• Title/Summary/Keyword: probe diffusion

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Measurement of Thermal Diffusivity Using Deformation Gradient and Phase in the Photothermal Displacement Technique

  • Pilsoo Jeon;Lee, Kwangjai;Jaisuk Yoo;Park, Youngmoo;Lee, Jonghwa
    • Journal of Mechanical Science and Technology
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    • v.17 no.12
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    • pp.2078-2086
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    • 2003
  • As technology advances with development of new materials, it is important to measure the thermal diffusivity of material and to predict the heat transfer in the solid subject to thermal processes. The measurement of thermal properties can be done in a non-contact way using photothermal displacement spectroscopy. In this work, the thermal diffusivity was measured by analyzing the magnitude and phase of deformation gradient. We proposed a new data analysis method based on the real part of deformation gradient as the pump-probe offset value. As the result, compared with the literature value, the measured thermal diffusivities of materials showed about 3 % error.

A Theoretical Study for the Thermal Diffusivity Measurement of Semi-Infinite Solid Using Photothermal Displacement Method (광열변위법을 이용한 반무한 고체의 열확산계수 결정에 대한 이론적 연구)

  • Jeon, Pil-Soo;Lee, Kwang-Jai;Yoo, Jai-Suk;Park, Young-Moo;Lee, Jong-Hwa
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.12
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    • pp.1747-1755
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    • 2002
  • A complete theoretical treatment of the photothermal displacement technique has been performed for thermal diffusivity measurement in semi-infinite solid materials. The influence of the parameters, such as radius and modulation frequency of the heating beam and the thermal diffusivity, was studied. Usually, thermal diffusivity was determined by the deformation angle and phase angle as the relative position between the heating and probe beams. In this study, we proposed the simple analysis method based on the real part of deformation gradient as the relative position between two beams. It is independent in the parameters such as power of heating beam, absorption coefficient, reflectivity, Poisson's ratio, and thermal expansion coefficient.

Migration of THO & Np in a Fractured Granite Core at Deep Underground Laboratory

  • PARK Chung-Kyun;CHO Won-Zin;HAHN Pil-Soo;KIENZLER B.
    • Proceedings of the Korean Radioactive Waste Society Conference
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    • 2005.06a
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    • pp.255-263
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    • 2005
  • Migration experiments of THO and 237Np have performed through a sampled granite core in Chemlab2 probe at the Aspo hard Rock laboratory. The elution curves of THO were analysed to determine hydraulic properties such as the extent of dispersion effect according to flow rates. The retardation phenomena of the solutes were observed and described with elution curves and migration plumes. After migration test, the rock core was opened, and the remaining radioactivities on the rock fracture surfaces were measured. The transport process was simulated with a two-dimensional channel model. The mass transport process was described with three types of basic processes ; advection, sorption and matrix diffusion. By the combination of these processes, effects of each process on transport were described in terms of elution curves and migration plumes. By comparing the simulation results to the experimental one, it was possible to analyse the retardation effect quantitatively.

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Effects of native oxide on Si substrates-As ion implanted on the formation of Ti-Silicides grown by RTP method (As Ion 주입된 Si 기판위의 native oxide가 RTP법으로 성장시킨 Ti-Silicides의 형성에 미치는 영향)

  • Chung, Ju-Hyuck;Choi, Jin-Seog;Paek, Su-Hyon
    • Proceedings of the KIEE Conference
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    • 1988.07a
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    • pp.319-323
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    • 1988
  • For finding the effects of As on $TiSi_2$ formation, sputter deposited Ti film on Si substrates implanted with various doses of As have been rapid thermal annealed in Ar atmosphere at temperatures of 600-900$^{\circ}C$ for 20 sec. The sheet resistance of Ti-Silicides was examined with 4-point probe, the thickness with ${\alpha}$-step, and the As dopant behavior in Si substrates with ASR. The thickness of Ti-Silicides decreased with increasing As doping, but Ti-Silicides sheet resistance increased with increasing it. However, the critical concentration effect reported by Park et al. was not observed. We observed that the thickness of native oxide increase with increasing As doping. Thus, we concluded that native oxide act as a "barrier" for the Si diffusion.

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An Experiment on the Effects of Free Stream Turbulence Intensity on the Backward-Facing Step Flow (자유흐름 난류강도가 후향계단유동에 미치는 영향에 대한 실험)

  • 김사량;유정열
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.9
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    • pp.2297-2307
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    • 1995
  • An experimental study on the structure of a separated shear layer downstream of the backward-facing step has been performed by examining mean flow and turbulent quantities in terms of free stream turbulence. When free stream turbulence exists, the entrainment rate of the separated shear layer and the flow rate in the recirculation region are enhanced, resulting in shorter reattachment length. The production and diffusion terms in the turbulent kinetic energy balance are shown to increase more than the dissipation term does. Rapid decrease of the pressure-strain term in the shear stress balance implies the enhancement of the three-dimensional motion by free stream turbulence.

