• Title/Summary/Keyword: properties UV

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UV and visible emission intensity control of ZnO thin films for light emitting device applications (발광소자 응용을 위한 ZnO 박막의 자외선 및 가시광 발광 세기 제어)

  • Kang, Hong-Seong;Shim, Eun-Sub;Kang, Jeong-Seok;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.108-111
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    • 2001
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique for light emitting device applications. We have controlled the emission intensity of UV and visible light, depending on film thickness and various post-annealing time. UV emission became strong as the thickness of ZnO thin films increased. The intensity of visible light was strong as post-annealing temperature increased. The optical properties of the ZnO thin films were characterized by PL(photoluminescence) and the structural properties of the ZnO were characterized by XRD for the application of ZnO light emission device.

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UV and visible emission intensity control of ZnO thin films for light emitting device applications (발광소자 응용을 위한 ZnO 박막의 자외선 및 가시광 발광 세기 제어)

  • 강홍성;심은섭;강정석;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.108-111
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    • 2001
  • ZnO thin films on (001) sapphire substrates knave been deposited by pulsed laser deposition(PLD) technique for light emitting device applications. We have controlled the emission intensity of UV and visible light, depending on film thickness and various post-annealing time. UV emission became strong as the thickness of ZnO thin films increased. The intensity of visible light was strong as post-annealing temperature increased. The optical properties of the ZnO thin films were characterized by PL(photoluminescence) and the structural properties of the ZnO were characterized by XRD for the application of ZnO light emission device.

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Design of UV-Molding Process to Maximize the Replication Properties in Microstructures (미세구조체의 전사 특성을 향상시키기 위한 UV 성형 공정의 설계)

  • Kim, Dong-Mook;Kim, Seok-Min;Sohn, So-Young;Kang, Shin-Ill
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.27 no.3
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    • pp.450-454
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    • 2003
  • It is important to control the processing conditions to maximize the replication quality of UV-molded microstructure. In the present study, the tip radius anil surface roughness of V-groove structure were measured to quantify the replication quality. UV-curing dose and the applied pressure were experimentally selected as the governing Processing conditions that affect the replication quality of the UV-molded part. Finally. an experimental optimization technique combining central composite design and desirability function approach was used to maximize the replication quality of UV-molded structure.

Dyeing Characteristics and UV Protection Property of Green Tea Dyed Cotton Fabrics - Focusing on the Effect of Chitosan Mordanting Condition-

  • Kim Sin-Hee
    • Fibers and Polymers
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    • v.7 no.3
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    • pp.255-261
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    • 2006
  • There is increasing interest in the many beneficial aspects of green tea to human such as anti-carcinogenic, anti-aggregant, anti-allergic, anti-bacterial, anti-mutagenic, and anti-oxidant activities. Besides these beneficial aspects, it has been reported that green tea ingredients, especially polyphenolic families (i.e., catechin), have some UV protection property both in vivo and in topical applications. In this study, green tea extract was used as a dyeing stock for cotton and the UV protection property of the dyed cotton fabric was examined. To increase the affinity of cotton fiber to the polyphenolic components in the green tea extract, a natural biopolymer, chitosan, was used as mordanting agent. The effects of chitosan concentration in mordanting on the dyeing characteristics and the UV protection property were examined. Chitosan mordanted green tea dyed cotton showed better dyeing characteristic and higher UV protection property compared with the unmordanted green tea dyed cotton. As the chitosan concentration in mordanting increased, the dyeing efficiency and the UV protection property also increased. Therefore, adapting chitosan mordanting in green tea dyeing can increase the UV protection property of cotton fabrics to some extent.

A Study on Curing Properties and Structures of Phase Separation for UV-Curable Resing and Alkyd Resin Blends (UV중합성 수지와 알키드 수지 혼합물의 경화특성 및 상분리 구조에 관한 연구)

  • 최정병
    • Journal of the Korean Graphic Arts Communication Society
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    • v.18 no.1
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    • pp.13-24
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    • 2000
  • UV-curable resin has the properties of quick-drying, high productivity at low temperature, energy, space saving, solventless, non-polluting and low-stinking, and thus, UV-curing system has been widely used in the fields of printing inks, adhesives, paints and coating agents. This study has been executed to develop a new functionnal material by the polymerization induced phase separation. The results obtained were as follows. As for the curing properties of the monomer/prepolymer/alkyd resin blends, it was found out that there was a peak by the polymerization induced phase separation when measuring the changes of viscosity and elasticity. It was also found out that such polymerization phase separation occurred in case that the alkyd resin contents were 20wt% and 30wt% and not found at the contents of 40wt%. Therefore, it would be desirable to maintain the contents of alkyd resin at less than 30wt% in order to use the polymerization induced phase separation.

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Property Variations of ZnO-based MOS Capacitor with Preparation Conditions (ZnO를 사용한 MOS 커패시터의 제작 조건에 따른 특성 변화)

  • Nam, H.G.;Tang, W.M.
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.3
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    • pp.75-78
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    • 2010
  • In this study we investigated the electrical properties of ZnO-based MOS capacitor with $HfO_2$ as the gate dielectric. MIM capacitor, which uses either $HfO_2$ or $Al_2O_3$ as the dielectric layer, is also studied to understand the dependency of the dielectrics on the preparation conditions. It was found that thinner $HfO_2$ films yield better electrical properties, namely lower leakage current and higher breakdown electric field. These properties were observed to deteriorate when subsequently annealed. Capacitance in the depletion region of MOS capacitor was found to increase with UV ozone treatment time up to 60min. However, when the treatment time was extended to 120min, the trend is reversed. The 'threshold voltage' was also observed to positively shift with UV ozone treatment time up to 60min. The shift apparently saturated for longer treatment.

Preparation and Properties of UV Curable Urethane Acrylates for Ink Binder (Ink Binder용 UV 경화형 조성물의 제조 및 특성)

  • Park, Hyun-Ju;Han, Chang-Duk;Oh, Sang-Taek
    • Journal of Adhesion and Interface
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    • v.14 no.4
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    • pp.167-174
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    • 2013
  • In this study, Ultraviolet (UV) curable urethane acrylates for ink binder was prepared by reaction of IPDI, polyether polyol and HEA. The UV curing behavior of compositions with HEA/PETA ratio on UV irradiation time was investigated by FT-IR spectrophotometer, probe tack tester and Photo-DSC. Conversion % and gel content were increased with increasing UV irradiation time, but probe tack was decreased. Storage modulus, tensile strength and decomposition temperature were increased as PETA content increased. In case of HEA/PETA ratio was 30/70, adhesion property of UV-cured composition on PMMA sheet was excellent.

Behavior of Natural Organic Matter(NOM), Chlorine Residual, and Disinfection By-Products(DBPs) Formation in Pulsed UV Treated Water (Pulsed UV 처리수에서의 자연유기물질, 잔류염소 및 소독부산물 생성 거동)

  • Sohn, Jinsik;Han, Jihee
    • Journal of Korean Society of Water and Wastewater
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    • v.26 no.5
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    • pp.685-692
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    • 2012
  • UV technology is widely used in water and wastewater treatment. Many researches have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on NOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics such as NOM. Pulsed UV treatment using UV flash lamp can be operated in the pulsed mode with much greater peak intensity. The pulse duration is typically in microseconds, whereas the interval between pulses is in the order of milliseconds. The high intensity of pulsed UV would mineralize NOM itself as well as change the characteristics of NOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of NOM. The objective of this study is to investigate the effect on NOM, chlorine residual, and chlorinated DBPs formation with pulsed UV treatment.