• Title/Summary/Keyword: rf-electrode

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Frequency Characteristics of a FBAR using ZnO Thin Film (ZnO 압전박막을 이용한 FBAR의 주파수 응답특성)

  • Do, Seung-Woo;Jang, Cheol-Yeong;Choi, Hyun-Chul;Lee, Yong-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.08a
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    • pp.94-97
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    • 2003
  • This study uses ZnO thin film as a piezoelectric material and Pt as bottom electrode for FBAR (film bulk acoustic resonator) device. ZnO thin film and Pt were deposited by RF-magnetron sputtering method. ZnO thin film and Pt were oriented to c-axis. Top electrode Al was deposited by thermal evaporation. The membrane was formed of bulk micromachining. The FBAR was evaluated by XRD, SEM and electrical characterization. The resonant frequency was measured by HP 8753C Network Analyzer. A fabricated FBAR device exhibited a resonant frequency of 700 MHz ~ 1.5 GHz. When bottom electrode and top electrode thickness were fixed, the resonant frequency was increased as decreasing ZnO thin film thickness.

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A Study on the Electrode formation of an Organic EL Devices using the RF Plasma (RF 플라즈마를 이용한 유기 EL 소자의 전극형성에 관한 연구)

  • 이은학
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.2
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    • pp.228-235
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    • 2004
  • In this thesis, it is designed efficient electrode formation on the organic luminescent device. ITO electrode is treated with $O_2$plasma. In order to inject hole efficiently, there is proposed the shape of anode that inserted plasma polymerized films as buffer layer between anode and organic layer using thiophene monomer. It is realized efficiently electron injection to aluminum due to introduce the quantum well in cathode. In the case of device inserted the buffer layer by using the plasma poiymerization after $O_2$plasma processing for ITO transparent electrode, since it forms the stable interface and reduce the moving speed of hole, the recombination of hole and electronic ate made in the omitting layer. Compared with the devices without buffer layer, the turn-on voltage was lowered by 1.0(V) doc to the introduction of buffer layer Since the quantum well structure is formed in front of cathode to optimize the tunneling effect, there is improved the power efficiency more than two times.

Voltage-Controlled Photonic RF True-Time Delay Using a Tapered Chirped Fiber Bragg Grating (테이퍼 구조를 갖는 광섬유 브래그 격자를 이용한 전압에 의하여 제어 가능한 광학적 실시간 지연 소자)

  • Chae, Ho-Dong;Lee, Sang-Shin
    • Korean Journal of Optics and Photonics
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    • v.16 no.2
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    • pp.133-137
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    • 2005
  • A photonic RF true-time delay using a tapered chirped fiber Bragg grating coated with a heating electrode has been proposed and fabricated. For an RF signal carried over an optical signal, the time delay has been achieved by controlling the voltage applied to the electrode and thus adjusting its reflection positions from the fiber grating through the thermooptic effect. It features continuous voltage-controlled operation, requiring no mechanical perturbation and no moving parts. The measured time delay was about 120 ps with the electrical power consumption of $250{\cal}mW$.

Continuous Photonic RF True-time Delay Using a Side-polished Fiber Bragg Grating with Heating Electrode (측면 연마된 광섬유 브래그 격자를 이용한 연속적인 광학적 RF 실시간 지연)

  • Chae, Ho-Dong;Kim, Do-Hwan;Kim, Hyoung-Jun;Lee, Sang-Shin;Kim, Hyo-Kyeom;Lee, Kyu-Hyo;Kim, Kwang-Taek
    • Korean Journal of Optics and Photonics
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    • v.15 no.6
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    • pp.591-596
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    • 2004
  • In this paper, a photonic RF true-time delay based on a partially side-polished fiber Bragg grating with heating electrode has been proposed and fabricated. It features continuous voltage-controlled operation, requiring no mechanical perturbation and no moving parts. For an RF signal carried over an optical signal, the time delay has been obtained by controlling the voltage applied to the electrode and thus adjusting its reflection positions from the fiber grating via the thermooptic effect. The achieved time delay is about 100 ps with the electrical power consumption of 280 mW.

RF MEMS 기법을 이용한 US PCS 대역 FBAR BPF 개발

  • 박희대
    • The Proceeding of the Korean Institute of Electromagnetic Engineering and Science
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    • v.14 no.3
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    • pp.15-19
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    • 2003
  • In This paper, we developed 1.96 GHz air gap type FBAR BPF using ZnO as piezoelectric sputtered by RF magnetron at room temperature. FBAR BPF was fabricated by sputtering bottom electrode (Al), ZnO as piezoelectric and top electrode (Mo) on Si wafer one by one with RF magnetron sputter, then Si was dry etched to make an air hole. XRD test result of fabricated FBAR BPF showed that ZnO crystal was well pre-oriented as (002) and sigma value of XRC was 1.018. IL(Insertion loss) showed excellent result as 1 dB.

Characterisitics of RF/DC Sputter Grown-ITO/Ag/ITO Thin Films for Transparent Conducting Electrode (RF/DC 스퍼티 성장한 ITO/Ag/ITO 투명전극 박막의 특성 연구)

  • Lee, Youngjae;Kim, Jeha
    • Current Photovoltaic Research
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    • v.10 no.1
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    • pp.28-32
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    • 2022
  • We investigated the optical and electrical characteristics of ITO/Ag/ITO (IAI) 3-layer thin films prepared by using RF/DC sputtering. To measure the thickness of all thin film samples, we used scanning electron microscopy. As a function of Ag thickness we characterized the optical transmittance and sheet resistance of the IAI samples by using UV-Visible spectroscopy and Hall measurement system, respectively. While the thickness of both ITO thin films in the 3-layered IAI samples were fixed at 50 nm, we varied Ag layer thickness in the range of 0 nm to 11 nm. The optical transmittance and sheet resistance of the 3-layered IAI thin films were found to vary strongly with the thickness of Ag film in the ITO (50 nm)/Ag(t0)/ITO (50 nm) thin film. For the best transparent conducting oxide (TCO) electrode, we obtained a 3-layered ITO (50 nm)/Ag (t0 = 8.5 nm)/ITO (50 nm) that showed an avrage optical transmittance, AVT = 90.12% in the visible light region of 380 nm to 780 nm and the sheet resistance, R = 7.24 Ω/□.

RF Glow Discharge and TiN Thin Film Characteristics in a Plane Electrode System (평판형 전극계의 RF 글로우 방전특성 및 TiN 박막특성)

  • Kwak, D.J.;Kim, D.H.;Kim, H.J.;Park, C.H.
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1838-1840
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    • 1996
  • In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.

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The characteristics of Silent discharge using RF power source (고주파 전원인가에 의한 무성방전 특성에 관한 연구)

  • Lee, Sang-Keun;Lee, Dong-Wook;Chun, Byung-Joon;Song, Hyun-Jig;Lee, Kwang-Sik;Kwon, Hyuk-Han
    • Proceedings of the KIEE Conference
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    • 2000.11c
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    • pp.570-572
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    • 2000
  • The characteristics of ozone generation were investigated in accordance with varying the diameter of internal electrode in an ozonizer using RF power source. The characteristics of ozone generation were improved with the diameter of internal electrode increased, but thermal loss was increased. Therefore, it was found that it is inevitable that the cooler has to be installed in an ozonizer which uses RF power source.

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