• 제목/요약/키워드: rf-electrode

검색결과 418건 처리시간 0.024초

ST 세라믹 박막의 Ca 치환량에 따른 특성 (Properties with Ca Substitutional Contents of ST Ceramic Thin Film)

  • 오용철;김진사;조춘남;신철기;송민종;최운식;소병문;김충혁
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.160-161
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    • 2005
  • The $(Sr_{1-x}Ca_x)TiO_3$(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/$SiO_2$/Si) using RF sputtering method with substitutional contents of Ca. The optimum conditions of RF power and $Ar/O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin film was about 18.75$[{\AA}/min]$. The dielectric constant was increased with increasing the substitutional contents of Ca, while it was decreased if the substitutional contents of Ca exceeded over 15[mol%]. All SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency is observed above 200[kHz].

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Synthesis and Characterization of Al-Doped Zinc Oxide Films by an Radio Frequency Magnetron Sputtering Method for Transparent Electrode Applications

  • Seo, Jae-Keun;Ko, Ki-Han;Cho, Hyung-Jun;Choi, Won-Seok;Park, Mun-Gi;Seo, Kyung-Han;Park, Young;Lim, Dong-Gun
    • Transactions on Electrical and Electronic Materials
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    • 제11권1호
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    • pp.29-32
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    • 2010
  • In this study, transparent and conductive Al-doped zinc oxide (AZO) films were prepared on a glass substrate by an radio frequency (RF) magnetron sputtering method using a 150-nm-thick AZO target (Al: 2 wt.%) at room temperature. We investigated the effects of RF power between 100-350 W (in steps of 50 W) on the structural, electrical, and optical properties of the AZO films. The thickness and cross-sectional images of the films were observed by field emission scanning electron microscopy. The thicknesses of all films were kept constant at 150 nm and grown on a glass substrate. The grain sizes of the AZO films were determined with the X-ray diffraction by using the Scherrer' equation, and their electrical properties were investigated using a Hall effect electronic transport measurement system. The transmittance of the AZO films was also measured by an ultraviolet-visible spectrometer.

Simulation of Capacitively Coupled RF Plasma; Effect of Secondary Electron Emission - Formation of Electron Shock Wave

  • Park, Seung-Kyu;Kim, Heon-Chang
    • 반도체디스플레이기술학회지
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    • 제8권3호
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    • pp.31-37
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    • 2009
  • This paper presents one and two dimensional simulation results with discontinuous features (shocks) of capacitively coupled rf plasmas. The model consists of the first two and three moments of the Boltzmann equation for the ion and electron fluids respectively, coupled to Poisson's equation for the self-consistent electric field. The local field and drift-diffusion approximations are not employed, and as a result the charged species conservation equations are hyperbolic in nature. Hyperbolic equations may develop discontinuous solutions even if their initial conditions are smooth. Indeed, in this work, secondary electron emission is shown to produce transient electron shock waves. These shocks form at the boundary between the cathodic sheath (CS) and the quasi-neutral (QN) bulk region. In the CS, the electrons emitted from the electrode are accelerated to supersonic velocities due to the large electric field. On the other hand, in the QN the electric field is not significant and electrons have small directed velocities. Therefore, at the transition between these regions, the electron fluid decelerates from a supersonic to a subsonic velocity in the direction of flow and a jump in the electron velocity develops. The presented numerical results are consistent with both experimental observations and kinetic simulations.

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하부전극 변화에 따른 PZT 박막 특성에 관한 연구 (The effects of PZT thin film capacitor with various bottom electrode)

  • 박영;정규원;임승혁;송준태
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1986-1988
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    • 1999
  • Ferroelectric lead zirconate titanate(PZT) thin films were prepared on various bottom electrodes by rf magnetron sputtering methode. The structural phase and surface morphology of the PZT thin films were largely affected by the bottom electrodes. P-E curves of PZT thin films deposited on Pt. $RuO_2$ and Ru/$RuO_2$ bottom electrode showed typical P-E hysteresis loop. The measure values of $P_r,\;E_c$ of the Ru/PZT/Ru/$RuO_2$ capacitor were $16.9{\mu}C/Cm^2$, 140kV/ cm, respectively. The Ru/PZT/Ru/$RuO_2$ capacitors were fatigue free uP to nearly $10^9$ switching cycle but Pt/PZT/Pt capacitor showed 34% degradation uP to $10^9$ switching cycle.

