• Title/Summary/Keyword: pulsed-laser deposition

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Fabrication and Electrical Transport Characteristics of All-Perovskite Oxide DyMnO3/Nb-1.0 wt% Doped SrTiO3 Heterostructures

  • Wang, Wei Tian
    • Korean Journal of Materials Research
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    • v.30 no.7
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    • pp.333-337
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    • 2020
  • Orthorhombic DyMnO3 films are fabricated epitaxially on Nb-1.0 wt%-doped SrTiO3 single crystal substrates using pulsed laser deposition technique. The structure of the deposited DyMnO3 films is studied by X-ray diffraction, and the epitaxial relationship between the film and the substrate is determined. The electrical transport properties reveal the diodelike rectifying behaviors in the all-perovskite oxide junctions over a wide temperature range (100 ~ 340 K). The forward current is exponentially related to the forward bias voltage, and the extracted ideality factors show distinct transport mechanisms in high and low positive regions. The leakage current increases with increasing reverse bias voltage, and the breakdown voltage decreases with decrease temperature, a consequence of tunneling effects because the leakage current at low temperature is larger than that at high temperature. The determined built-in potentials are 0.37 V in the low bias region, and 0.11 V in the high bias region, respectively. The results show the importance of temperature and applied bias in determining the electrical transport characteristics of all-perovskite oxide heterostructures.

Temperature Dependence of Nanoscale Friction and Conductivity on Vanadium Dioxide Thin Film During Metal-Insulator Transition

  • Kim, Jong Hun;Fu, Deyi;Kwon, Sangku;Wu, Junqiao;Park, Jeong Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.143.2-143.2
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    • 2013
  • Nanomechanical and electrical properties of vanadium dioxide (VO2) thin films across thermal-driven phase transition are investigated with ultra-high vacuum atomic force microscopy. VO2 thin films have been deposited on the n-type heavily doped silicon wafer by pulsed laser deposition. X-ray diffraction reveals that it is textured polycrystalline with preferential orientation of (100) and (120) planes in monoclinic phase. As the temperature increases, the friction decreased at the temperature below the transition temperature, and then the friction increased as increasing temperature above the transition temperature. We attribute this observation to the combined effect of the thermal lubricity and electronic contribution in friction. Furthermore, the dependence of nanoscale conductance on the local pressure was indicated at the various temperatures, and the result was discussed in the view of pressure-induced metal-insulator transition.

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Formation of Silver Nanoparticles on Silica by Solid-State Dewetting of Deposited Film (증착 박막의 비젖음에 의한 실리카 표면 위 은나노 입자형성)

  • Kim, Jung-Hwan;Choi, Chul-Min;Hwang, So-Ri;Kim, Jae-Ho;Oh, Yong-Jun
    • Korean Journal of Metals and Materials
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    • v.48 no.9
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    • pp.856-860
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    • 2010
  • Silver nanoparticles were formed on silica substrates through thin film dewetting at high temperature. The microstructural and morphological evolution of the particles were characterized as a function of processing variables such as initial film thickness, annealing time, and temperature. Silver thin films were deposited onto the silica using a pulsed laser deposition system and annealed in reducing atmosphere to induce agglomeration of the films. The film thicknesses before dewetting were in the range of 5 to 25 nm. A noticeable agglomeration occurs with annealing at temperatures higher than $300^{\circ}C$, and higher annealing temperature increases particle size uniformity for the same film thickness sample. Average particle size linearly correlates to the film thickness, but it does not strongly depend on annealing temperature and time, although threshold temperature for complete dewetting increases with an increase of film thickness. Lower annealing temperature develops faceted surface morphology of the silver particles by enhancing the growth of the low index crystal plane of the particles.

Structural suitability of GdFeO3 as a magnetic buffer layer for GdBa2Cu3O7-x superconducting thin films

  • Park, H.S.;Oh, J.Y.;Song, B.H.;Kang, B.
    • Progress in Superconductivity and Cryogenics
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    • v.23 no.2
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    • pp.14-18
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    • 2021
  • We investigated the structural suitability of GdFeO3 (GdFO) as a buffer layer for the GdBa2xCu3O7-x (GdBCO) superconducting films. GdFO films with different thicknesses and GdBCO thin films were all prepared by using a pulsed laser deposition technique. The analyses of X-ray diffraction and EXAFS data indicates that the c-axis parameter increases and the Fe-O bond length decreases with the GdFO thickness due to the compressive stain induced by the lattice mismatch between GdFO and STO substrate and as a result, the Debye-Waller factor, an index of disorder in the local structure near the Fe-O bond, increases with the GdFO thickness. However, for the GdBCO/GdFO bilayer structure, the Debye-Waller factor decreases as the GdFO thickness increases indicating a diminished disorder by the structural coupling between GdFO and GdBCO. These results indicate that an appropriate thickness of GdFO is required to be utilized as a magnetic buffer layer for the GdBCO superconducting films.

