Study on Electrical Characteristics of Hafnium Silicate Films with Low Temperature O2 Annealing (저온 Osub2 어닐링 공정을 통한 HfSixOy의 전기적 특성 개선)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.24 no.5
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- pp.370-373
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- 2011