• Title/Summary/Keyword: pseudomorphic

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A study on the V and X shpe defects in I $n_{0.53}$GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT structure grown by molecular beam epitaxy method (分子線에피택셜 方法으로 成長한 I $n_{0.53}$GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT 構造內의 V 및 X字形 缺陷에 關한 硏究)

  • 이해권;홍상기;김상기;노동원;이재진;편광의;박형무
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.7
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    • pp.56-61
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    • 1997
  • I $n_{0.53}$G $a_{0.47}$As/I $n_{0.52}$A $l_{0.48}$As pseudomorphic high electron mobility transistor (P-HEMT) structures were grown on semi-insulating InP substrates by molecular beam epitzxy method. The hall effect measuremetn was used to measure the electrical properties and the photoluminescence (PL) measurement was used to measure the electrical properties and the photoluminescence(PL) measurement for optical propety. By the cross-sectional transmission electron microscopy (XTEM) investigation of the V and X shape defects including slip with angle of 60.deg. C and 120.deg. C to surface in the sampel, the defects formation mecahnism in the I $n_{0.52}$A $l_{0.48}$As epilayers on InP substrates could be explained with the different thermal expansion coefficients between I $n_{0.52}$A $l_{0.48}$As epilayers and InP substrate.d InP substrate.

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Design and fabrication of V-band cascode down-mixer using CPW structure (CPW 구조를 이용한 V-band cascode 하향 주파수 혼합기의 설계 및 제작)

  • An, D.;Chae, Y. S.;Kang, T. S.;Sul, W. S.;Lim, B. O.;Rhee, J. K.
    • Proceedings of the Korea Electromagnetic Engineering Society Conference
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    • 2001.11a
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    • pp.213-217
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    • 2001
  • 본 논문에서는 CPW 구조를 이용하여 60 GHz 무선 시스템 응용을 위한 V-band용 하향 주파수 혼합기를 설계 및 제작하였다. 하향 주파수 혼합기의 설계 및 제작에 있어서 GaAs PHEMT(Pseudomorphic high electron mobility transistor)를 기반으로 하였으며, 회로설계를 위해 coplanar waveguide(CPW) 라이브러리를 구축하여 이용하였다. 제작된 하향 주파수 혼합기의 변환이득은 국부발진주파수(LO) 입력이 8 dBm일 때 -8.5 dB의 최대 변환이득 특성을 얻었으며 Pl dB는 -3.3 dBm을 얻었다. 제작된 회로의 칩 크기는 1.6$\times$l.6 $\textrm{mm}^2$ 이다.

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Photoresponsive Characteristics of N-channel Pseudomorphic HEMT and MESFET Under Optical Stimulation for Possible Applications to Millimeter-Wave Photonics

  • 김동명;김희종;이정일;이유종
    • Electrical & Electronic Materials
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    • v.12 no.8
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    • pp.39-45
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    • 1999
  • Comparative photoresponsive current-volt-age characteristics of n-channel PHEMT and MESFET on GaAs substrate. with (W/L)=200${\mu}{\textrm}{m}$/1${\mu}{\textrm}{m}$ of gates, are reported as a function of electro-optical stimulation (P\ulcorner, λ=830nm) for the first time as far as we know. Significantly different photoresponses are observed in MESFET and PHEMT, mainly due to different optoelectronic mechanisms in the formation and current conduction of channel carriers. Under high optical power, high photoresponsity with a strong non-linearity with P\ulcorner, predominantly due to a parallel conduction via a heavily doped Al\ulcornerGa\ulcornerAs donor layer, was observed in PHEMT while the optically induced drain current has been very small but monotonically increasing with optical stimulation in GaAs MESFET. We also investigated differences in optically stimulated gate leakage currents and photonic gate responses on gate voltage and drain voltage as a function of P\ulcorner. Based on the drain and gate responses to electro-optical stimulation. PHEMTs are expected to be a better candidate for high performance photonically responsive microwave device compared with MESFETs.