The Formation of $YBa_2$$Cu_3$$O_7$ Step-edge Josephson Junction on LaAl$O_3$and MgO Single Crystal Substrates by Using Step-edge Annealing (LaAl$O_3$와 MgO 기판 위에 형성한 $YBa_2$$Cu_3$$O_7$ 모서리 죠셉슨 접합의 열처리 효과)

  • Yunseok Hwang;Kim, Jin-Tae;Sunkyung Moon;Lee, Soon-Gul;Park, Yong-Ki;Park, Jong-Chul
    • Progress in Superconductivity
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    • v.2 no.2
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    • pp.71-75
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    • 2001
  • The effect of annealing step-edges of LaAlO$_3$ and MgO single crystal substrates on YBa$_2$Cu$_3$O$_{7}$ junction has been studied. The step-edge was fabricated by argon ion milling and was annealed at 105$0^{\circ}C$ in 1 attn oxygen pressure. We compared AFM image near step-edge of the substrates between before and after annealing process. And YBa$_2$Cu$_3$O$_{7}$ thin film was deposited on the step-edge by a standard pulsed laser deposition. The step-edge junctions were characterized by current-voltage curves at 77 K. The annealing of step-edges of MgO substrate improved the current-voltage characteristic of Josephson junction: double steps in the current-voltage characteristic disappeared. However the annealing for LaAlO$_3$ did not improve the junction property.rty.

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$High-J_c\;NdBa_2Cu_3O_{7-{\delta}}$ thin films on $SrTiO_3$(100) substrates prepared by the PLD process

  • Wee, Sung-Hun;Moon, Seung-Hyun;Yoo, Sang-Im
    • Progress in Superconductivity and Cryogenics
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    • v.11 no.2
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    • pp.1-6
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    • 2009
  • We report a successful fabrication of $high-J_c\;NdBa_2Cu_3O_{7-{\delta}}$ (NdBCO) films on $SrTiO_3$(STO) (100) substrates by pulsed laser deposition (PLD) in a relatively wide processing window. Under various oxygen pressures controlled by either 1%$O_2$/Ar mixture gas or pure $O_2$ gas, strongly c-axis oriented NdBCO films were grown at the substrate temperature $(T_s)\;of\;800^{\circ}C$ in 800 mTorr with 1%$O_2$/Ar gas and also in 400 and 800 mTorr with pure $O_2$ gas. These samples exhibited $T_c$ values over 90K and $J_c$ values of $2.8-3.5MA/cm^2$ at 77K in self-field (77K, sf). On the other hand, $J_c$ values over $1A/cm^2$ were obtained at the temperature regions of $700-830^{\circ}C$ in 800 mTorr with 1%$O_2$/Ar gas at those of $750-830^{\circ}C$ in 800 mTorr with pure $O_2$ gas. Unlike previous reports, resent results support that the PLD processing window for high-Jc NdBCO films is not narrow.

Epitaxial growth of yttrium-stabilized HfO$_2$ high-k gate dielectric thin films on Si

  • Dai, J.Y.;Lee, P.F.;Wong, K.H.;Chan, H.L.W.;Choy, C.L.
    • Electrical & Electronic Materials
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    • v.16 no.9
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    • pp.63.2-64
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    • 2003
  • Epitaxial yttrium-stabilized HfO$_2$ thin films were deposited on p-type (100) Si substrates by pulsed laser deposition at a relatively lower substrate temperature of 550. Transmission electron microscopy observation revealed a fixed orientation relationship between the epitaxial film and Si; that is, (100)Si.(100)HfO$_2$ and [001]Si/[001]HfO$_2$. The film/Si interface is not atomically flat, suggesting possible interfacial reaction and diffusion, X-ray photoelectron spectrum analysis also revealed the interfacial reaction and diffusion evidenced by Hf silicate and Hf-Si bond formation at the interface. The epitaxial growth of the yttrium stabilized HfO$_2$ thin film on bare Si is via a direct growth mechanism without involoving the reaction between Hf atoms and SiO$_2$ layer. High-frequency capacitance-voltage measurement on an as-grown 40-A yttrium-stabilized HfO$_2$ epitaxial film yielded an dielectric constant of about 14 and equivalent oxide thickness to SiO$_2$ of 12 A. The leakage current density is 7.0${\times}$ 10e-2 A/$\textrm{cm}^2$ at 1V gate bias voltage.

