• Title/Summary/Keyword: rf magnetron

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Structural and Electrical Properties of a-axis ZnO:Al Thin Films Grown by RF Magnetron Sputtering

  • Bong, Seong-Jae;Kim, Seon-Bo;An, Si-Hyeon;Park, Hyeong-Sik;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.329.1-329.1
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    • 2014
  • In this paper, we report electrical, optical and structural properties of Al-doped zinc oxide (AZO) thin films deposited at different substrate temperatures and pressures. The films were prepared by radio frequency (RF) magnetron sputtering on glass substrates in argon (Ar) ambient. The X-ray diffraction analysis showed that the AZO films deposited at room temperature (RT) and 20 Pa were mostly oriented along a-axis with preferred orientation along (100) direction. There was an improvement in resistivity ($3.7{\times}10^{-3}{\Omega}-cm$) transmittance (95%) at constant substrate temperature (RT) and working pressure (20 Pa) using the Hall-effect measurement system and UV-vis spectroscopy, respectively. Our results have promising applications in low-cost transparent electronics, such as the thin-film solar cells and thin-film transistors due to favourable deposition conditions. Furthermore our film deposition method offers a procedure for preparing highly oriented (100) AZO films.

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Study on ZnS Thin Films Prepared by RF Magnetron Sputtering

  • Hwang, Dong-Hyeon;An, Jeong-Hun;Son, Yeong-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.399-399
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    • 2011
  • We studied the structural and optical characterization of zinc sulfide (ZnS) thin films by RF magnetron sputtering on glass substrates. The substrate temperature was varied in the range of 100$^{\circ}C$ to 400$^{\circ}C$. The XRD analyses indicated that ZnS films had cubic structures with (111) preferential orientation and grain size varied from 20 to 60 nm, increasing with substrate temperatures. The optical properties were carried out by UV-visible spectrophotometer. Transmission measurement showed that the films had more than 70% transmittance in the wavelength larger than 400 nm, and the absorption edge shifted to shorter wavelength with the increase of substrate temperatures.

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Surface morphology and electrical properties of ITO thin films fabricated by RF magnetron sputtering method (고주파 마그네트론 스퍼터링 방법으로 제작한 ITO 박막의 표면 형태 및 전기적 특성)

  • Kwon, Sung-Yeol
    • Journal of Sensor Science and Technology
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    • v.15 no.1
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    • pp.71-75
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    • 2006
  • ITO (Indium Tin Oxide) thin films have been fabricated by rf magnetron sputtering with a target of a mixture $In_{2}O_{3]$(90 wt%) and $SnO_{2}$ (10 wt%). ITO films were sputtered with substrate temperature from 30 to $300^{\circ}C$ and working pressure from 1 to under 0.1 m Torr. ITO thin films surface morphology and electrical properties analyzed by SEM Photographs, and X-ray diffractions patterns. The resistivity of ITO thin films was $1.8{\times}10^{-5}{\Omega}/cm$.

Effect of Post Deposition Annealing Temperature on the Structural, Optical and Electrical Properties of GZO Films Prepared by RF Magnetron Sputtering (RF 마그네트론 스퍼터링으로 증착 된 GZO 박막의 진공 열처리온도에 따른 구조적, 광학적, 전기적 특성 연구)

  • Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.24 no.4
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    • pp.199-202
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    • 2011
  • Ga doped ZnO thin films were deposited with RF magnetron sputtering on glass substrate without intentional substrate heating and then the effect of post deposition annealing temperature on the structural, optical and electrical properties of the films was investigated. The post deposition annealing process was conducted for 30 minutes in a vacuum of $1{\times}10^{-3}$ Torr and the vacuum annealing temperatures were 150 and $300^{\circ}C$, respectively. As increase annealing temperature, GZO films show the increment of the prefer orientation of ZnO (002) diffraction peak in the XRD pattern and the optical transmittance in a visible wave region was also increased, while the electrical sheet resistance was decreased. The figure of merit obtained in this study means that GZO films which vacuum annealed at $300^{\circ}C$ have the highest optoelectrical performance in this study.

Electrical properties of NiCr thin films deposited by rf magnetron sputtering (RF magnetron sputtering 방법으로 제작한 NiCr 박막의 전기적특성)

  • Kim, Dae-Yeon;Kwon, Jeong-Ho;Jeong, Yeon-Hak;Lee, Jae-Shin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.411-415
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    • 2002
  • Precision resistors were prepared by controlling the concentration of Ni and Cr deposited on cylindrical alumina substrates (diameter: 1.7mm, length: 5.5mm). Deposited films were analyzed with FESEM, AES, and AFM. As the amount of Cr in the film increases, the TCR was shifted to negative direction.