Ultrasonography in periodontal diagnosis (악안면 초음파의 치주학적 활용)

  • Kim, Dae-Yeob;Lee, Jong-Bin;Pang, Eun-Kyoung
    • The Journal of the Korean dental association
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    • v.55 no.11
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    • pp.800-807
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    • 2017
  • Ultrasonography is one of the most common diagnostic tools in medical imaging with non-invasive and non-radiation loaded characteristics. In the field of dentistry, especially for periodontology, high frequency ultrasonic device can be used for several purposes such as evaluating gingival thickness, identifying the level of alveolar bone, measuring the volume of mucosa of donor site for soft tissue graft and so on. According to recent studies, it was demonstrated that ultrasonic diagnosis had both accuracy and repeatability comparable to conventional diagnostic tools. However, improvement and development of intra-oral probe suitable for adpatation to gingiva and palatal mucosa, are considered as prerequisites for diffusion of ultrasonic diagnosis in periodontology.

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Emission studies of a dual swirl burner in the region of lean equivalence ratios (희박한 당량비 구간에서 이중 선회버너의 배출특성 연구)

  • Park, Taejoon;Lee, Keeman
    • 한국연소학회:학술대회논문집
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    • 2013.06a
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    • pp.111-112
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    • 2013
  • An experimental study of a dual swirl burner was conducted to analyze NOx emission in the lean conditions. The dual swirl burner is composed of a combination of swirling jet premixed(main section) and diffusion flames(pilot section). It was operated with a co-swirling configuration and overall equivalence ratios between 0.6 and 0.8. The purpose of this study is to analyze experimentally the characterization of flame temperature and NOx concentration in reacting zone and to supply the useful experimental data for numerical simulations. The measurements of temperature and NOx concentration were captured using a thin digitally-compensated thermocouple and a sampling quartz probe with quenching effect of sudden expansion, and were measured by the NOx analyzer of chemiluminescence method. We could analyse the NOx emission characteristics comparing the temperature distributions in the lean equivalence ratios.

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Measurement of the Thermal Behavior of a Nd:YAG Laser Rod by Analyzing Interference Fringe from a He-Ne Probe Beam (He-Ne 레이저 탐사광의 간섭효과를 이용한 Nd:YAG 레이저봉의 온도측정)

  • 김광석;공홍진;김덕현;김철중
    • Korean Journal of Optics and Photonics
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    • v.1 no.2
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    • pp.204-209
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    • 1990
  • The temperature variation at a laser rod center induced by high repetetion rate pumping was measured by counting the number of inteference frigne shift and found to be consistent with the theoretical value obtained from heat diffusion equation. The spatial homogeneity and energy transfer rate of flashlamp pumping by the single elliptical reflector plated with gold were evaluated by measuring interference fringes oever the cross section of a Nd:YAG laser rod.

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Photoprimary Processes and Nanometer-Nanosecond Morphological Dynamics of Polymer Films Studied by Pump and Probe Measurement

  • Mito, Takashi;Masubuchi, Tomokazu;Tada, Takuji;Fukumura, Hiroshi;Masuhara, Hiroshi
    • Journal of Photoscience
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    • v.6 no.3
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    • pp.109-115
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    • 1999
  • Intense excimer laser irradiation of polymer films results in expansion and the following contraction , recovering ithe initial flat surface. The morphological dynamics is meausred directly by nanosecond time-resolved interferometry for polystyrene(PS), polyurethane, and polyimide films. The expansion proceeds with a speed of a few nm/ns , while the contraction depends upon the polymer ; very low contraction for PS, rapid 2 component shrinking for polyurethane, and rapid monotonous decay for polymide. These characteristic behavior are considered from viewpoints of interpenetrating structures of polymers, glass-rubber phase transitioni, thermal diffusion, and photothermal mechanism.

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Behavior of Implanted Dopants and Formation of Molybdenum Siliclde by Composite Sputtering (Composite target으로 증착된 Mo-silicide의 형성 및 불순물의 거동)

  • Cho, Hyun-Choon;Paek, Su-Hyon;Choi, Jin-Seog;Hwang, Yu-Sang;Kim, Ho-Suk;Kim, Dong-Won;Shim, Tae-Earn;Jung, Jae-Kyoung;Lee, Jong-Gil
    • Korean Journal of Materials Research
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    • v.2 no.5
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    • pp.375-382
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    • 1992
  • Molybdenum silicide films have been prepared by sputtering from a single composite MoS$i_2$ source on both P, B$F_2$respectively implanted (5${\times}10^{15}ions/cm^2$ single crystal and P implanted (5${\times}10^{15}ions/cm^2$) polycrystalline silicon substrates followed by rapid thermal annealing in the ambient of argon. The heat treatment temperatures have been varied in the range of 600-l20$0^{\circ}C$ for 20 seconds. The properties of Mo-silicide and the diffusion behaviors of dopant after the heat treatment are investigated using X-ray diffraction, scanning electron microscopy(SEM) , secondary ions mass spectrometry(SIMS), four-point probe and $\alpha-step.$ Annealing at 80$0^{\circ}C$ or higher resulted in conversion of the amorphous phase into predominantly MoS$i_2$and a lower sheet resistance. There was no significant out-diffusion of dopants from both single crystal and polycrystalline silicon substrate into molybdenum silicide layers during annealing.

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