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Effect of dopants(Tri-valent, Penta-valent) on the electrical and optical properties of SnO2 based transparent electrodes

  • Kim, G.W.;Sung, C.H.;Seo, Y.J.;Park, K.Y.;Heo, S.N.;Lee, S.H.;Koo, B.H.
    • Journal of Ceramic Processing Research
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    • v.13 no.spc2
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    • pp.394-397
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    • 2012
  • In this work, we studied the influence of the dopant elements concentration on the properties of SnO2 thin films deposited by pulsed laser deposition. X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), Hall effect measurement and UV-Vis studies were performed to characterize the deposited films. XRD results showed that the films had polycrystalline nature with tetragonal rutile structure. FE-SEM micrographs revealed that the as deposited films composed of dense microstructures with uniform grain size distribution. All the films show n-type conduction and the best transparent conductive oxide (TCO) performance was obtained on 6 wt% Sb2O5 doped SnO2 film prepared at pO2 of 60mtorr and Ts of 500 ℃. Its resitivity, optical transmittance, figure of merit are 7.8 × 10-4 Ω cm, 85% and 1.2 × 10-2 Ω-1, respectively.

Synthesis of La0.7Sr0.3Mn1-xIrxO3 thin-films in search of superconductivity

  • Byeongjun Seok;Youngdo Kim;Donghan Kim;Jongho Park;Changyoung Kim
    • Progress in Superconductivity and Cryogenics
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    • v.25 no.2
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    • pp.10-13
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    • 2023
  • High-TC superconductivity (HTSC) has been the central issue in the field of condensed matter physics for decades. An essential part of the research on superconductivity is finding new exotic superconductors. It was recently suggested that Ir-substituted La0.7Sr0.3MnO3 (LSMIO) is a new high-TC superconductor. However, systematic studies to experimentally verify the superconductivity have not been done. Here, we report the growth processes of LSMIO thin films and their electrical transport properties. We observed a clear negative correlation between the intensity of the laser utilized for film deposition and the Curie temperature of the deposited film. We attributed this effect to the suppression of Sr concentration in the LSMIO films as the laser intensity increased. However, our LSMIO films show conventional ferromagnetism instead of HTSC. To realize the HTSC in LSMIO systems, further exploration of diverse compositions of LSMIO compounds is essential.

Change of crystallization and properties of YBCO thin film by phase transition of $CeO_2$ ($CeO_2$의 상전이에 따른 YBCO 박막의 결정성 및 특성의 변화)

  • Kim, Sung-Min;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1590-1592
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    • 1999
  • We have fabricated good quality superconducting $YBa_2Cu_3O_{7-{\delta}}$ thin films on Hastelloy(Ni-Cr-Mo alloys) with $CeO_2$ buffer layers by in-situ pulsed laser deposition in a multi-target processing chamber. Using one of electrical properties of YBCO superconducting which the resistance approaches to zero dramatically on transition temperature, we have researched to make power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to make films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting layer and non-crystallization of YBCO on amorphous substrate. From early research, two ways-using textured metallic substrate and buffer layer-were proposed to overcome theses difficulties. We have chosen $CeO_2$ as a buffer layer which has cubic structure of $5.41{\AA}$ lattice parameter and only 0.2% of lattice mismatch with $3.82{\AA}$ of a-axis lattice parameter of YBCO on (110) direction of $CeO_2$. In order to enhance the crystallization of YBCO films on metallic substrates we deposited $CeO_2$ buffer layers at varying temperature $700^{\circ}C$ to $800^{\circ}C$ and $O_2$ pressure. By X-ray diffraction, we found that each domination of (200) and (111) orientations were strongly relied upon the deposition temperature in $CeO_2$ layer and the change of the domination of orientation affects the crystallization of YBCO upper layer.

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