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Calibration Study on the DC Characteristics of GaAs-based $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}As$ Heterostructure Metamorphic HEMTs (GaAs 기반 $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}As$ 이종접합 구조를 갖는 MHEMT 소자의 DC 특성에 대한 calibration 연구)

  • Son, Myung-Sik
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.1
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    • pp.63-73
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    • 2011
  • Metamorphic HEMTs (MHEMTs) have emerged as excellent challenges for the design and fabrication of high-speed HEMTs for millimeter-wave applications. Some of improvements result from improved mobility and larger conduction band discontinuity in the channel, leading to more efficient modulation doping, better confinement, and better device performance compared with conventional pseudomorphic HEMTs (PHEMTs). For the optimized device design and development, we have performed the calibration on the DC characteristics of our fabricated 0.1 ${\mu}m$ ${\Gamma}$-gate MHEMT device having the modulation-doped $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}$As heterostructure on the GaAs wafer using the hydrodynamic transport model of a commercial 2D ISE-DESSIS device simulator. The well-calibrated device simulation shows very good agreement with the DC characteristic of the 0.1 ${\mu}m$ ${\Gamma}$-gate MHEMT device. We expect that our calibration result can help design over-100-GHz MHEMT devices for better device performance.

Q-band MMIC Driver and Power Amplifiers for Wideband wireless Multimedia (Q-band 광대역 무선 멀티미디어용 MMIC구동 및 전력증폭기)

  • 강동민;이진희;윤형섭;심재엽;이경호
    • Proceedings of the IEEK Conference
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    • 2002.06a
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    • pp.167-170
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    • 2002
  • The design and fabrication of Q-band 3-stage monolithic microwave integrated circuit(MMIC) driver and power amplifiers for WLAN are presented using 0.2${\mu}{\textrm}{m}$ AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistor(PHEMT). In each stage of the MMIC DA, a negative feedback is used for both broadband and good stability. The MMIC PA has employed a balanced configuration to overcome these difficulties and achieve high power with low VSWR over a wide frequency range. In the MMIC DA, the measurement results arc achieved as an input return loss under -4dB, an output return loss under -l0dB, a gain of 14dB, and a PldB of 17dB at C-band(36~ 44GHz). The chip size is 28mm$\times$1.3mm. The developed MMIC PA has the l0dB linear gain over 360Hz to 420Hz band and 22dBm PldB performance at 400Hz. The size of fabricated MMIC PA is 4mm x3mm. These results closely match with design results. This MMIC DA Sl PA will be used as the unit cells to develop millimeter-wave transmitters for use in wideband wireless LAN systems.

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A Study of Electrical Properties for AlGaAs/InGaAs/GaAs PHEMT s Recessed by ECR Plasma and Wet Etching (ECR 플라즈마와 습식 식각으로 게이트 리세스한 AlGaAs/InGaAs/GaAs PHEMT 소자의 전기적 특성연구)

  • 이철욱;배인호;최현태;이진희;윤형섭;박병선;박철순
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.5
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    • pp.365-370
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    • 1998
  • We studied a electrical properties in GaAs/AlGaAs/InGaAs pseudomorphic high electron mobility transistors(PHEMT s) recessed by electron cyclotron resonance(ECR) plasma and wet etching. Using the $NH_4OH$ solution, a nonvolatile AlF$_3$layer formed on AlGaAs surface after selective gate recess is effectively eliminated. Also, we controlled threshold voltage($V_th$) using $H_3PO_4$ etchant. We have fabricated a device with 540 mS/mm maximum transconductance and -0.2 V threshold voltage by using $NH_4OH$ and $H_3PO_4$dip after ECR gate recessing. In a 2-finger GaAs PHEMT with a gate length of 0.2$\mu m$ and width of 100 $\mu m$, a current gain of 15 dB at 10 GHz and a maximum cutoff frequency of 58.9 GHz have been obtained from the measurement of current gain as a function of frequency at 12mA $I_{dss}$ and 2 V souce-drain voltage.

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Simulation of Two-Dimensional Intervalley Scattering Rate in HEMT Device (HEMT 소자의 2차원 계곡간 산란율 시뮬레이션)

  • 이준하;이흥주
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.5 no.4
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    • pp.336-339
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    • 2004
  • In this paper the two-dimensional scattering rates were calculated in pseudomorphic Al/sub x//Ga/sub 1-x//As/Ga/sub y/In/sub l -y//As/GaAs heterostructure systems. The electronic states of the square quantum well were determined by the numerical self-consistent solution of Poisson's and Schrodinger's equations. The numerically obtained wave functions and energy levels were used to obtain the major two-dimensional scattering rates in this structure. Polar optical- and acoustic-phonon scattering, piezoelectric, ionized impurity and alloy scattering were considered for the first two sub-bands. The results were compared to the three-dimensional scattering rates also calculated in the same region.

