Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2002.05a
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- Pages.133-133
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- 2002
Characteristics of NiCr/TaSiN/poly-Si Electrode Structure for Semiconductor Memory Device by rf magnetron sputtering
rf magnetron sputtering 방법을 이용한 반도체 메모리 소자용 NiCr/TaSiN/poly-Si 전극 구조의 특성평가
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