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$(Ba_{0.5}Sr_{0.5})TiO_3$ 박막의 상부전극 RTA에 따른 계면 특성 변화 (Effect of RTA on the interfacial Properties of Top Electrodes on $(Ba_{0.5}Sr_{0.5})TiO_3$)

  • 전장배;김덕규;소순진;박춘배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.740-742
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    • 1998
  • In this paper, we described the effect of rapid thermal annealing on the electrical properties of interfacial layer between various top electrodes and $(Ba_{0.5}Sr_{0.5})TiO_3$ thin films. BST thin films were fabricated on Pt/TiN/$SiO_2$/Si substrate by RF magnetron sputtering technique. AI, Ag, and Cu films for the formation of top electrode were deposited on BST thin films by thermal evaporator. Top electrodes/BST/Pt capacitor annealed with rapid thermal annealing at various temperature. In $(Ba_{0.5}Sr_{0.5})TiO_3$ thin films with Cu top electrode annealed at $500^{\circ}C$, the dielectric constant was measured to the value of 366 at 1.2 [kHz] and the leakage current was obtained to the value of $5.85{\times}10^{-7}\;[A/cm^2}$ at the forward bias of 2 [V].

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AZO 전극을 갖는 GaP LED의 외부양자효율 향상에 관한 연구 (A Study of Increase External Quantum Efficiency of GaP LED with AZO Electrode)

  • 김경민;진은미;김덕규;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.77-78
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    • 2006
  • In order to increase the efficiency of LED, transparent electrodes should be also developed. also suitable anti-reflection coating (ARC) is necessary for practical device applications. In our paper, Al-doped ZnO (AZO) films were fabricated by sputtering on GaP substrate(wavelength:620nm). Choosing optimum substrate temperature and sputtering rate, high quality AZO films were formed. We confirmed that the surface and electrical properties, which implemented using the methods of AFM, Hall measurement. The properties of AZO thin films especially depended on the thickness. We presumed that the change of the increase the external quantum efficiency of LED according to the AZO thin film of thickness.

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스퍼터링 방법으로 증착한 HfO$_2$ MIM 커패시터의 유전특성 (Characteristics of Metal-Insulator-Metal Capacitors with HfO$_2$ Deposited by Sputtering)

  • 정석원;정성혜;강대진;노용한
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.362-365
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    • 2002
  • Hf thin films were deposited on bottom metal using a RF magnetron sputtering method followed by oxidation and annealing in O$_2$ and N$_2$ ambient, respectively. Various top metal electrodes (i.e., Al, Au, and Cu) were deposited by evaporation, and their roles on physical and electrical properties were investigated. Using the XRD, SEM and AFM techniques, we confirmed that the grain size of HfO$_2$ thin films enlarges as a function of oxidation temperature, increasing dielectric constant. However, other electrical properties (e.g., tan) deteriorateas a consequence. The dielectric constant and tan of HfO$_2$ thin films oxidized at 500 $^{\circ}C$ were 17-25 and 3${\times}$10-3 - 2x10-2, respectively, in the frequency range of 1 Hz to 1 MHz. The leakage current density was less than 1${\times}$10-8A/cm2 up to 0.7 MV/cm. In addition, electrical properties of HfO$_2$ thin films (e.g., the dielectric constant, leakage current and tan $\delta$) depend on top metal electrode. We showed that Al top metal electrode results in the best result.