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Design of a 2-Port Frequency Mixer for the Retrodirective Active Array Antenna (역지향성 능동배열 안테나용 2-Port 주파수 혼합기의 설계)

  • 전중창;김태수;김현덕
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2004.05b
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    • pp.59-63
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    • 2004
  • In this paper, we have developed a 2-port resistive frequency mixer for the retrodirective active array. The circuit topology is consisted of 2-port to avoid the complexity of LO and RF signal combination, using a pseudomorphic HEMT device. The operating frequencies are 4.0 GHz, 2.01 GHz, and 1.99 GHz for LO, RF, and IF, respectively. Conversion loss is measured to be -1㏈ and 1-㏈ compression point -15 ㏈m at the LO power of -10 ㏈m.

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Four-channel GaAs multifunction chips with bottom RF interface for Ka-band SATCOM antennas

  • Jin-Cheol Jeong;Junhan Lim;Dong-Pil Chang
    • ETRI Journal
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    • v.46 no.2
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    • pp.323-332
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    • 2024
  • Receiver and transmitter monolithic microwave integrated circuit (MMIC) multifunction chips (MFCs) for active phased-array antennas for Ka-band satellite communication (SATCOM) terminals have been designed and fabricated using a 0.15-㎛ GaAs pseudomorphic high-electron mobility transistor (pHEMT) process. The MFCs consist of four-channel radio frequency (RF) paths and a 4:1 combiner. Each channel provides several functions such as signal amplification, 6-bit phase shifting, and 5-bit attenuation with a 44-bit serial-to-parallel converter (SPC). RF pads are implemented on the bottom side of the chip to remove the parasitic inductance induced by wire bonding. The area of the fabricated chips is 5.2 mm × 4.2 mm. The receiver chip exhibits a gain of 18 dB and a noise figure of 2.0 dB over a frequency range from 17 GHz to 21 GHz with a low direct current (DC) power of 0.36 W. The transmitter chip provides a gain of 20 dB and a 1-dB gain compression point (P1dB) of 18.4 dBm over a frequency range from 28 GHz to 31 GHz with a low DC power of 0.85 W. The P1dB can be increased to 20.6 dBm at a higher bias of +4.5 V.

Occurrence types of asbestos within the serpentinite mines of the western part of Chungnam (충남 서부 사문석 광산 내 석면의 산출유형)

  • Song, Suckhwan;Hwang, Junghwan;Hwang, Byumgoo;Son, Haeyoung;Kim, Hyunwook
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.19 no.1
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    • pp.39-50
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    • 2009
  • This study is for the occurrence types of asbestos within 2 serpentinite mines, Baekdong and Kwangsi, Chungnam. They were exploited as serpentinite mines for several decades and closed in the 1980's. Asbestos with associated minerals were collected from the serpentinite bodies. They were examined with microscopes and FESEM, and analysed with EPMA, XRD and EDX to confirm for the types and/or compositions of the minerals. The serpentinites contain asbestos and nonasbestos minerals. Asbestos include chrysotile, tremolite and actinolite. The chrysotiles occur as veins of several mm to cm thickness with random directions. The tremolite and actinolite occur along cracks and fractures of several cm to ten cm thickness. They show mineralogical characteristics showing common asbestos under the microscope. Non-asbestos including chrysotile, lizardite, antigorite, tremolite and actinolite were also found within the serpentinite. The serpentines form pseudomorphic mesh textures, and also show hourglass or ribbon textures. The tremolite and actinolite were formed from the alterations of the pyroxenes and amphiboles, and plot between tremolite and magnesio hornblende. Tremolitic grains are colorless and occur as commonly elongated grains whereas the magnesio hornblende grains mainly show light green and occur as subhedral to euhedral grains. Overall results suggest that three types of asbestos are found in the Baekdong and Kwangsi serpentinite mines with varieties of the occurrences. Based on the occurrence types for the asbestos, additional studies are required for the asbestos of the top soil and the air.