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Magnesium Thin Films Possessing New Corrosion Resistance by RF Magnetron Sputtering Method

  • Lee, M.H.;Yun, Y.S.;Kim, K.J.;Moon, K.M.;Bae, I.Y.
    • Corrosion Science and Technology
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    • v.3 no.4
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    • pp.148-153
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    • 2004
  • Magnesium thin flims were prepared on cold-rolled steel substrates by RF magnetron sputtering technique. The influence of argon gas pressure and substrate bias voltage on their crystal orientation and morphology of the coated films were investigated by scanning electron microscopy (SEM) and X-ray diffraction, respectively. And the effect of crystal orientation and morphology of magnesium films on corrosion behaviors was estimated by measuring anodic polarization curves in deaerated 3%NaCl solution. From the experimental results, all the sputtered magnesium films showed obviously good corrosion resistance to compare with 99.99% magnesium target of the sputter-evaporation metal. Finally it was shown that the Corrosion-resistance of magnesium films can be improved greatly by controlling the crystal orientation and morphology with effective use of the plasma sputtering technique.

Characteristics of rapid-thermal-annealed $YBa_2Cu_3O_{7-x}$ superconducting thin-films grown by rf magnetron sputtering (RF magnetron 스퍼터링과 급속 열처리에 의한$YBa_2Cu_3O_{7-x}$)

  • 신현용
    • Electrical & Electronic Materials
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    • v.6 no.4
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    • pp.318-323
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    • 1993
  • 본 연구에서는 rf magnetron 스퍼터링으로 (100) 사파이어 기판에 퇴적시킨 YBa$_{2}$Cu$_{3}$$O_{7-x}$박막을 열처리하기 위하여 급속 열처리 방법을 사용하였다. XRD, AES, 그리고 4단자 비저항 측정법을 사용하여 급속 열처리로 형성시킨 초전도체 박막과 기판사이의 상호확산을 조사하였다. 제조된 박막은 91K에서 Tc(onset)를 80K에서 Tc(zero)를 나타내었다. AES 분석 결과, 급속 열처리 방법의 경우 YBa$_{2}$Cu$_{3}$$O_{7-x}$ HTS 박막과 기판사이의 계면에서 항호확산이 감소되는 것을 확인하였다. XRD 분석 결과, 급속 열처리에 의해 형성된 HTS 박막은 주로 c-축이 기판의 표면에 수직인 구조를 가지고 있었다.

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Effect of Heat Treatment Method on Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering

  • Kim, Deok Kyu
    • Applied Science and Convergence Technology
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    • v.26 no.2
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    • pp.30-33
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    • 2017
  • ZnO thin films which were deposited by RF magnetron sputtering system were annealed by furnace and insitu heat treatment methods. We investigated the effect of heat treatment method on physical properties of ZnO thin films. The structural and optical properties of ZnO thin films were improved by heat treatment. Through the annealing treatment of ZnO film by furnace, the good crystallinity and ultraviolet emission were obtained. These results are attributed to the improved formation of Zn-O bond in ZnO thin film annealed at by furnace. We confirm that the formation of Zn-O bond plays an important role in obtaining the excellent structural and optical properties of ZnO thin films.

Pressure Control System of RF Magnetron Sputter Chamber (RF Magnetron Sputter Chamber 내부의 압력 조절 제어 시스템)

  • Lee, S.J.;Lee, H.H.;Lee, H.H.;Kim, Y.J.
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1572-1573
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    • 2007
  • RF magnetron 스퍼터에서 스퍼터링시 타겟 온도와 기판 온도가 증가함에 따라 chamber내부의 압력이 달라져 동일한 순도의 박막을 얻기가 힘들다. 본 연구에서는 gas량을 조절하는 MFC의 출력 전압을 PID 제어 시스템을 설계하여 기준전압(원하는 진공도에 해당하는 전압 값)과 진공게이지에서 출력되는 전압을 비교하여 MFC의 출력 전압을 증가 또는 감소시킴으로써 gas량을 일정하게 하여 chamber 내부의 압력이 일정하게 유지되도록 하였다.

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Characteristics of ZnO:Al Thin Films for TCO Prepared by RE Magnetron Sputtering in $H_2/Ar$ Atmosphere ($H_2/Ar$분위기에서 제조한 투명전극용 ZnO:Al 박막의 특성)

  • Tark, Sung-Ju;Lee, Jeong-Seop;Kim, Won-Mok;Kim, Dong-Hwan
    • 한국신재생에너지학회:학술대회논문집
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    • 2006.06a
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    • pp.162-165
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    • 2006
  • AZO (ZnO:Al) were fabricated by RF magnetron sputtering In $H_2/Ar(5%\;H_2)$ atmosphere, and structural, electrical and optical properties were investigated. The substrate temperatures were varied at RT, $100^{\circ}C,\;150^{\circ}C$ and$200^{\circ}C$. The resistivity of the films grown in $H_2/Ar(5%\;H_2)$ were reduced from $7.67{\times}10^{-4}{\Omega}\;cm$ to $5.95{\times}10^{-4}{\Omega}\;cm$ comparing that Ar (100%) and the transmittance of the ZnO:Al films in the visible range was 85%.

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