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Ba$^{0.7}Sr^{0.3}TiO^{3}$ 박막 커패시퍼의 마이코로파 측정 (Microwave measurement of Ba$^{0.7}Sr^{0.3}TiO^{3}$ thin film capacitors)

  • 장병택;차선용;이승훈;곽동화;이희철;유병곤;백종태;유형준
    • 전자공학회논문지A
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    • 제33A권2호
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    • pp.114-121
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    • 1996
  • Thin film Ba$^{0.7}Sr^{0.3}TiO^{3}$ (BST) capacitors were fabricated on SiO$_{2}$/Si substrates by RF magnetron sputtering method and characterized at microwave frequencies ranging from 40 MHz to 1GHz to examine the dielectric dispersion of the capacitors. The BST thin films were electrode material of BST thin films capacitor which is known as one of the best electrode materials for BST films. 50$\AA$-thick titanium (Ti) layers were introduced to increase adhesion between bottom Pt and SiO$_{2}$. The leakage current density of the capacitors was about 1.7${\times}10^{7}A/cm^{2}$ at 1.5V and the dielectric constant was about 140 at 1MHz. Microwave measurement patterns having a coplanar waveguide type were fabricated and their S parameters were measured using network analyzer. After de-embedding parasitic components in microwave measurement patterns nearly frequency-invariant dielectric constant of about 120 was extracted in the measurement range of 40 MHz to 1 GHz.

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요소측정용 바이오센서를 위한 Cu-doped PPy electrode의 제작 (Fabrication of Cu-doped PPy electrode for urea sensor)

  • 양정훈;진준형;송민정;윤동화;민남기;홍석인
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 하계학술대회 논문집 C
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    • pp.2000-2002
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    • 2002
  • 신장병의 조기진단을 위해서 체내의 요소 농도의 정확한 측정은 매우 중요하며, 이러한 이유에서 많은 연구자들은 보다 빠르고 정확한 체내의 요소농도 측정을 위한 바이오센서를 개발 중이다. 본 논문은 반도체 공정을 이용하여 산화막(4.000${\AA}$)이 성장된 p-형 실리콘 웨이퍼를 사용하였다. RF sputter를 사용하여 티타늄과 백금을 증착한 백금 박막전극을 제작하였다. 그 위에 전도성 고분자인 Polypyrrole(PPy)과 전도도를 증가시키기 위하여 구리를 도펀트로 사용 scan rate 40mV/S $0.8{\sim}-0.8V$ 전위영역에서 산화적 전기 중합법 (anodical electropolymerization)을 이용하여 전극을 형성하였다. 요소를 2개의 암모늄 이온과 1개의 탄산 이온으로의 가수분해반응을 촉매하는 효소로써 유레이즈(urease)를 전기적 흡착방법을 이용하여 고정화하고 이에 요소농도의 변화에 대하여 시간대 전류법 (chronoamperometry:CA)을 사용하여 감도를 측정하였다. 최적화된 조건하에서 요소농도에 비례하여 Cu-doped PPy electrode로부터 얻어진 확산한계전류는 $4.5{\mu}A$/decade의 기울기를 나타내었다. 전극의 표면은 SEM(Scanning Electron Microscopy)과 EDX(Energy Dispersive X-Ray Spectrometer)를 이용하여 분석 하였다.

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Improved Electrical Properties of Indium Gallium Zinc Oxide Thin-Film Transistors by AZO/Ag/AZO Multilayer Electrode

  • No, Young-Soo;Yang, Jeong-Do;Park, Dong-Hee;Kim, Tae-Whan;Choi, Ji-Won;Choi, Won-Kook
    • 센서학회지
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    • 제22권2호
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    • pp.105-110
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    • 2013
  • We fabricated an a-IGZO thin film transistor (TFT) with AZO/Ag/AZO transparent multilayer source/drain contacts by rf magnetron sputtering. a-IGZO TFT with AZO/Ag/AZO multilayer S/D electrodes (W/L = 400/50 ${\mu}m$) showed a subs-threshold swing of 3.78 V/dec, a minimum off-current of $10^{-12}$ A, a threshold voltage of 0.41 V, a field effect mobility of $10.86cm^2/Vs$, and an on/off ratio of $9{\times}10^9$. From the ultraviolet photoemission spectroscopy, it was revealed that the enhanced electrical performance resulted from the lowering of the Schottky barrier between a-IGZO and Ag due to the insertion of an AZO layer and thus the AZO/Ag/AZO multilayer would be very appropriate for a promising S/D contact material for the fabrication of high performance TFTs.