual anti-mask method for the investigation of high-energy nuclear materials

  • Lee, Taewoong;Lee, Wonho
    • Nuclear Engineering and Technology
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    • v.53 no.7
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    • pp.2371-2376
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    • 2021
  • As the γ-ray energy increases, a reconstructed image becomes noisy and blurred due to the penetration of the γ-ray through the coded mask. Therefore, the thickness of the coded mask was increased for high energy regions, resulting in severely decreased the performance of the detection efficiency due to self-collimation by the mask. In order to overcome the limitation, a modified uniformly redundant array γ-ray imaging system using dual anti-mask method was developed, and its performance was compared and evaluated in high-energy radiation region. In the dual anti-mask method, the two shadow images, including the subtraction of background events, can simultaneously contribute to the reconstructed image. Moreover, the reconstructed images using each shadow image were integrated using a hybrid update maximum likelihood expectation maximization (h-MLEM). Using the quantitative evaluation method, the performance of the dual anti-mask method was compared with the previously developed collimation methods. As the shadow image which was subtracted the background events leads to a higher-quality reconstructed image, the reconstructed image of the dual anti-mask method showed high performance among the three collimation methods. Finally, the quantitative evaluation method proves that the performance of the dual anti-mask method was better than that of the previously reconstruction methods.

Sludge Thickening Performance of the Filtration Bio-reactor Equipped with Shadow Mask Filter Module (Shadow mask 여과 모듈을 이용한 슬러지 농축 특성)

  • Jung, Yong-Jun;Kwon, Koo-Ho;Min, Kyung-Sok
    • Journal of Korean Society on Water Environment
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    • v.21 no.1
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    • pp.29-33
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    • 2005
  • In order to recycle the waste material and to develop the thickening unit of waste activated sludge from wastewater treatment facilities, the filtration bio-reactor equipped with a shadow mask filter module was employed for this work from which the operating properties and parameters were drawn. The sludge thickening and filtration unit is made of cylindrical acryl tank(12cm i.d. ${\times}$ 58cm height: working volume of 6L), where the flat-sheet type of shadow mask filter module(pore size: 220~250um, opening area: 34.8~39.6%) was installed and the effluent was withdrawn from the effluent port at the lowest point of the reactor, and the filtration was performed only by the hydraulic pressure. For evaluating the operating performance of this reactor, some parameters such as the solid-liquid separation of different biomass concentrations, the water quality of filtrate, the aeration cleaning time and the cleaning effect were investigated. Depending on the MLSS concentrations, the different time to withdraw 3L of filtrate was required in which the longer filtration time was necessary for the higher MLSS concentrations caused by the thicker formation of cake layer: 40 minutes for 5,000 mg/L, 70 minutes for 10,000 mg/L and 100 minutes for 15,000 mg/L, where the concentrations of SS were 8.9, 6.7 and 6.5 mg/L, respectively. Under the same operating conditions (the intensity of aeration cleaning: 80 L/min, MLSS: 10,000 mg/L), the proper aeration cleaning time was revealed 30 seconds, and the stable formation of cake layer was in the range of 10 to 15 minutes. Therefore, the shadow mask considered as a waste material can be of use as a filter material for the sludge thickening system.

Technology of Stip Rolling of Shadow Mask Steel Plate By Reversing Cold Rolling Mill (가역식 냉간압연기의 Shadow Mask재 압연기술)

  • 김광수;박성권;이중웅;김종호
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 1999.08a
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    • pp.403-411
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    • 1999
  • The steel plate for shadow mask is used in a Cathode-ray tube of TV monitor and is the strictest product in surface quality because hundreds thousand of holes are perforated in a plane of 25 ${\times}$25 inches. To mass-produce this product, a reversible cold rolling mill for silicon steel was used and the rolling technology and the activity for quality improvement are described in this work. Because the steel plate is a mild steel, which is very sensitive to strip-breakage even in a low tension, we reset the minimum tension values matching to the operating conditions. The roll mark due to the multi-segmented araangement of shape controlling roll was prevented by hardening the intermediate shape controlling roll and by changing the existing working-roll into a HSS (Hig Speed Steel) roll. The scratch caused by the speed difference between a idle roll and a strip was prevented by increasing the roll roughness. With these activities, the steel plate for shadow mask can be stable. The continuous improvement of quality is, however, required for the customer satisfaction both of domestic and overseas market.

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