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http://dx.doi.org/10.5369/JSST.2006.15.1.071

Surface morphology and electrical properties of ITO thin films fabricated by RF magnetron sputtering method  

Kwon, Sung-Yeol (Division of Electrical Control and Instrumentation, Pukyong National University)
Publication Information
Journal of Sensor Science and Technology / v.15, no.1, 2006 , pp. 71-75 More about this Journal
Abstract
ITO (Indium Tin Oxide) thin films have been fabricated by rf magnetron sputtering with a target of a mixture $In_{2}O_{3]$(90 wt%) and $SnO_{2}$ (10 wt%). ITO films were sputtered with substrate temperature from 30 to $300^{\circ}C$ and working pressure from 1 to under 0.1 m Torr. ITO thin films surface morphology and electrical properties analyzed by SEM Photographs, and X-ray diffractions patterns. The resistivity of ITO thin films was $1.8{\times}10^{-5}{\Omega}/cm$.
Keywords
indium tin oxide (ITO); thin films; rf magnetron sputtering; surface;
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